Patent search ap:("ASML NETHERLANDS BV") AND inv:"ROOY MICHEL" Page 1

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发明专利
PRODUCING A MARKER PATTERN AND MEASUREMENT OF AN EXPOSURE-RELATED PROPERTY OF AN EXPOSURE APPARATUS. 未知

公开(公告)号：NL2004897A

公开(公告)日：2010-12-27

申请号：NL2004897

申请日：2010-06-16

Applicant: ASML NETHERLANDS BV

Inventor： QUAEDACKERS JOHANNES , HINNEN PAUL , HEIJDEN EDDY , ROOY MICHEL , LEEWIS CHRISTIAN

IPC: G01N21/47 , G03F7/20 , H01L23/544

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