公开(公告)号：JP2002334835A

公开(公告)日：2002-11-22

申请号：JP2002095774

申请日：2002-03-29

Applicant: ASML NETHERLANDS BV

Inventor： BASELMANS JOHANNES JACOBUS MAT ,  ENGELEN ADRIANUS FRANCISCUS PE ,  CRAMER HUGO AUGUSTINUS JOSEPH ,  FINDERS JOZEF MARIA ,  KOHLER CARSTEN

IPC: G03F7/20 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a method of manufacturing a device that acquires the aberration of the projection system of a lithographic projector, in terms of Zernike expansion. SOLUTION: The field distribution of displacement errors and the focal plane distortion of a projected image are calculated based on Zernike aberration which quantifies the relation between a Zernike aberration components and the error of the image and a sensitivity coefficient. Then the compensation applied to the lithographic projector for minimizing the error of the image is determined by executing calculation and applied to the projector. The compensation increases one component of the aberration of the projector in order to lower the effects of the other aberrations, and consequently, the quality of the image as a whole is improved.

公开(公告)号：DE60223102D1

公开(公告)日：2007-12-06

申请号：DE60223102

申请日：2002-03-28

Applicant: ASML NETHERLANDS BV

Inventor： BASELMANS JOHANNES JACOBUS MAT ,  ENGELEN ADRIANUS FRANCISCUS PE ,  CRAMER HUGO AUGUSTINUS JOSEPH ,  FINDERS JOZEF MARIA ,  KOHLER CARSTEN

IPC: G03F7/20 ,  H01L21/027

Abstract: A device manufacturing method is disclosed in which the aberration of the projection system of a lithographic projection apparatus is obtained in terms of the Zernike expansion. The field distribution of displacement error and focal plane distortion of the projected image are calculated on the basis of the Zernike aberration and sensitivity coefficients which quantify the relationship between Zernike aberration components and the error in the image. A calculation is then performed to determine the compensation to apply to the apparatus in order to minimize the error in the image. The compensation is then applied to the apparatus. The compensation may comprise increasing one component of aberration of the apparatus in order to decrease the effect of another aberration, such that, on balance, the image quality as a whole is improved.

公开(公告)号：DE60223102T2

公开(公告)日：2008-08-07

申请号：DE60223102

申请日：2002-03-28

Applicant: ASML NETHERLANDS BV

Inventor： BASELMANS JOHANNES JACOBUS MAT ,  ENGELEN ADRIANUS FRANCISCUS PE ,  CRAMER HUGO AUGUSTINUS JOSEPH ,  FINDERS JOZEF MARIA ,  KOHLER CARSTEN

IPC: G03F7/20 ,  H01L21/027

Abstract: A device manufacturing method is disclosed in which the aberration of the projection system of a lithographic projection apparatus is obtained in terms of the Zernike expansion. The field distribution of displacement error and focal plane distortion of the projected image are calculated on the basis of the Zernike aberration and sensitivity coefficients which quantify the relationship between Zernike aberration components and the error in the image. A calculation is then performed to determine the compensation to apply to the apparatus in order to minimize the error in the image. The compensation is then applied to the apparatus. The compensation may comprise increasing one component of aberration of the apparatus in order to decrease the effect of another aberration, such that, on balance, the image quality as a whole is improved.

公开(公告)号：NL2009850A

公开(公告)日：2013-06-05

申请号：NL2009850

申请日：2012-11-21

Applicant: ASML NETHERLANDS BV

Inventor： ENGBLOM PETER ,  KOHLER CARSTEN ,  STAALS FRANK ,  WINTER LAURENTIUS

IPC: G03F7/20

公开(公告)号：NL2006073A

公开(公告)日：2011-08-15

申请号：NL2006073

申请日：2011-01-26

Applicant: ASML NETHERLANDS BV

Inventor： KOHLER CARSTEN ,  LAAN HANS ,  STAALS FRANK ,  WINTER LAURENTIUS ,  GODFRIED HERMAN

IPC: G03F7/20

Abstract: Embodiments of the invention related to lithographic apparatus and methods. A lithographic method comprises calculating a laser metric based on a spectrum of laser radiation emitted from a laser to a lithographic apparatus together with a representation of an aerial image of a pattern to be projected onto the substrate by the lithographic apparatus, and using the laser metric to modify operation of the laser or adjust the lithographic apparatus, and projecting the pattern onto the substrate.