公开(公告)号：KR20200134307A

公开(公告)日：2020-12-01

申请号：KR20207030833

申请日：2019-03-27

Applicant: ASML NETHERLANDS BV

Inventor： VAN DORST RINGO PETRUS CORNELIS ,  KRAMER GIJS ,  SMEETS BENJAMIN CUNNEGONDA HENRICUS ,  FRENCKEN MARK JOHANNES HERMANUS

IPC: G03F7/20 ,  H01L21/67 ,  H01L21/687

Abstract: 본발명은스테이지장치를제공하고, 이스테이지장치는대상물지지부, 복수의지지부재및 제어유닛을포한한다. 대상물지지부는대상물을장착하기위한표면을포함한다. 이표면은평면내에서연장되어있다. 복수의지지부재는대상물을지지하기위한것이며, 그립퍼로부터대상물을받고또한대상물을표면에배치하며그리고/또는그 반대로도할 수있다. 지지부재는적어도평면에수직인제 1 방향으로움직일수 있다. 제어유닛은대상물의비평면형상에관한형상정보를받고또한지지부재의위치를제어하도록배치된다. 제어유닛은, 제 1 방향으로의대상물의공간점유를줄이도록위치를제어하여, 지지부재에의해지지되고있는대상물을형상정보에근거하여기울이도록배치된다.

公开(公告)号：SG11202002228UA

公开(公告)日：2020-04-29

申请号：SG11202002228U

申请日：2018-09-19

Applicant: ASML NETHERLANDS BV

Inventor： ROSET NIEK ,  VERMEULEN MARCUS ,  RAVENSBERGEN SIMON ,  BAGGEN MARK ,  KRAMER GIJS ,  TIMMERMANS ROGER ,  VAN DEN BERKMORTEL FRANK

IPC: G03F7/20 ,  H01L21/687

Abstract: A substrate holder for use in a lithographic apparatus and configured to support a substrate, the substrate holder having a main body having a main body surface, a plurality of main burls projecting from the main body surface, wherein each main burl has a distal end surface configured to support the substrate, a first seal member projecting from the main body surface and having an upper surface, the first seal member surrounding the plurality of main burls and configured to restrict the passage of liquid between the substrate and the main body surface radially inward past the first seal member, and a plurality of minor burls projecting from the upper surface of the first seal member, wherein each minor burl has a distal end surface configured to support the substrate.