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    LITHOGRAPHIC APPARATUS
    2.
    发明申请
    LITHOGRAPHIC APPARATUS 审中-公开
    LITHOGRAPHIC设备

    公开(公告)号：WO2014122151A3

    公开(公告)日：2014-11-20

    申请号：PCT/EP2014052204

    申请日：2014-02-05

    Applicant: ASML HOLDING NV ,  ASML NETHERLANDS BV

    Inventor： DELPUERTO SANTIAGO E ,  LIPSON MATTHEW ,  HENDERSON KENNETH ,  LAFARRE RAYMOND ,  MARKOYA LOUIS JOHN ,  UITTERDIJK TAMMO ,  VERMEULEN JOHANNES PETRUS MARTINUS BERNARDUS ,  DE GROOT ANTONIUS FRANCISCUS JOHANNES ,  VAN DER WILK RONALD

    IPC: G03F7/20

    CPC classification number: G03F7/70875 ,  G03F7/70708 ,  H01L21/67109 ,  H01L21/6831 ,  H01L21/6875

    Abstract: A support such as a clamp (310) is configured to releasably hold a patterning device such as a reticle (300) to secure it and prevent heat-induced deformation of it. For example, an electrostatic clamp includes a first substrate (312) having opposing first (313) and second (315) surfaces, a plurality of burls (316) located on the first surface and configured to contact the reticle, a second substrate (314) having opposing first (317) and second (319) surfaces. The first surface of the second substrate is coupled to the second surface of the first substrate. A plurality of cooling elements (318) are located between the first surface of the second substrate and the second surface of the first substrate. The cooling elements are configured to cause electrons to travel from the second surface of the first substrate to the first surface of the second substrate. Each cooling element is substantially aligned with a respective burl.

    Abstract translation: 诸如夹具（310）的支撑件构造成可释放地保持诸如掩模版（300）的图案形成装置以将其固定并防止其热引起的变形。 例如，静电夹具包括具有相对的第一（313）和第二（315）表面的第一基底（312），位于第一表面上并被构造成接触光罩的多个毛刺（316），第二基底 ）具有相对的第一（317）和第二（319）表面。 第二衬底的第一表面耦合到第一衬底的第二表面。 多个冷却元件（318）位于第二基板的第一表面和第一基板的第二表面之间。 冷却元件构造成使电子从第一衬底的第二表面移动到第二衬底的第一表面。 每个冷却元件基本上与相应的毛刺对齐。

    LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    6.
    发明专利
    LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 未知

    公开(公告)号：SG182052A1

    公开(公告)日：2012-07-30

    申请号：SG2011085982

    申请日：2011-11-21

    Applicant: ASML NETHERLANDS BV

    Inventor： VERMEULEN JOHANNES PETRUS MARTINUS BERNARDUS ,  DE GROOT ANTONIUS FRANCISCUS JOHANNES ,  CADEE THEODORUS PETRUS MARIA ,  DE BOEIJ JEROEN

    Abstract: Lithography apparatus comprising a projection system a carrier; and a drive system for moving the carrier relative to the projection system in a plane defined by reference to orthogonal axes X and Y, wherein: the drive system comprises: a shuttle constructed and arranged to move parallel to the Y-axis; a shuttle connector for connecting the shuttle to the carrier, the shuttle connector being such as to allow movement of the carrier in a direction parallel to the X-axis relative to the shuttle; and a shuttle driver for driving movement of the shuttle parallel to the Y-axis, wherein: the shuttle is located to one side only of the carrier in a direction parallel to the X-axis and only one of the shuttle is connected to the carrier; and the shuttle driver and shuttle connector are configured to supply at least 10% of the Y-component of forces applied to the carrier by the drive system.Fig. 1

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