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    Lithography apparatus and method of manufacturing device
    1.
    发明专利
    Lithography apparatus and method of manufacturing device 有权
    平面设备及其制造方法

    公开(公告)号：JP2007165875A

    公开(公告)日：2007-06-28

    申请号：JP2006325814

    申请日：2006-12-01

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： SCHOORMANS CAROLUS JOHANNES C ,  EUSSEN EMIEL JOZEF M ,  KOENEN WILLEM HERMAN GERTRUDA ,  LALLEMANT NICOLAS A ,  VAN DER PASCH ENGELBERTUS ANTO ,  ADRIAENS JOHANNES MATHIAS T A

    IPC: H01L21/027 ,  G01B11/00 ,  G03F9/00

    CPC classification number: G03F7/70775

    Abstract: PROBLEM TO BE SOLVED: To provide a method and an apparatus having high accuracy in determining a position of a movable object. SOLUTION: The method of manufacturing a device includes projecting a patterned radiation beam to a substrate wherein a position of a movable object is determined with multiple degrees of freedom using many sensors, the number of sensors is larger than the number of degrees of freedom, the position of the movable object is determined with the degrees of freedom using a signal from each of the sensors, and the signal from the sensor is weighed based on difference in noise level of each sensor. The lithography apparatus has improved accuracy in measurement of a position of the movable object and/or superposition ability and focusing ability. COPYRIGHT: (C)2007,JPO&INPIT

    Abstract translation: 要解决的问题：提供一种在确定可移动物体的位置时具有高精度的方法和装置。 解决方案：制造装置的方法包括将图案化的辐射束投影到基板，其中使用许多传感器以多个自由度确定可移动物体的位置，传感器的数量大于 自由度，使用来自每个传感器的信号，利用自由度来确定可移动物体的位置，并且基于每个传感器的噪声水平的差异来称量来自传感器的信号。 光刻装置提高了可移动物体的位置的测量精度和/或叠加能力和聚焦能力。 版权所有（C）2007，JPO＆INPIT

    Stage system, lithographic apparatus including such stage system, and correction method
    3.
    发明专利
    Stage system, lithographic apparatus including such stage system, and correction method 审中-公开
    阶段系统，包括这种系统的平面设备和校正方法

    公开(公告)号：JP2009135490A

    公开(公告)日：2009-06-18

    申请号：JP2008290451

    申请日：2008-11-13

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： KOENEN WILLEM HERMAN GERTRUDA ,  EUSSEN EMIEL JOZEF MELANIE ,  VAN DER PASCH ENGELBERTUS ANTO

    IPC: H01L21/027

    CPC classification number: G03F7/70775 ,  G03F7/70508 ,  G03F7/7085

    Abstract: PROBLEM TO BE SOLVED: To improve stage position measurement accuracy of a stage.
    SOLUTION: A position measurement system to measure a position of a movable stage includes: a reference plate; a plurality of sensors arranged such that, depending on a position of the movable stage relative to the reference plate, at least a subset of the plurality of sensors is configured to cooperate with the reference plate to provide, for each of the sensors in the subset, respective sensor signals representative of positions of the respective sensors relative to the reference plate; and a processor arranged to determine, from the sensor signals, a stage position. The processing device is configured to, when the stage is in a position where an over-determined number of sensor signals is provided by at least the subset of the sensors that are in operational cooperation with the reference plate, (a) determine the stage position from a subset of the over-determined number of sensor signals, and (b) correct a sensor signal of one or more of the sensors from a discrepancy between the determined stage position and a remainder of the sensors signals.
    COPYRIGHT: (C)2009,JPO&INPIT

    Abstract translation: 要解决的问题：提高舞台的舞台位置测量精度。 解决方案：用于测量可移动台的位置的位置测量系统包括：参考板; 多个传感器布置成使得根据可移动台相对于参考板的位置，多个传感器的至少一个子集被配置为与参考板协作以为子集中的每个传感器提供 各个传感器信号表示相应传感器相对于参考板的位置; 以及处理器，其布置成从传感器信号确定台位置。 所述处理装置被配置为当所述载物台位于所述传感器至少与所述参考板操作协作的至少子集中提供超过数量的传感器信号的位置时，（a）确定所述载物台位置 从传感器信号的超定数量的子集中，以及（b）根据确定的载台位置和传感器信号的其余部分之间的差异校正一个或多个传感器的传感器信号。 版权所有（C）2009，JPO＆INPIT

    Control system, lithographic projection apparatus, method of controlling support structure, and computer program product
    5.
    发明专利
    Control system, lithographic projection apparatus, method of controlling support structure, and computer program product 有权
    控制系统，平面投影设备，控制支持结构的方法和计算机程序产品

    公开(公告)号：JP2009016820A

    公开(公告)日：2009-01-22

    申请号：JP2008162270

    申请日：2008-06-20

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： LOOPSTRA ERIK R ,  VAN DER PASCH ENGELBERTUS ANTO ,  VAN DER WIJST MARC WILHELMUS M ,  EUSSEN EMIEL JOZEF MELANIE ,  KOENEN WILLEM HERMAN GERTRUDA

    IPC: H01L21/027 ,  G03F7/20 ,  H01L21/68

    CPC classification number: G03F7/709 ,  G03F7/70775 ,  G03F7/70858 ,  G03F9/7096

    Abstract: PROBLEM TO BE SOLVED: To provide a control system for controlling a support structure in a lithographic apparatus. SOLUTION: The control system includes a first measurement system for measuring the position of a substrate supported by the support structure, the position being measured in a first coordinate system. The control system further includes a second measurement system for measuring the position of the support structure in a second coordinate system, the first measurement system having a presumed position in the second coordinate system. The control system further comprises a controller configured to control the position of the support structure based on measurements by the second measurement system, to convert the measured position of the substrate into a converted position of the support structure in the second coordinate system, to position the support structure based on the converted position, to receive a position error signal indicative of a difference between the presumed position and an actual position of the first measurement system in the second coordinate system, and to position the support structure in a manner dependent upon the position error signal. COPYRIGHT: (C)2009,JPO&INPIT

    Abstract translation: 要解决的问题：提供一种用于控制光刻设备中的支撑结构的控制系统。 解决方案：控制系统包括用于测量由支撑结构支撑的基板的位置的第一测量系统，该位置在第一坐标系中被测量。 所述控制系统还包括用于在第二坐标系中测量所述支撑结构的位置的第二测量系统，所述第一测量系统在所述第二坐标系中具有推测位置。 所述控制系统还包括控制器，所述控制器被配置为基于所述第二测量系统的测量来控制所述支撑结构的位置，以将所述基板的测量位置转换成所述支撑结构在所述第二坐标系中的转换位置， 基于转换位置的支撑结构，接收表示第二坐标系中的第一测量系统的推测位置和实际位置之间的差异的位置误差信号，并且以取决于位置的方式定位支撑结构 误差信号。 版权所有（C）2009，JPO＆INPIT

    Calibration method, lithography device, and patterning device for lithography device like that
    6.
    发明专利
    Calibration method, lithography device, and patterning device for lithography device like that 有权
    校正方法，平面设备和图形设备的图案设备

    公开(公告)号：JP2007281449A

    公开(公告)日：2007-10-25

    申请号：JP2007067920

    申请日：2007-03-16

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： KOENEN WILLEM HERMAN GERTRUDA

    IPC: H01L21/027 ,  G03F9/00 ,  H01L21/68

    CPC classification number: G03B27/58 ,  G03F7/70516 ,  G03F7/70775

    Abstract: PROBLEM TO BE SOLVED: To calibrate the position of a substrate table in a lithography device. SOLUTION: The calibration method comprises: a step 500 of repeatedly irradiating the substrate surface with patterns to ensure that two dimensional patterns are disposed on the substrate surface, and deviating the substrate table during intervals between the continuous irradiations such that other places of the substrate surface are irradiated during the repeated irradiations; a step 510 of reading patterns in two dimensions to obtain pattern reading results; a step 520 of deriving an increment position deviation from reading results of adjacent patterns according to the position of the substrate table in the two dimensions; a step 530 of deriving the position error of the substrate table from the increment position deviation as a function of a two-dimensional position of the substrate table; and a step 540 of using position-dependent errors to calibrate the position of the substrate table. COPYRIGHT: (C)2008,JPO&INPIT

    Abstract translation: 要解决的问题：校准光刻设备中的衬底台的位置。 解决方案：校准方法包括：步骤500，其以图案重复地照射衬底表面，以确保在衬底表面上设置二维图案，并且在连续照射之间的间隔期间偏离衬底台，使得其他位置 在重复照射期间照射基板表面; 读取二维图案以获得图案读取结果的步骤510; 根据两维中的基板台的位置，导出相邻图案的读取结果的增量位置偏差的步骤520; 从作为衬底台的二维位置的函数的增量位置偏差导出衬底台的位置误差的步骤530; 以及使用位置相关误差来校准衬底台的位置的步骤540。 版权所有（C）2008，JPO＆INPIT

    Lithographic apparatus and method for determining z position errors/variations and substrate table flatness
    9.
    发明专利
    Lithographic apparatus and method for determining z position errors/variations and substrate table flatness 未知

    公开(公告)号：SG123762A1

    公开(公告)日：2006-07-26

    申请号：SG200508364

    申请日：2005-12-23

    Applicant: ASML NETHERLANDS BV

    Inventor： KOENEN WILLEM HERMAN GERTRUDA ,  MINNAERT ARTHUR WINFRIED EDUAR ,  OUWEHAND LUBERTHUS ,  ADRIENS JOHANNES MATHIAS THEOD ,  PRIL WOUTER ONNO

    Abstract: A lithographic projection apparatus including: an illumination system configured to provide a beam of radiation; a support configured to support a patterning device, the patterning device configured to impart the beam with a pattern in its cross section; a substrate table (WT) configured to hold a substrate (W); a projection system configured to project the patterned radiation onto a target portion of the substrate (W); a plurality of level sensors (LS) for sensing a level of a substrate carried on the substrate table (WT) at a plurality of different positions, and a system for determining the position of the substrate table (WT). Also provided is a controller that is configured to cause relative movement between the substrate (W) and the level sensor array from a first position at which a first measurement is taken to a plurality of overlapping positions at which further measurements are taken, and a calculator for calculating a measure of Z position errors and/or substrate table (WT) unflatness and/or a measure of the level sensor (LS) position/offset using the plurality of overlapping measurements.

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