Patent search ap:("ASML NETHERLANDS BV") AND inv:"LUEHRMANN PAUL" Page 1

1.

发明专利
LITHOGRAPHY SYSTEM AND A MACHINE LEARNING CONTROLLER FOR SUCH A LITHOGRAPHY SYSTEM. 未知

公开(公告)号：NL2013249A

公开(公告)日：2015-02-23

申请号：NL2013249

申请日：2014-07-24

Applicant: ASML NETHERLANDS BV

Inventor： SCHMITT-WEAVER EMIL , HENKE WOLFGANG , HOOGENBOOM THOMAS , IZIKSON PAVEL , LUEHRMANN PAUL , SLOTBOOM DAAN , STAECKER JENS , YPMA ALEXANDER

IPC: G03F7/20

2.

发明专利
METHOD OF CALIBRATING A LITHOGRAPHIC APPARATUS, DEVICE MANUFACTURING METHOD AND ASSOCIATED DATA PROCESSING APPARATUS AND COMPUTER PROGRAM PRODUCT. 未知

公开(公告)号：NL2011683A

公开(公告)日：2014-06-16

申请号：NL2011683

申请日：2013-10-29

Applicant: ASML NETHERLANDS BV

Inventor： SCHMITT-WEAVER EMIL , HENKE WOLFGANG , KEA MARC , LUEHRMANN PAUL

IPC: G03F7/20

3.

发明专利
METHOD OF OPERATING A LITHOGRAPHIC APPARATUS, DEVICE MANUFACTURING METHOD AND ASSOCIATED DATA PROCESSING APPARATUS AND COMPUTER PROGRAM PRODUCT. 未知

公开(公告)号：NL2011687A

公开(公告)日：2014-06-17

申请号：NL2011687

申请日：2013-10-29

Applicant: ASML NETHERLANDS BV

Inventor： SCHMITT-WEAVER EMIL , BOON EDUARDUS , HENKE WOLFGANG , KEA MARC , LUEHRMANN PAUL , SLOTBOOM DAAN , DAMME JEAN-PHILIPPE , YPMA ALEXANDER

IPC: G03F7/20

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