公开(公告)号：SG136068A1

公开(公告)日：2007-10-29

申请号：SG2007017858

申请日：2007-03-09

Applicant: ASML NETHERLANDS BV

Inventor： VAN DE KERKHOF MARCUS ADRIANUS ,  JACOBS JOHANNES HENRICUS WILHE ,  UITTERDIJK TAMMO ,  LALLEMANT NICOLAS ALBAN

公开(公告)号：SG122005A1

公开(公告)日：2006-05-26

申请号：SG200506800

申请日：2005-10-19

Applicant: ASML NETHERLANDS BV

Inventor： LALLEMANT NICOLAS ALBAN ,  BECKERS MARCEL ,  HERTOG WLADIMIR FRANSISCUS GER ,  PLAS VAN DER DAVID THEODORUS W ,  KOELINK STEPHAN ,  JANSEN ROB

Abstract: A lithographic apparatus includes a radiation system for providing a beam of radiation, and a first support for supporting a patterning device. The patterning device serves to pattern the beam of radiation. The apparatus includes a second support for supporting a substrate, a projection system (5) for projecting the patterned beam onto a target portion of the substrate, and an interferometer measurement system (11) for providing an interferometric measurement beam (10) extending along an axis in an elongated volume (2) of gas extending below the projection system. The apparatus also includes a gas conditioning structure (17) for providing a conditioned gas flow (R) in the volume. The gas conditioning structure includes a plurality of gas guiding vanes (18) disposed at an outlet (19) of the structure for guiding the gas flow to the volume. The gas guiding vanes are shaped continuously and are oriented diverging away from the axis of the volume.