公开(公告)号：JP2005333152A

公开(公告)日：2005-12-02

申请号：JP2005172914

申请日：2005-05-17

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： LALLEMANT NICOLAS A ,  VERHAGEN MARTINUS CORNELIS MAR ,  BECKERS MARCEL ,  STULTIENS RONALD ,  SMITS PASCAL A ,  HERTOG WLADIMIR FRANSISCUS GER ,  VAN DER PLAS DAVID THEODORUS W ,  KOELINK STEPHAN ,  KRUS HENK

IPC: G03F7/20 ,  H01L21/027

CPC classification number: G03F7/70933

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic system in which the area below a projection system is more properly covered by an air shower system.
SOLUTION: The lithographic apparatus comprises: a radiation system 1 for supplying projection beam of radiation; a first support structure for supporting a patterning means that serves to pattern the projection beam according to a desired pattern; a second support structure for supporting a substrate 3; a projection system for projecting the patterned beam onto a target portion of the substrate; and at least one gas generation structure 7 for generating gas flows 5S, 5T conditioned to attain to the volume defined between the projection system and the target portion of the substrate. The gas generation structure 7 is arranged to generate gas flows guided toward an upper volume located generally above the lower surface 4 of the projection system. This structure is further provided with a guiding element 8 for guiding the gas flows to the lower volume located generally below the lower surface of the projection system.
COPYRIGHT: (C)2006,JPO&NCIPI

Abstract translation: 要解决的问题：提供一种光刻系统，其中投影系统下方的区域被空气淋浴系统更适当地覆盖。 解决方案：光刻设备包括：辐射系统1，用于提供投影射束; 用于支撑用于根据期望图案对投影光束进行图案化的图案形成装置的第一支撑结构; 用于支撑衬底3的第二支撑结构; 投影系统，用于将图案化的光束投影到基板的目标部分上; 以及用于产生气体流5S，5T的至少一个气体产生结构7，其被调节到达到在投影系统和基板的目标部分之间限定的体积。 气体生成结构7被布置成产生朝向投影系统的大致在下表面4的上方定位的上部体积引导的气流。 该结构还设置有用于将气体流引导到大体位于投影系统的下表面下方的下部体积的引导元件8。 版权所有（C）2006，JPO＆NCIPI

公开(公告)号：JP2006140467A

公开(公告)日：2006-06-01

申请号：JP2005308236

申请日：2005-10-24

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： LALLEMANT NICOLAS A ,  BECKERS MARCEL ,  HERTOG WLADIMIR FRANSISCUS GER ,  VAN DER PLAS DAVID THEODORUS W ,  KOELINK STEPHAN ,  JANSEN ROB

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70933

Abstract: PROBLEM TO BE SOLVED: To provide lithography equipment comprising a gas adjustment structure for providing a gas stream adjusted to a volume extending under a projection system. SOLUTION: This lithography equipment comprises a radiation system, a second support for supporting a first support substrate supporting a patterning device for patterning a radiation beam, a projection system for projecting the patterned beam on the target of the substrate, and an interferometric measurement system for providing an interferometric measurement beam extending along an axis in an elongated volume of gas extending under the projection system. The equipment further comprises a gas adjustment structure for providing the adjusted gas stream in the volume. The gas adjustment structure comprises a plurality of gas guide vanes arranged at the outlet of the structure for guiding the gas stream to the volume. The gas guide vanes are manufactured continuously and arranged to emit the gas stream from the axis of the volume. COPYRIGHT: (C)2006,JPO&NCIPI

Abstract translation: 要解决的问题：提供包括气体调节结构的光刻设备，用于提供调节到在投影系统下延伸的体积的气流。 解决方案：该光刻设备包括辐射系统，第二支撑件，用于支撑支撑用于图案化辐射束的图案形成装置的第一支撑基板，用于将图案化的光束投影到基板的靶上的投影系统， 测量系统，用于提供沿着延伸在投影系统下方的细长体积的气体中的轴线延伸的干涉测量光束。 该设备还包括用于在体积中提供经调节的气流的气体调节结构。 气体调节结构包括布置在结构的出口处的多个气体导向叶片，用于将气流引导到体积。 气体导向叶片连续制造并布置成从体积的轴线排出气体流。 版权所有（C）2006，JPO＆NCIPI

公开(公告)号：NL2007182A

公开(公告)日：2012-02-27

申请号：NL2007182

申请日：2011-07-26

Applicant: ASML NETHERLANDS BV

Inventor： WILLEMS PAUL ,  KATE NICOLAAS ,  KOELINK STEPHAN ,  KRAMER PIETER ,  KUIJPER ANTHONIE ,  ZDRAVKOV ALEXANDER ,  CORTIE ROGIER

IPC: G03F7/20

公开(公告)号：SG122005A1

公开(公告)日：2006-05-26

申请号：SG200506800

申请日：2005-10-19

Applicant: ASML NETHERLANDS BV

Inventor： LALLEMANT NICOLAS ALBAN ,  BECKERS MARCEL ,  HERTOG WLADIMIR FRANSISCUS GER ,  PLAS VAN DER DAVID THEODORUS W ,  KOELINK STEPHAN ,  JANSEN ROB

Abstract: A lithographic apparatus includes a radiation system for providing a beam of radiation, and a first support for supporting a patterning device. The patterning device serves to pattern the beam of radiation. The apparatus includes a second support for supporting a substrate, a projection system (5) for projecting the patterned beam onto a target portion of the substrate, and an interferometer measurement system (11) for providing an interferometric measurement beam (10) extending along an axis in an elongated volume (2) of gas extending below the projection system. The apparatus also includes a gas conditioning structure (17) for providing a conditioned gas flow (R) in the volume. The gas conditioning structure includes a plurality of gas guiding vanes (18) disposed at an outlet (19) of the structure for guiding the gas flow to the volume. The gas guiding vanes are shaped continuously and are oriented diverging away from the axis of the volume.