公开(公告)号：NL2006714A

公开(公告)日：2011-12-08

申请号：NL2006714

申请日：2011-05-04

Applicant: ASML NETHERLANDS BV

Inventor： RIJDT HANS ,  OTTENS JOOST JEROEN ,  VERMEULEN MARCUS ,  MANDERS ERIK JOHANNES ANTONIUS

IPC: G03F7/20 ,  H01L21/68

公开(公告)号：SG11202002228UA

公开(公告)日：2020-04-29

申请号：SG11202002228U

申请日：2018-09-19

Applicant: ASML NETHERLANDS BV

Inventor： ROSET NIEK ,  VERMEULEN MARCUS ,  RAVENSBERGEN SIMON ,  BAGGEN MARK ,  KRAMER GIJS ,  TIMMERMANS ROGER ,  VAN DEN BERKMORTEL FRANK

IPC: G03F7/20 ,  H01L21/687

Abstract: A substrate holder for use in a lithographic apparatus and configured to support a substrate, the substrate holder having a main body having a main body surface, a plurality of main burls projecting from the main body surface, wherein each main burl has a distal end surface configured to support the substrate, a first seal member projecting from the main body surface and having an upper surface, the first seal member surrounding the plurality of main burls and configured to restrict the passage of liquid between the substrate and the main body surface radially inward past the first seal member, and a plurality of minor burls projecting from the upper surface of the first seal member, wherein each minor burl has a distal end surface configured to support the substrate.

公开(公告)号：NL2003933A

公开(公告)日：2010-06-14

申请号：NL2003933

申请日：2009-12-10

Applicant: ASML NETHERLANDS BV

Inventor： KEMPER NICOLAAS ,  BALLEGOIJ ROBERTUS ,  VERMEULEN MARCUS ,  BERKVENS PAUL ,  METSENAERE CHRISTOPHE ,  ROPS CORNELIUS ,  RIEPEN MICHEL ,  HEUVEL MARTINUS ,  WINKEL JIMMY

IPC: G03F7/20

公开(公告)号：NL2006057A

公开(公告)日：2011-08-25

申请号：NL2006057

申请日：2011-01-25

Applicant: ASML NETHERLANDS BV

Inventor： BUTLER HANS ,  EUSSEN EMIEL ,  KOENEN WILLEM ,  PASCH ENGELBERTUS ,  SCHOOT HARMEN ,  WIJST MARC ,  VERMEULEN MARCUS ,  HOON CORNELIUS

IPC: G03F9/00 ,  G03F7/20 ,  H01L21/68

Abstract: A lithographic apparatus includes a stage to hold an object, the stage being moveable relative to a reference structure in a motion range; a magnet structure to provide a spatially varying magnetic field in at least a part of the motion range, the magnet structure being moveable relative to the reference structure and the stage; a first position measurement system to provide a first measurement signal corresponding to a position of the stage and/or the object in a measurement direction relative to the reference structure; a second position measurement system to provide a second measurement signal corresponding to a position of the stage relative to the magnet structure; and a data processor to correct the first measurement signal with a value dependent on the second measurement signal to provide a corrected first measurement signal representative of the position of the stage and/or the object relative to the reference structure in the measurement direction.