公开(公告)号：SG183603A1

公开(公告)日：2012-09-27

申请号：SG2012003877

申请日：2012-01-18

Applicant: ASML NETHERLANDS BV

Inventor： LAFARRE RAYMOND WILHELMUS LOUIS ,  TEN KATE NICOLAAS ,  DZIOMKINA NINA VLADIMIROVNA ,  KARADE YOGESH PRAMOD ,  TROMP SIEGFRIED ALEXANDER ,  LEIJSSEN JACOBUS JOSEPHUS ,  RODENBURG ELISABETH CORINNE ,  FEIJTS MAURICE WILHELMUS LEONARDUS HENDRICUS ,  HUISMAN HENDRIK

Abstract: A substrate holder for a lithographic apparatus has a planarization layer provided on a surface thereof. The planarization layer provides a smooth surface for the formation of a thin film stack forming an electronic component. The thin film stack comprises an (optional) isolation layer, a metal layer forming an electrode, a sensor, a heater, a transistor or a logic device, and a top isolation layer. Fig. 20