公开(公告)号：SG11201609284TA

公开(公告)日：2016-12-29

申请号：SG11201609284T

申请日：2015-04-24

Applicant: ASML NETHERLANDS BV

Inventor： BERENDSEN CHRISTIANUS WILHELMUS JOHANNES ,  BECKERS MARCEL ,  CASTELIJNS HENRICUS JOZEF ,  GERAETS HUBERTUS ANTONIUS ,  KOEVOETS ADRIANUS HENDRIK ,  LEVASIER LEON MARTIN ,  SCHAAP PETER ,  STREEFKERK BOB ,  TROMP SIEGFRIED ALEXANDER

IPC: G03F7/20

Abstract: A method for compensating for an exposure error in an exposure process of a lithographic apparatus that comprises a substrate table, the method comprising: obtaining a dose measurement indicative of a dose of IR radiation that reaches substrate level, wherein the dose measurement can be used to calculate an amount of IR radiation absorbed by an object in the lithographic apparatus during an exposure process; and using the dose measurement to control the exposure process so as to compensate for an exposure error associated with the IR radiation absorbed by the object during the exposure process.

公开(公告)号：SG183603A1

公开(公告)日：2012-09-27

申请号：SG2012003877

申请日：2012-01-18

Applicant: ASML NETHERLANDS BV

Inventor： LAFARRE RAYMOND WILHELMUS LOUIS ,  TEN KATE NICOLAAS ,  DZIOMKINA NINA VLADIMIROVNA ,  KARADE YOGESH PRAMOD ,  TROMP SIEGFRIED ALEXANDER ,  LEIJSSEN JACOBUS JOSEPHUS ,  RODENBURG ELISABETH CORINNE ,  FEIJTS MAURICE WILHELMUS LEONARDUS HENDRICUS ,  HUISMAN HENDRIK

Abstract: A substrate holder for a lithographic apparatus has a planarization layer provided on a surface thereof. The planarization layer provides a smooth surface for the formation of a thin film stack forming an electronic component. The thin film stack comprises an (optional) isolation layer, a metal layer forming an electrode, a sensor, a heater, a transistor or a logic device, and a top isolation layer. Fig. 20