公开(公告)号：NL2006073A

公开(公告)日：2011-08-15

申请号：NL2006073

申请日：2011-01-26

Applicant: ASML NETHERLANDS BV

Inventor： KOHLER CARSTEN ,  LAAN HANS ,  STAALS FRANK ,  WINTER LAURENTIUS ,  GODFRIED HERMAN

IPC: G03F7/20

Abstract: Embodiments of the invention related to lithographic apparatus and methods. A lithographic method comprises calculating a laser metric based on a spectrum of laser radiation emitted from a laser to a lithographic apparatus together with a representation of an aerial image of a pattern to be projected onto the substrate by the lithographic apparatus, and using the laser metric to modify operation of the laser or adjust the lithographic apparatus, and projecting the pattern onto the substrate.

公开(公告)号：NL2005719A

公开(公告)日：2011-06-21

申请号：NL2005719

申请日：2010-11-18

Applicant: ASML NETHERLANDS BV

Inventor： STAALS FRANK ,  LAAN HANS ,  BUTLER HANS ,  HOFMANS GERARDUS CAROLUS JOHANNUS ,  MAGNUSSON SVEN GUNNAR KRISTER

IPC: G03F7/20 ,  G03F9/00

Abstract: Movements of a lithographic apparatus include dynamic positioning errors on one or more axes which cause corresponding errors which can be measured in the applied pattern. A test method includes operating the apparatus several times while deliberately imposing a relatively large dynamic positioning error at different specific frequencies and axes. Variations in the error in the applied pattern are measured for different frequencies and amplitudes of the injected error across a frequency band of interest for a given axis or axes. Calculation using said measurements and knowledge of the frequencies injected allows analysis of dynamic positioning error variations in frequency bands correlated with each injected error frequency.