公开(公告)号：JP2005340825A

公开(公告)日：2005-12-08

申请号：JP2005150621

申请日：2005-05-24

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： BECKERS MARCEL ,  HULTERMANS RONALD J ,  KATE NICOLAAS TEN ,  KEMPER NICOLAAS R ,  KOPPELAARS NICOLAAS F ,  SCHOTSMAN JAN-MARIUS ,  DER HAM RONALD V ,  VAN UIJTREGT JOHANNES ANTONIUS

IPC: G03F7/20 ,  H01L21/027

CPC classification number: G03F7/70933 ,  G03F7/70908

Abstract: PROBLEM TO BE SOLVED: To provide a lithography device having a gas flushing device.
SOLUTION: The lithography device includes a lighting system which supplies projection beams, and a support structure which supports a patterning device useful for supplying beams having a pattern in the section thereof. The lithography device also has a gas flushing device which flushes a practically layered gas flow across the projection beams and/or along the surface of optical components and includes a single gas exit having an inner rim on the downstream end thereof. The inner rim demarcates the entire area of the gas exit, which is equipped with a laminator having an effective area where the layered gas flow practically comes out therefrom when the gas is used. The effective area of the laminator has a laminator opening and includes a material at least having the same size as the entire area of the gas exit.
COPYRIGHT: (C)2006,JPO&NCIPI

Abstract translation: 要解决的问题：提供一种具有气体冲洗装置的光刻装置。 解决方案：光刻设备包括提供投影光束的照明系统，以及支撑结构，其支撑用于在其部分中提供具有图案的光束的图案形成装置。 光刻装置还具有气体冲洗装置，其冲刷跨越投影束和/或沿着光学部件的表面的实际分层的气流，并且包括在其下游端具有内缘的单个气体出口。 内缘划分出气体出口的整个区域，该气体出口配备有当使用气体时具有有效面积的层压气体实际上从其出来的层压机。 层压机的有效面积具有层压机开口，并且包括至少与气体出口的整个区域具有相同尺寸的材料。 版权所有（C）2006，JPO＆NCIPI

公开(公告)号：JP2009021636A

公开(公告)日：2009-01-29

申请号：JP2008265455

申请日：2008-10-14

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： BECKERS MARCEL ,  HULTERMANS RONALD J ,  KATE NICOLAAS TEN ,  KEMPER NICOLAAS R ,  KOPPELAARS NICOLAAS F ,  SCHOTSMAN JAN-MARIUS ,  DER HAM RONALD V ,  VAN UIJTREGT JOHANNES ANTONIUS

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70933 ,  G03F7/70908

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic apparatus having a gas flushing device. SOLUTION: The lithographic apparatus includes an illumination system IL to provide a beam of radiation and a support structure for supporting a patterning device. The patterning device serves to impart the beam with a pattern in its cross-section. The apparatus also includes the gas flushing device for flushing a substantially laminar flow of gas across the beam PB of radiation and/or along a surface of an optical component. The gas flushing device includes a single gas outlet that has an inner rim at a downstream end of the gas outlet. The inner rim defines a total gas outlet area. The gas outlet is provided with a laminator that has an effective area out of which, in use, the substantially laminar flow of gas flows. The laminator effective area includes material that has laminator openings and is at least as large as the total gas outlet area. COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：提供一种具有气体冲洗装置的光刻设备。 解决方案：光刻设备包括照明系统IL以提供辐射束和用于支撑图案形成装置的支撑结构。 图案形成装置用于在其横截面中赋予光束图案。 该装置还包括气体冲洗装置，用于冲洗基本层流的气体穿过辐射束PB和/或沿着光学部件的表面。 气体冲洗装置包括单个气体出口，其在气体出口的下游端具有内缘。 内缘定义了总气体出口面积。 气体出口设置有层压机，其具有在使用中基本上层流的气体流动的有效区域。 层压机有效区域包括具有层压机开口并且至少与总气体出口面积一样大的材料。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：DE602005013145D1

公开(公告)日：2009-04-23

申请号：DE602005013145

申请日：2005-05-23

Applicant: ASML NETHERLANDS BV

Inventor： BECKERS MARCEL ,  HULTERMANS RONALD JOHANNES ,  TEN KATE NICOLAAS ,  KEMPER NIOCOLAAS RUDOLF ,  KOPPELAARS NICOLAAS FRANCISCUS ,  SCHOTSMAN JAN-MARIUS ,  VAN DER HAM RONALD ,  UIJTREGT JOHANNES ANTONIUS MARIA MARTINA

IPC: G03F7/20 ,  H01L21/027

Abstract: A lithographic apparatus is disclosed. The apparatus includes an illumination system to provide a beam of radiation, and a support structure for supporting a patterning device. The patterning device serves to impart the beam with a pattern in its cross-section. The apparatus also includes a gas flushing device (1) for flushing a substantially laminar flow of gas across the beam of radiation and/or along a surface of an optical component. The gas flushing device includes a single gas outlet (1) that has an inner rim (3) at a downstream end of the gas outlet. The inner rim (3) defines a total gas outlet area. The gas outlet is provided with a laminator (4) that has an effective area (A2) out of which, in use, the substantially laminar flow of gas flows. The laminator effective area includes material that has laminator openings (5) and is at least as large as the total gas outlet area.