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    Lithographic apparatus and liquid removal method
    4.
    发明专利
    Lithographic apparatus and liquid removal method 有权
    液晶显示装置和液体去除方法

    公开(公告)号：JP2011249815A

    公开(公告)日：2011-12-08

    申请号：JP2011132836

    申请日：2011-06-15

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： HERNES JACOBS ,  ERIK R LOOPSTRA ,  RIEPEN MICHAEL ,  MONDT EVA

    IPC: H01L21/027 ,  G03F7/20

    CPC classification number: G03F7/70341

    Abstract: PROBLEM TO BE SOLVED: To provide a system and a method to remove liquid from a substrate table, especially from a gap between a substrate table and a substrate.SOLUTION: A method to remove liquid from a substrate W supported on a substrate table WT and from a gap between the substrate W and the substrate table WT provides a liquid removal device 200 connected to a low pressure source which has at least one outlet 210 to form a slender extraction part 210 of a prescribed geometric shape. The method includes relatively moving the substrate table WT and the liquid removal device 200 so that the extraction part 210 passes through the substrate W and all the gaps 100 and virtually a local part of the extraction part 210 has the local tangent at an angle between about 35° and 90° in relation to the local tangent of the gap 100 at a non-dry marginal part of the gap 100 at an optional time on a plane surface.

    Abstract translation: 要解决的问题：提供一种从衬底台移除液体的系统和方法，特别是从衬底台和衬底之间的间隙。 解决方案：从衬底台WT上支撑的衬底W以及从衬底W和衬底台WT之间的间隙移除液体的方法提供连接到低压源的液体去除装置200，该液体去除装置200具有至少一个 出口210以形成规定几何形状的细长提取部分210。 该方法包括相对移动衬底台WT和液体去除装置200，使得提取部分210通过衬底W，并且所有间隙100和实际上提取部分210的局部部分的局部切线在约 35°和90°相对于间隙100的非干燥边缘部分处的间隙100的局部切线，在平面上的任选时间。 版权所有（C）2012，JPO＆INPIT

    Substrate table, lithographic apparatus, and device manufacturing method
    6.
    发明专利
    Substrate table, lithographic apparatus, and device manufacturing method 有权
    基板，平面设备和器件制造方法

    公开(公告)号：JP2009295979A

    公开(公告)日：2009-12-17

    申请号：JP2009126050

    申请日：2009-05-26

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： MONDT EVA ,  GILISSEN NOUD JAN ,  JACOBS HERNES ,  KATE NICOLAAS TEN ,  LOOPSTRA ERIK ROELOF ,  VERMAELEN MARKUS MARTINUS PETR ,  RIEPEN MICHEL

    IPC: H01L21/027

    CPC classification number: G03F7/70341 ,  G03F7/707

    Abstract: PROBLEM TO BE SOLVED: To disclose a table in which measures are taken to seal between the table and an edge of an object, in use, supported on the table.
    SOLUTION: In particular, a capillary passage is formed between the object on the table and the table itself. A meniscus pinning feature and/or the presence of an overpressure at the radially inward side of the capillary passage holds the liquid in the passage and helps prevent it from advancing further radially inwardly. The features to perform this function may be associated with or formed in a member surrounding the object. The member may be thermally decoupled from a part of the table.
    COPYRIGHT: (C)2010,JPO&INPIT

    Abstract translation: 要解决的问题：公开一种表格，其中采用措施来将桌子和使用中的物体的边缘密封在桌子上。 具体而言，在台面上的物体与桌子本身之间形成毛细通道。 在毛细管通道的径向向内的弯液面钉扎特征和/或超压存在使通道中的液体保持在通道中并有助于防止其进一步向内径向前进。 执行该功能的特征可以与围绕对象的构件相关联或形成在其中。 该构件可以与桌子的一部分热分离。 版权所有（C）2010，JPO＆INPIT

    Lithographic equipment and liquid removing method
    7.
    发明专利
    Lithographic equipment and liquid removing method 有权
    LITHOGRAPHIC EQUIPMENT和液体清除方法

    公开(公告)号：JP2008205465A

    公开(公告)日：2008-09-04

    申请号：JP2008032818

    申请日：2008-02-14

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： JACOBS HERNES ,  LOOPSTRA ERIK R ,  RIEPEN MICHEL ,  MONDT EVA

    IPC: H01L21/027

    CPC classification number: G03F7/70341

    Abstract: PROBLEM TO BE SOLVED: To provide a system for removing a liquid from a substrate table, in particular, from a gap between the substrate table and a substrate, and to provide a method therefor.
    SOLUTION: In the liquid removing method, the liquid is removed from the substrate held on the substrate table and from the gap between the substrate and the substrate table. A liquid removing device is provided with at least one outlet port, forming a predetermined geometric long and thin extractor; the substrate table is moved relative to the liquid removing device so that the extractor passes all through the substrate and the gap; and that the local tangent in the local portion of the extractor at the end of non-dry portion in the gap substantially holds the angle between about 35° and 90° on a planar view, at arbitrary times with respect to that in the gap.
    COPYRIGHT: (C)2008,JPO&INPIT

    Abstract translation: 要解决的问题：提供一种用于从衬底台，特别是从衬底台和衬底之间的间隙去除液体的系统，并提供其方法。 解决方案：在液体去除方法中，液体从保持在基板台上的基板和基板与基板台之间的间隙移除。 液体去除装置设置有至少一个出口，形成预定的几何长薄抽提器; 衬底台相对于液体去除装置移动，使得提取器全部通过衬底和间隙; 并且在间隙中非干燥部分末端处的提取器的局部部分中的局部切线在平面视图上基本上保持约35°至90°之间的角度，相对于间隙中的任意时间。 版权所有（C）2008，JPO＆INPIT

    Lithographic apparatus and method
    8.
    发明专利
    Lithographic apparatus and method 有权
    LITHOGRAPHIC设备和方法

    公开(公告)号：JP2008153652A

    公开(公告)日：2008-07-03

    申请号：JP2007315494

    申请日：2007-12-06

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： JACOBS HERNES ,  MONDT EVA ,  ZDRAVKOV ALEXANDER NIKOLOV

    IPC: H01L21/027 ,  G03F7/20

    CPC classification number: G03F7/70341 ,  G03F7/707

    Abstract: PROBLEM TO BE SOLVED: To provide a lithographic apparatus and a lithographic method which can reduce passage of air through liquid or contamination of the liquid. SOLUTION: The lithographic apparatus comprises a substrate table for holding a substrate, a projection system for projecting a patterned radiation beam projected on the substrate, a liquid supplying system which supplies liquid to a space between the projection system, the substrate table, and the substrate, and a sealing prepared to the substrate table. The sealing can be operated from opened configuration to closed configuration, and in closed configuration, when a substrate is on the substrate table, the sealing closes a gap between them. COPYRIGHT: (C)2008,JPO&INPIT

    Abstract translation: 要解决的问题：提供可以减少空气通过液体或液体污染的光刻设备和光刻方法。 解决方案：光刻设备包括用于保持基板的基板台，用于投影投影在基板上的图案化辐射束的投影系统，将液体供应到投影系统，基板台之间的空间的液体供应系统， 和衬底，以及准备到衬底台的密封。 密封可以从打开的构型操作到闭合构型，并且在封闭构造中，当衬底位于衬底台上时，密封封闭它们之间的间隙。 版权所有（C）2008，JPO＆INPIT

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