公开(公告)号：SG159467A1

公开(公告)日：2010-03-30

申请号：SG2009054792

申请日：2009-08-17

Applicant: ASML NETHERLANDS BV

Inventor： TANASA GHEORGHE ,  TEN KATE NICOLAAS ,  VERMEULEN JOHANNES PETRUS MARTINUS BERNARDUS ,  PHILIPS DANNY MARIA HUBERTUS ,  SCHEPERS MAIKEL ADRIANUS CORNERLIS ,  VAN BOKHOVEN LAURENTIUS JOHANNES ADRIANUS

Abstract: A fluid handling structure is disclosed which is designed for all wet immersion lithography. The fluid handling structure has a first opening to provide fluid to a space between a final element of a projection system and a substrate and/or substrate table, a barrier to resist the flow of liquid out of the space between the fluid handling structure and the substrate, and a second opening, which opens into an area radially outwardly of the space, to provide a flow of fluid from the fluid handling structure onto a top surface of the substrate and/or substrate table radially outwardly of the space. A controller may be provided such that flow of fluid towards a center of the substrate table is greater than the flow of fluid in a direction away from the center of the substrate table. [Figure 6]