公开(公告)号：SG11202002228UA

公开(公告)日：2020-04-29

申请号：SG11202002228U

申请日：2018-09-19

Applicant: ASML NETHERLANDS BV

Inventor： ROSET NIEK ,  VERMEULEN MARCUS ,  RAVENSBERGEN SIMON ,  BAGGEN MARK ,  KRAMER GIJS ,  TIMMERMANS ROGER ,  VAN DEN BERKMORTEL FRANK

IPC: G03F7/20 ,  H01L21/687

Abstract: A substrate holder for use in a lithographic apparatus and configured to support a substrate, the substrate holder having a main body having a main body surface, a plurality of main burls projecting from the main body surface, wherein each main burl has a distal end surface configured to support the substrate, a first seal member projecting from the main body surface and having an upper surface, the first seal member surrounding the plurality of main burls and configured to restrict the passage of liquid between the substrate and the main body surface radially inward past the first seal member, and a plurality of minor burls projecting from the upper surface of the first seal member, wherein each minor burl has a distal end surface configured to support the substrate.