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    Lithographic apparatus and device manufacturing method
    1.
    发明专利
    Lithographic apparatus and device manufacturing method 有权
    LITHOGRAPHIC装置和装置制造方法

    公开(公告)号：JP2007184576A

    公开(公告)日：2007-07-19

    申请号：JP2006337301

    申请日：2006-12-14

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： SENGERS TIMOTHEUS FRANCISCUS ,  VAN ASTEN NICOLAAS ANTONIUS AL ,  BOX WILHELMUS JOSEPHUS ,  VAN EMPEL TJARKO ADRIAAN RUDOL ,  LEVASIER LEON MARTIN ,  LOOPSTRA ERIK R ,  MUITJES MARCEL JOHANNUS ELISAB ,  OUWEHAND LUBERTHUS ,  VAN DER SCHOOR LEON JOSEPH MAR ,  BECKERS MARCEL ,  JANSEN ROB ,  VAN LOENHOUT ELKE

    IPC: H01L21/027 ,  G03F7/20

    CPC classification number: G03F7/70883 ,  G03F7/7075 ,  G03F7/70858 ,  G03F9/7011 ,  G03F9/7034

    Abstract: PROBLEM TO BE SOLVED: To provide a method of highly precisely adjusting a measuring optical system of a lithographic apparatus. SOLUTION: In the lithographic apparatus, a substrate table constituted to hold a substrate is movable to transfer the substrate between a substrate measuring position and a substrate processing position. The lithographic apparatus also includes a measuring system constituted to measure at least one aspect or a characteristic of the substrate when the substrate table holds the substrate in the measuring position. The measuring system is constituted to guide at least one measuring beam and/or a field toward the front surface of the substrate. A projection system is constituted to project a patterned radiation beam onto the target of the substrate when the substrate table holds the substrate in the substrate processing position. An adjusting system is constituted to supply adjusting fluid to at least a part of the path of the measuring beam and/or the field of the measuring system to adjust the part of the path. COPYRIGHT: (C)2007,JPO&INPIT

    Abstract translation: 要解决的问题：提供一种高精度地调整光刻设备的测量光学系统的方法。 解决方案：在光刻设备中，用于保持衬底的衬底台可移动以在衬底测量位置和衬底处理位置之间传送衬底。 光刻设备还包括测量系统，该测量系统构成为当衬底台将衬底保持在测量位置时测量衬底的至少一个方面或特性。 测量系统被构造成朝向基板的前表面引导至少一个测量光束和/或场。 投影系统被构造成当衬底台将衬底保持在衬底处理位置时，将图案化的辐射束投影到衬底的靶上。 调整系统被构造成将调节流体提供给测量光束的路径的至少一部分和/或测量系统的场以调整路径的一部分。 版权所有（C）2007，JPO＆INPIT

    Lithography equipment
    3.
    发明专利
    Lithography equipment 有权
    LITHOGRAPHY设备

    公开(公告)号：JP2006140467A

    公开(公告)日：2006-06-01

    申请号：JP2005308236

    申请日：2005-10-24

    Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

    Inventor： LALLEMANT NICOLAS A ,  BECKERS MARCEL ,  HERTOG WLADIMIR FRANSISCUS GER ,  VAN DER PLAS DAVID THEODORUS W ,  KOELINK STEPHAN ,  JANSEN ROB

    IPC: H01L21/027 ,  G03F7/20

    CPC classification number: G03F7/70933

    Abstract: PROBLEM TO BE SOLVED: To provide lithography equipment comprising a gas adjustment structure for providing a gas stream adjusted to a volume extending under a projection system. SOLUTION: This lithography equipment comprises a radiation system, a second support for supporting a first support substrate supporting a patterning device for patterning a radiation beam, a projection system for projecting the patterned beam on the target of the substrate, and an interferometric measurement system for providing an interferometric measurement beam extending along an axis in an elongated volume of gas extending under the projection system. The equipment further comprises a gas adjustment structure for providing the adjusted gas stream in the volume. The gas adjustment structure comprises a plurality of gas guide vanes arranged at the outlet of the structure for guiding the gas stream to the volume. The gas guide vanes are manufactured continuously and arranged to emit the gas stream from the axis of the volume. COPYRIGHT: (C)2006,JPO&NCIPI

    Abstract translation: 要解决的问题：提供包括气体调节结构的光刻设备，用于提供调节到在投影系统下延伸的体积的气流。 解决方案：该光刻设备包括辐射系统，第二支撑件，用于支撑支撑用于图案化辐射束的图案形成装置的第一支撑基板，用于将图案化的光束投影到基板的靶上的投影系统， 测量系统，用于提供沿着延伸在投影系统下方的细长体积的气体中的轴线延伸的干涉测量光束。 该设备还包括用于在体积中提供经调节的气流的气体调节结构。 气体调节结构包括布置在结构的出口处的多个气体导向叶片，用于将气流引导到体积。 气体导向叶片连续制造并布置成从体积的轴线排出气体流。 版权所有（C）2006，JPO＆NCIPI

    Lithographic apparatus and device manufacturing method
    4.
    发明专利
    Lithographic apparatus and device manufacturing method 审中-公开
    LITHOGRAPHIC装置和装置制造方法

    公开(公告)号：JP2013098552A

    公开(公告)日：2013-05-20

    申请号：JP2012232302

    申请日：2012-10-19

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： VESTERAKEN JEAN STEVEN CHRISTIAN ,  JANSEN ROB ,  ERIK VERVOORT

    IPC: H01L21/027 ,  G03F7/20 ,  H01L21/677 ,  H01L21/683

    CPC classification number: G03F7/7075 ,  G03F7/70875

    Abstract: PROBLEM TO BE SOLVED: To improve or facilitate thermal conditioning of wafers prior to exposure in a lithographic apparatus.SOLUTION: A lithographic apparatus includes a substrate table constructed to hold a substrate; a compartment configured to receive the substrate table; a thermal conditioning unit arranged to receive a substrate to be exposed and thermally condition the substrate; and a transfer system configured for transferring the thermally conditioned substrate to the substrate table. The substrate table and the thermal conditioning unit are arranged inside the compartment of the lithographic apparatus, at least during the transfer of the thermally conditioned substrate from the thermal conditioning unit to the substrate table.

    Abstract translation: 要解决的问题：在光刻设备中曝光之前改善或促进晶片的热调节。 解决方案：光刻设备包括：构造成保持衬底的衬底台; 被配置为接收所述衬底台的室; 热调节单元，其布置成接收要暴露的基板并对所述基板进行热调节; 以及传送系统，其被配置为将经热处理的基底转移到基板台。 衬底台和热调节单元布置在光刻设备的隔室内，至少在热调节衬底从热调节单元转移到衬底台时。 版权所有（C）2013，JPO＆INPIT

    Lithographic apparatus and device manufacturing method
    6.
    发明专利
    Lithographic apparatus and device manufacturing method 有权
    LITHOGRAPHIC装置和装置制造方法

    公开(公告)号：JP2005079585A

    公开(公告)日：2005-03-24

    申请号：JP2004247637

    申请日：2004-08-27

    Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

    Inventor： DANSBERG MICHEL PIETER ,  CORNELISSEN SEBASTIAAN MARIA J ,  COX HENRIKUS HERMAN MARIE ,  VAN DIESEN ROBERT JOHANNES PET ,  KEMPER NICOLAAS RUDOLF ,  MUNNIG-SCHMIDT ROBERT-HAN ,  VEN DER SCHOOT HARMEN KLAAS ,  JANSEN ROB

    IPC: G03F7/20 ,  H01L21/027

    CPC classification number: G03F7/70933 ,  G03F7/70716 ,  G03F7/70775 ,  G03F7/7095

    Abstract: PROBLEM TO BE SOLVED: To provide a lithographic apparatus which can perform reliable position measurements.
    SOLUTION: The lithographic apparatus is comprised of a radiation system for providing a projection beam of radiation, a first support structure for supporting patterning means which serves to pattern the projection beam according to a desired pattern, a second support structure for supporting a substrate, and a projection system for projecting the patterned beam onto a target portion of the substrate. At least one of the first and second support structures is comprised of a planar base, a movable stage for supporting the patterning means or the substrate that can be moved over said planar base, and an actuator for providing said movement of the stage. A lithographic projection apparatus is further comprised of a contactless position measuring device for performing the position measurement of the stage, and a first pump for generating a conditioned gas flow in a volume between the measuring device and said stage for improving the position measurement. The base comprises a plurality of gas channels provided in the base in order to provide a gas flow path of the gas flow through the gas channels in the base.
    COPYRIGHT: (C)2005,JPO&NCIPI

    Abstract translation: 要解决的问题：提供可执行可靠位置测量的光刻设备。 解决方案：光刻设备由用于提供投影辐射束的辐射系统组成，用于支撑图案化装置的第一支撑结构，其用于根据期望的图案图案化投影光束;第二支撑结构，用于支撑 基板和用于将图案化的光束投影到基板的目标部分上的投影系统。 第一和第二支撑结构中的至少一个包括平面基座，用于支撑图案化装置的可移动台架或可在所述平面基座上移动的基板，以及用于提供台架运动的致动器。 光刻投影装置还包括用于执行台的位置测量的非接触位置测量装置和用于在测量装置和所述台之间产生调节气流的第一泵，用于改善位置测量。 基部包括设置在基座中的多个气体通道，以便提供通过基座中的气体通道的气流的气体流动路径。 版权所有（C）2005，JPO＆NCIPI

    Lithographic apparatus
    7.
    发明专利
    Lithographic apparatus 未知

    公开(公告)号：SG122005A1

    公开(公告)日：2006-05-26

    申请号：SG200506800

    申请日：2005-10-19

    Applicant: ASML NETHERLANDS BV

    Inventor： LALLEMANT NICOLAS ALBAN ,  BECKERS MARCEL ,  HERTOG WLADIMIR FRANSISCUS GER ,  PLAS VAN DER DAVID THEODORUS W ,  KOELINK STEPHAN ,  JANSEN ROB

    Abstract: A lithographic apparatus includes a radiation system for providing a beam of radiation, and a first support for supporting a patterning device. The patterning device serves to pattern the beam of radiation. The apparatus includes a second support for supporting a substrate, a projection system (5) for projecting the patterned beam onto a target portion of the substrate, and an interferometer measurement system (11) for providing an interferometric measurement beam (10) extending along an axis in an elongated volume (2) of gas extending below the projection system. The apparatus also includes a gas conditioning structure (17) for providing a conditioned gas flow (R) in the volume. The gas conditioning structure includes a plurality of gas guiding vanes (18) disposed at an outlet (19) of the structure for guiding the gas flow to the volume. The gas guiding vanes are shaped continuously and are oriented diverging away from the axis of the volume.

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