公开(公告)号：SG11202002228UA

公开(公告)日：2020-04-29

申请号：SG11202002228U

申请日：2018-09-19

Applicant: ASML NETHERLANDS BV

Inventor： ROSET NIEK ,  VERMEULEN MARCUS ,  RAVENSBERGEN SIMON ,  BAGGEN MARK ,  KRAMER GIJS ,  TIMMERMANS ROGER ,  VAN DEN BERKMORTEL FRANK

IPC: G03F7/20 ,  H01L21/687

Abstract: A substrate holder for use in a lithographic apparatus and configured to support a substrate, the substrate holder having a main body having a main body surface, a plurality of main burls projecting from the main body surface, wherein each main burl has a distal end surface configured to support the substrate, a first seal member projecting from the main body surface and having an upper surface, the first seal member surrounding the plurality of main burls and configured to restrict the passage of liquid between the substrate and the main body surface radially inward past the first seal member, and a plurality of minor burls projecting from the upper surface of the first seal member, wherein each minor burl has a distal end surface configured to support the substrate.

公开(公告)号：NL2010204A

公开(公告)日：2013-10-15

申请号：NL2010204

申请日：2013-01-30

Applicant: ASML NETHERLANDS BV

Inventor： BLEEKER ARNO ,  CASTENMILLER THOMAS ,  JAGER PIETER ,  MULDER HEINE ,  ZAAL KOEN ,  CADEE THEODORUS PETRUS MARIA ,  PHILIPS DANNY ,  BEERENS RUUD ,  TIMMERMANS ROGER

IPC: G03F7/20 ,  H01L21/68

Abstract: A projection system, configured to project a radiation beam onto a target, includes a rotatable frame configured to rotate about an axis defining a tangential direction and a radial direction, wherein the rotatable frame holds a lens configured to focus the radiation beam in only the tangential or radial direction; and a stationary part comprising a substantially stationary lens configured to focus the radiation beam in only the other of the tangential or radial direction.