Patent search ap:("ASML NETHERLANDS BV") AND inv:"QUAEDACKERS JOHANNES" Page 1

1.

发明专利
A METHOD OF DETERMINING A CHARACTERISTIC. 未知

公开(公告)号：NL2003990A

公开(公告)日：2010-07-01

申请号：NL2003990

申请日：2009-12-21

Applicant: ASML NETHERLANDS BV

Inventor： MEGENS HENRICUS , KIERS ANTOINE , FINDERS JOZEF , QUAEDACKERS JOHANNES , SCHAAR MAURITS , VERSTAPPEN LEONARDUS , LEEWIS CHRISTIAN , LAARHOVEN HENDRIK

IPC: G01N21/47 , G03F7/20

2.

发明专利
INSPECTION METHOD AND APPARATUS, LITHOGRAPHIC APPARATUS, LITHOGRAPHIC PROCESSING CELL, DEVICE MANUFACTURING METHOD, AND 2-D ZEBRA TARGET DESIGN FOR MEASURING FOCUS AND DOSE. 未知

公开(公告)号：NL2003589A

公开(公告)日：2010-04-07

申请号：NL2003589

申请日：2009-10-05

Applicant: ASML NETHERLANDS BV

Inventor： LEEWIS CHRISTIAN , CRAMER HUGO , KERKHOF MARCUS , QUAEDACKERS JOHANNES , MATTHEUS CHRISTINE

IPC: G03F7/20 , H01L23/544

3.

发明专利
METHOD AND APPARATUS FOR OVERLAY MEASUREMENT. 未知

公开(公告)号：NL2005510A

公开(公告)日：2011-06-16

申请号：NL2005510

申请日：2010-10-13

Applicant: ASML NETHERLANDS BV

Inventor： MEGENS HENRICUS , QUAEDACKERS JOHANNES , LEEWIS CHRISTIAN , VANOPPEN PETER

IPC: G01N21/47 , G03F7/20

4.

发明专利
PRODUCING A MARKER PATTERN AND MEASUREMENT OF AN EXPOSURE-RELATED PROPERTY OF AN EXPOSURE APPARATUS. 未知

公开(公告)号：NL2004897A

公开(公告)日：2010-12-27

申请号：NL2004897

申请日：2010-06-16

Applicant: ASML NETHERLANDS BV

Inventor： QUAEDACKERS JOHANNES , HINNEN PAUL , HEIJDEN EDDY , ROOY MICHEL , LEEWIS CHRISTIAN

IPC: G01N21/47 , G03F7/20 , H01L23/544

5.

发明专利
A METHOD OF MEASURING A CHARACTERISTIC. 未知

公开(公告)号：NL2004276A

公开(公告)日：2010-09-06

申请号：NL2004276

申请日：2010-02-22

Applicant: ASML NETHERLANDS BV

Inventor： QUAEDACKERS JOHANNES , HINNEN PAUL , KIERS ANTOINE , LEEWIS CHRISTIAN

IPC: G01N21/47 , G03F7/20

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