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    Fluid handling structure, lithographic apparatus, and method of manufacturing device
    2.
    发明专利
    Fluid handling structure, lithographic apparatus, and method of manufacturing device 有权
    流体处理结构，光刻设备及其制造方法

    公开(公告)号：JP2010062558A

    公开(公告)日：2010-03-18

    申请号：JP2009195469

    申请日：2009-08-26

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： TANASA GHEORGHE ,  KATE NICOLAAS TEN ,  VERMEULEN JOHANNES PETRUS MARTINUS ,  DANNY MARIA HUBERTUS PHILIPS ,  MAIKEL ADRIANUS CORNELIS SCHEPERS ,  VAN BOKHOVEN LAURENTIUS JOHANNES ADRIANUS

    IPC: H01L21/027 ,  G03F7/20

    CPC classification number: G03F7/70341 ,  Y10T137/87169

    Abstract: PROBLEM TO BE SOLVED: To disclose a fluid handling structure designed for all wet liquid immersion lithography. SOLUTION: The fluid handling structure has: a first opening for providing a fluid to a space between the final element of a projection system and a substrate and/or a substrate table; a barrier for preventing a liquid flow coming out of a space between the fluid handling structure and the substrate; and a second opening for being open to the radial outer side of the space and providing a fluid flow to the upper surface of the substrate and/or the substrate table on the radial outer side of the space from the fluid handling structure. A controller can be set so that a fluid flow going toward the center of the substrate table becomes larger than a fluid flow in a direction apart from the center of the substrate table. COPYRIGHT: (C)2010,JPO&INPIT

    Abstract translation: 要解决的问题：公开为所有湿液浸光刻设计的流体处理结构。 流体处理结构具有：用于向投影系统的最终元件与基板和/或基板台之间的空间提供流体的第一开口; 用于防止从流体处理结构和基板之间的空间流出的液体流动的屏障; 以及第二开口，用于向所述空间的径向外侧开口，并且在所述空间的径向外侧处设置有从所述流体处理结构到所述基板和/或所述基板台的上表面的流体流。 可以设置控制器，使得朝向衬底台的中心的流体流变得大于离开衬底台的中心的方向上的流体流动。 版权所有（C）2010，JPO＆INPIT

    Lithography device and method of operating lithography device
    3.
    发明专利
    Lithography device and method of operating lithography device 有权
    LITHOGRAPHY设备和操作LITHOGRAPHY设备的方法

    公开(公告)号：JP2010074159A

    公开(公告)日：2010-04-02

    申请号：JP2009208753

    申请日：2009-09-10

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： BRUIJSTENS JEROEN PETER JOHANNES ,  BRULS RICHARD JOSEPH ,  JANSEN HANS ,  SIEBE LANDHEER ,  MEESTER ARNOUT JOHANNES ,  JANSEN BAUKE ,  THOMAS IVO ADAM JOHANNES ,  MIRANDA MARCIO ALEXANDRE CANO ,  TANASA GHEORGHE

    IPC: H01L21/027

    Abstract: PROBLEM TO BE SOLVED: To provide a system that reduces an influence of a droplet on a final optical element, or substantially avoids the formation of such a droplet. SOLUTION: This lithography device includes: a projection system PS; and a liquid confinement structure for at least partially confining an immersion liquid in an immersion space demarcated by the projection system, a liquid confinement structure 12, and also a substrate and/or a substrate table. A wet gas space for confining a wet gas is demarcated among the projection system, the liquid confinement structure, and the immersion liquid in the immersion space. COPYRIGHT: (C)2010,JPO&INPIT

    Abstract translation: 要解决的问题：提供一种降低液滴对最终光学元件的影响的系统，或基本避免形成这样的液滴。 解决方案：该光刻设备包括：投影系统PS; 以及用于至少部分地将浸没液体限制在由投影系统划分的浸没空间中的液体限制结构，液体限制结构12以及基底和/或基底台。 在投影系统，液体限制结构和浸没空间中的浸没液体之间划定用于限制湿气体的湿气空间。 版权所有（C）2010，JPO＆INPIT

    Lithographic device, and method of manufacturing device
    5.
    发明专利
    Lithographic device, and method of manufacturing device 有权
    光刻设备及其制造方法

    公开(公告)号：JP2011003900A

    公开(公告)日：2011-01-06

    申请号：JP2010137799

    申请日：2010-06-17

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： JACOBS JOHANNES HENRICUS WILHELMUS ,  JANSEN HANS ,  BRUIJSTENS JEROEN PETER JOHANNES ,  THOMAS IVO ADAM JOHANNES ,  KUSTERS GERARDUS ADRIANUS ANTONIUS MARIA ,  MIRANDA MARCIO ALEXANDRE CANO ,  TANASA GHEORGHE

    IPC: H01L21/027

    CPC classification number: G03F7/70341

    Abstract: PROBLEM TO BE SOLVED: To provide an immersion lithographic device capable of keeping the position of a liquid as constant as possible by controlling the position of an immersion liquid in the immersion lithographic device.SOLUTION: The immersion lithographic device includes a curved surface that is curved so that drainage force of surface tension acts in a certain direction on a film of an immersion liquid on the curved surface. In relation to a liquid trapping structure constructed or configured to trap a liquid in an immersion space between a final element of a projection system and a board table and/or a board supported to the board table, a liquid trapping structure is also provided including a curved surface that is curved so that drainage force of surface tension acts in a certain direction on a film of an immersion liquid on the curved surface.

    Abstract translation: 要解决的问题：提供一种能够通过控制浸没式光刻设备中的浸液的位置来保持液体位置尽可能恒定的浸没式光刻设备。解决方案：浸没式光刻设备包括弯曲的曲面 使得表面张力的排水力在弯曲表面上的浸没液体的膜上沿某一方向作用。 关于构造或构造成将液体捕获到投影系统的最终元件和板台之间的浸没空间中的液体捕获结构和/或支撑在板台上的板，还提供了液体捕获结构，其包括 弯曲的曲面，使得表面张力的排水力在一定方向上作用在弯曲表面上的浸没液体的膜上。

    Lithographic apparatus, and method of operating the apparatus
    6.
    发明专利
    Lithographic apparatus, and method of operating the apparatus 有权
    平面设备和操作设备的方法

    公开(公告)号：JP2011018883A

    公开(公告)日：2011-01-27

    申请号：JP2010099338

    申请日：2010-04-23

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： THOMAS IVO ADAM JOHANNES ,  SIEBE LANDHEER ,  MEESTER ARNOUT JOHANNES ,  MIRANDA MARCIO ALEXANDRE CANO ,  TANASA GHEORGHE

    IPC: H01L21/027

    CPC classification number: G03F7/70341 ,  G03B27/52 ,  G03F7/70891

    Abstract: PROBLEM TO BE SOLVED: To provide a system for reducing the effect of an interface between a last optical element and droplets and/or a gas and a liquid, on the last optical element.SOLUTION: A lithographic apparatus includes: a projection system; and a liquid confinement structure configured to at least partly confine immersion liquid to an immersion space defined by the projection system, the liquid confinement structure and a substrate and/or a substrate table. Here, a measure is taken to reduce the effect of droplets and/or a liquid film on the last optical element of the projection system.

    Abstract translation: 要解决的问题：提供一种用于减少最后光学元件与液滴和/或气体和液体之间的界面对最后光学元件的影响的系统。解决方案：光刻设备包括：投影系统; 以及液体限制结构，其被配置为至少部分地将浸没液体限制在由所述投影系统，所述液体限制结构以及衬底和/或衬底台限定的浸没空间中。 这里，采取措施来减少液滴和/或液膜对投影系统的最后一个光学元件的影响。

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