公开(公告)号：NL2011760A

公开(公告)日：2014-01-13

申请号：NL2011760

申请日：2013-11-08

Applicant: ASML NETHERLANDS BV ,  ZEISS CARL SMT GMBH

Inventor： LOOPSTRA ERIK ,  BEERENS RUUD ,  BIELING STIG ,  CADEE THEODORUS PETRUS MARIA ,  DONDERS SJOERD ,  FRIJNS OLAV ,  KEMPEN ANTONIUS ,  SCHEEPERS MARCUS ,  STRUYCKEN ALEXANDER ,  KATE NICOLAAS ,  LIESHOUT RICHARD HENRICUS ADRIANUS ,  VANDERHALLEN IVO

IPC: G03F7/20 ,  H05G2/00

公开(公告)号：NL2009824A

公开(公告)日：2013-06-24

申请号：NL2009824

申请日：2012-11-16

Applicant: ASML NETHERLANDS BV

Inventor： SPRUIT JOHANNES HENDRIKUS MARIA ,  BEERENS RUUD ,  LIESHOUT RICHARD HENRICUS ADRIANUS ,  DAN CRISTIAN

IPC: G03F7/20

公开(公告)号：NL2009222A

公开(公告)日：2013-03-04

申请号：NL2009222

申请日：2012-07-24

Applicant: ASML NETHERLANDS BV

Inventor： BLEEKER ARNO ,  LOOPSTRA ERIK ,  SCHOOT HARMEN ,  PHILIPS DANNY ,  BEERENS RUUD

IPC: G03F7/20

Abstract: A lithographic apparatus having a programmable patterning device and a projection system. The programmable patterning device is configured to provide a plurality of radiation beams. The projection system has a lens group array configured to project the plurality of radiation beams onto a substrate. The projection system further includes a focus adjuster in an optical path corresponding to a lens group of the lens group array. The focus adjuster has an optical element having substantially zero optical power.

公开(公告)号：NL2008353A

公开(公告)日：2012-10-02

申请号：NL2008353

申请日：2012-02-27

Applicant: ASML NETHERLANDS BV

Inventor： VERMEULEN JOHANNES ,  AKKERMANS JOHANNES ,  WAL MARINUS ,  BEERENS RUUD ,  HUANG YANG-SHAN ,  AANGENENT WOUTER

IPC: G03F7/20

公开(公告)号：NL2006743A

公开(公告)日：2011-12-12

申请号：NL2006743

申请日：2011-05-09

Applicant: ASML NETHERLANDS BV

Inventor： BEERENS RUUD ,  GROOT ANTONIUS ,  VERMEULEN JOHANNES

IPC: G03F7/20 ,  G03F9/00

Abstract: A position sensor is configured to measure a position data of a target. The position sensor includes a radiation source configured to irradiate a radiation beam, a first grating configured to diffract the radiation beam in a first diffraction direction into at least a first order diffraction beam, and a second grating, arranged in an optical path of the first order diffraction beam, the second grating being configured to diffract the first order diffraction beam diffracted at the first grating in a second diffraction direction substantially perpendicular to the first diffraction direction. The second grating is connected to the target. A first detector is configured to detect at least a part of the beam diffracted by the first grating, and at least one second detector is configured to detect at least part of the beam diffracted by the first grating and the second grating.

公开(公告)号：NL2007834A

公开(公告)日：2012-06-27

申请号：NL2007834

申请日：2011-11-22

Applicant: ASML NETHERLANDS BV

Inventor： BEERENS RUUD ,  CADEE THEODORUS

IPC: G03F7/20

公开(公告)号：NL2007036A

公开(公告)日：2012-01-31

申请号：NL2007036

申请日：2011-07-04

Applicant: ASML NETHERLANDS BV ,  UNIV EINDHOVEN TECH ,  SORAMA

Inventor： AANGENENT WOUTER ,  VERMEULEN JOHANNES ,  BEERENS RUUD ,  SCHOLTE RICK ,  LOPEZ ARTEAGA INES

IPC: G03F7/20

公开(公告)号：NL2006220A

公开(公告)日：2011-08-24

申请号：NL2006220

申请日：2011-02-17

Applicant: ASML NETHERLANDS BV

Inventor： PASCH ENGELBERTUS ,  BEERENS RUUD

IPC: G03F7/20

公开(公告)号：NL2010967A

公开(公告)日：2013-12-17

申请号：NL2010967

申请日：2013-06-13

Applicant: ASML NETHERLANDS BV

Inventor： BEERENS RUUD ,  JEUNINK ANDRE ,  WAL MARINUS ,  AANGENENT WILHELMUS HENRICUS THEODORUS MARIA ,  LIESHOUT RICHARD HENRICUS ADRIANUS ,  GROES HENRICUS MARTINUS JOHANNES ,  HOEVEN SAARTJE WILLEMIJN

IPC: G03F7/20 ,  G03F9/00

公开(公告)号：NL2008468A

公开(公告)日：2012-10-12

申请号：NL2008468

申请日：2012-03-12

Applicant: ASML NETHERLANDS BV

Inventor： VERMEULEN JOHANNES ,  GROOT ANTONIUS ,  PASCH ENGELBERTUS ,  BEERENS RUUD ,  LAFARRE RAYMOND

IPC: G03F7/20