公开(公告)号：NL2006073A

公开(公告)日：2011-08-15

申请号：NL2006073

申请日：2011-01-26

Applicant: ASML NETHERLANDS BV

Inventor： KOHLER CARSTEN ,  LAAN HANS ,  STAALS FRANK ,  WINTER LAURENTIUS ,  GODFRIED HERMAN

IPC: G03F7/20

Abstract: Embodiments of the invention related to lithographic apparatus and methods. A lithographic method comprises calculating a laser metric based on a spectrum of laser radiation emitted from a laser to a lithographic apparatus together with a representation of an aerial image of a pattern to be projected onto the substrate by the lithographic apparatus, and using the laser metric to modify operation of the laser or adjust the lithographic apparatus, and projecting the pattern onto the substrate.

公开(公告)号：NL2005548A

公开(公告)日：2011-05-23

申请号：NL2005548

申请日：2010-10-19

Applicant: ASML NETHERLANDS BV

Inventor： CLAESSENS BERT ,  DIERICHS MARCEL ,  GODFRIED HERMAN

IPC: G02B27/09 ,  G03F7/20

Abstract: A two-stage homogenizer comprising a first homogenizer stage and a second homogenizer stage. The first homogenizer stage includes a pair of microlens arrays and associated focusing optics. The second homogenizer stage includes a second pair of microlens arrays and associated focusing optics. The second homogenizer stage is positioned to receive radiation which is output from the first homogenizer stage.

公开(公告)号：NL2004942A

公开(公告)日：2011-01-31

申请号：NL2004942

申请日：2010-06-22

Applicant: ASML NETHERLANDS BV

Inventor： CLAESSENS BERT ,  VEEN PAUL ,  GODFRIED HERMAN

IPC: G03F7/20

Abstract: A lithographic apparatus including a radiation beam monitoring apparatus, the radiation beam monitoring apparatus including an optical element configured to generate a diffraction pattern, and an imaging detector located after the optical element and not in a focal plane of the optical element such that the imaging detector is capable of detecting a mixture of spatial coherence and divergence of the radiation beam.