公开(公告)号：KR20100130577A

公开(公告)日：2010-12-13

申请号：KR20100110912

申请日：2010-11-09

Applicant: ASML NETHERLANDS BV

Inventor： LIEBREGTS PAULUS MARTINUS MARIA ,  FIEN MENNO ,  LOOPSTRA ERIK ROELOF ,  VAN DER HAM RONALD ,  SIMONS WILHELMUS FRANCISCUS JOHANNES ,  DIRECKS DANIEEL JOZEF MARIA ,  JANSSEN FRANCISCUS JOHANNES JOSEPH ,  BRANDS GERT JAN GERARDUS JOHANNES THOMAS ,  STEFFENS KOEN

IPC: H01L21/027

CPC classification number: G03F7/70958 ,  G03F7/70341 ,  G03F7/70866 ,  G03F7/70975 ,  G03F7/70983 ,  H01L21/0274 ,  G03F7/2041 ,  G03F7/70916

Abstract: PURPOSE: A lithographic apparatus having parts with a coated film adhered thereto is provided top protect a negative effect from an UV radiation and an immersion fluid by supporting the coating on at least part of lithography apparatus. CONSTITUTION: A lighting system(IL) conditions radiation beam. A patterning device supporter(MT) supports a patterning device(MA). A substrate supporter supports the substrate. A projection system(PS) projects the patterned radiation beam on the target on the substrate. The adhesive film supports the coating on at least part of a lithography apparatus.

Abstract translation: 目的：提供具有附着有涂膜的部件的光刻设备，其通过将涂层支撑在至少一部分光刻设备上而保护由UV辐射和浸没流体产生的负面影响。 构成：照明系统（IL）规定辐射束。 图案形成装置支撑体（MT）支撑图案形成装置（MA）。 基板支撑件支撑基板。 投影系统（PS）将图案化的辐射束投射到基板上的靶上。 粘合膜在至少部分光刻设备上支撑涂层。

公开(公告)号：KR20100098479A

公开(公告)日：2010-09-07

申请号：KR20100067520

申请日：2010-07-13

Applicant: ASML NETHERLANDS BV

Inventor： BERKVENS PAUL PETRUS JOANNES ,  DE GRAAF ROELOF FREDERIK ,  LEIBREGTS PAULUS MARTINUS MARIA ,  VAN DER HAM RONALD ,  SIMONS WILHELMUS FRANCISCUS JOHANNES ,  DIRECKS DANIEL JOZEF MARIA ,  JANSSEN FRANCISCUS JOHANNES JOSEPH ,  SCHOLTES PAUL WILLIAM ,  BRANDS GERT JAN GERARDUS JOHANNES THOMAS ,  STEFFENS KOEN ,  LEMPENS HAN HENRICUS ALDEGONDA ,  VAN LIEROP MATHIEUS ANNA KAREL ,  DE METSENAERE CHRISTOPHE ,  MIRANDA MARCIO ALEXANDRE CANO ,  SPRUYTENBURG PATRICK JOHANNES WILHELMUS ,  VERSTRAETE JORIS JOHAN ANNE MARIE

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70341 ,  G03F7/2041 ,  H01L21/0274 ,  H01L21/0275

Abstract: PURPOSE: A lithography apparatus and a method for manufacturing a device are provided to control the flow of fluid through a fluid inlet by varying the flux of the fluid. CONSTITUTION: An illuminator(IL) receives a radiation beam(B) from a radiation source(SO). The illuminator includes an adjusting unit(AD) which adjusts the angular intensity distribution of the radiation beam. The radiation beam passes through a projection system(PS) and is focused on the target parts(C) on a substrate(W). A first location setting unit(PM) accurately locates a pattern device(MA). A substrate table(WT) moves to locate the target parts in the path of the radiation beam.

Abstract translation: 目的：提供一种光刻设备和用于制造器件的方法，以通过改变流体的通量来控制通过流体入口的流体流动。 构成：照射器（IL）从辐射源（SO）接收辐射束（B）。 照明器包括调节单元（AD），该调节单元调节辐射束的角度强度分布。 辐射束通过投影系统（PS）并聚焦在基底（W）上的目标部分（C）上。 第一位置设置单元（PM）精确地定位图案设备（MA）。 衬底台（WT）移动以将目标部件定位在辐射束的路径中。

公开(公告)号：JP2011146738A

公开(公告)日：2011-07-28

申请号：JP2011083005

申请日：2011-04-04

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： LIEBREGTS PAULUS MARTINUS MARIA ,  FIEN MENNO ,  LOOPSTRA ERIK R ,  VAN DER HAM RONALD ,  SIMONS WILHELMUS FRANCISCUS JOHANNES ,  DIREKS DANIEL JOSEPH MARIA ,  JANSSEN FRANCISCUS JOHANNES JOSEPH ,  BRANDS GERT-JAN GERARDUS JOHANEES THOMAS ,  STEFFENS KOEN

IPC: H01L21/027

CPC classification number: G03F7/70958 ,  G03F7/70341 ,  G03F7/70866 ,  G03F7/70975 ,  G03F7/70983

Abstract: PROBLEM TO BE SOLVED: To provide a lithography device which is properly protected from a negative effect resulting for ultraviolet radiation and/or immersion liquid, for example. SOLUTION: A lithography device having a detachable sticky film with a coating on at least part thereof is disclosed. A liquid supply system with a liquid confinement structure extended along at least part of a boundary of a space between a projection system and a substrate support is disclosed. The film with coating exists on at least part of the liquid confinement structure. COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：提供一种光刻装置，其被适当地保护免受例如紫外线辐射和/或浸液的负面影响。 公开了一种光刻设备，其具有在其至少部分上具有涂层的可拆卸粘性膜。 公开了一种具有液体限制结构的液体供应系统，其沿着投影系统和基板支撑件之间的空间的边界的至少一部分延伸。 具有涂层的膜存在于液体限制结构的至少一部分上。 版权所有（C）2011，JPO＆INPIT

公开(公告)号：JP2007251156A

公开(公告)日：2007-09-27

申请号：JP2007043038

申请日：2007-02-23

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： LUTTIKHUIS BERNARDUS ANTONIUS ,  VAN DER PASCH ENGELBERTUS ANTO ,  VAN DE VIJVER YURI JOHANNES GA ,  VAN DER HAM RONALD ,  ROSET NIEK JACOBUS JOHANNES ,  BOSSCHART CAREL HOPE

IPC: H01L21/027 ,  G01B11/00 ,  G03F7/20

CPC classification number: G03F7/70858 ,  G03F7/70775 ,  G03F7/70908

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic apparatus provided with a measurement system having highly reliable accuracy. SOLUTION: The lithographic apparatus is provided with a measurement system for measuring the position and/or movement of a substrate support relative to a reference frame. The measurement system is provided with a target mounted to any one of the substrate support and the reference frame, a radiation source mounted to the other one and a sensor configured to detect a pattern of radiation propagating from the target, indicating the position or movement of the substrate support. The substrate support is provided with one or more gas outlets configured so as to supply a flow of gas which encapsulates the volume of space through which the radiation beam propagates to the target. COPYRIGHT: (C)2007,JPO&INPIT

Abstract translation: 要解决的问题：提供一种具有高度可靠精度的测量系统的光刻设备。 解决方案：光刻设备设置有用于测量衬底支撑件相对于参考框架的位置和/或运动的测量系统。 测量系统设置有安装到基板支撑件和参考框架中的任一个的目标，安装到另一个的辐射源和被配置为检测从目标传播的辐射图案的传感器，其指示位置或运动 衬底支撑。 衬底支撑件设置有一个或多个气体出口，其被配置为提供封装辐射束传播到靶的空间体积的气体流。 版权所有（C）2007，JPO＆INPIT

公开(公告)号：JP2011238918A

公开(公告)日：2011-11-24

申请号：JP2011099033

申请日：2011-04-27

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： VAN DER HAM RONALD ,  ANTONIUS LEENDERS MARTINUS HENDRIKUS ,  HUBERTUS MULKENS JOHANNES CATHERINUUS ,  RICHARD MURRMANN ,  RIEPEN MICHAEL ,  SERGEI SHULEPOV ,  STEFFENS KOEN ,  JAN WILLEM CROMWIJK ,  JOHANNA ANTOINETTE MARIA SONDAG-HUETHORST ,  MARCO BARAGONA ,  INTO GROEN ROBERTAS LEONARDUS MARIA ,  MAESSEN RALPH THEODORUS HUBERTUS ,  JACOB MARINUS JAN DEN TOONDER ,  MILLIKA KOVACEVICH MILOJEVIC

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70925 ,  G03F7/70 ,  G03F7/70341

Abstract: PROBLEM TO BE SOLVED: To provide a reduction, if not a complete prevention, of intrusion of bubbles into a light path of a projection beam during exposure, to thereby ease defects.SOLUTION: A fluid handling structure is disclosed. The fluid handling structure is configured to confine immersion liquid to a space defined between a projection system and a facing surface facing a substrate or a space defined between the projection system and a facing surface facing a table supporting the substrate, or a space defined between the projection system and both facing surfaces. The fluid handling structure includes a transponder that melts at least a part of gas within bubbles in the immersion liquid or performs control to prevent the bubbles from intruding into a light path of a beam from the projection system.

Abstract translation: 要解决的问题：为了在曝光期间减少（如果不是完全防止）气泡侵入投影光束的光路，从而缓解缺陷。 解决方案：公开了一种流体处理结构。 流体处理结构被配置为将浸没液体限制在限定在投影系统和面向基板的面对面之间的空间或者在投影系统和面向支撑基板的台面的面对面之间限定的空间之间，或者在 投影系统和两个面对面。 流体处理结构包括将浸入液体中的气泡内的至少一部分气体熔化的转发器，或进行控制以防止气泡从投影系统入射到光束的光路中。 版权所有（C）2012，JPO＆INPIT

公开(公告)号：JP2009141359A

公开(公告)日：2009-06-25

申请号：JP2008308934

申请日：2008-12-03

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： STEFFENS KOEN ,  LIEBREGTS PAULUS MARTINUS MARI ,  VAN DER HAM RONALD ,  DIREKS DANIEL JOSEPH MARIA ,  BRANDS GERT-JAN GERARDUS JOHAN

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70341

Abstract: PROBLEM TO BE SOLVED: To provide a liquid handling system which reduces or prevents the occurrence of dry contamination on a substrate. SOLUTION: The liquid handling system is disclosed in which an extractor to contain liquid in a space between the projection system of a lithographic apparatus and a substrate has, in plan, a shape with a single corner. The extractor is provided in a rotatable part of a liquid handling system. The rotatable part is rotated under the control of a controller. COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：提供一种减少或防止在基板上发生干污染的液体处理系统。 解决方案：公开了一种液体处理系统，其中在平版印刷设备的投影系统和基板之间的空间中容纳液体的提取器在平面上具有单个角的形状。 提取器设置在液体处理系统的可旋转部分中。 可旋转部分在控制器的控制下旋转。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2009111349A

公开(公告)日：2009-05-21

申请号：JP2008227986

申请日：2008-09-05

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： BERKVENS PAUL PETRUS JOANNES ,  DE GRAAF ROELOF FREDERIK ,  LIEBREGTS PAULUS MARTINUS MARI ,  VAN DER HAM RONALD ,  SIMONS WILHELMUS FRANCISCUS JO ,  DIREKS DANIEL JOSEPH MARIA ,  JANSSEN FRANCISCUS JOHANNES JO ,  SCHOLTES PAUL WILLIAM ,  BRANDS GERT-JAN GERARDUS JOHAN ,  STEFFENS KOEN ,  LEMPENS HAN HENRICUS ALDEGONDA ,  LIEROP MATHIEUS ANNA KAREL VAN ,  METSENAERE CHRISTOPHE DE ,  MIRANDA MARCIO ALEXANDRE CANO ,  SPRUYTENBURG PATRICK JOHANNES ,  VERSTRAETE JORIS JOHAN ANNE-MA

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70341

Abstract: PROBLEM TO BE SOLVED: To provide an apparatus in which a barrier member is combined with a shutter member so as to keep a final element of the projection system wet during substrate swap. SOLUTION: An immersion lithographic apparatus is disclosed that includes a fluid confinement system configured to confine fluid to a space between a projection system and a substrate. The fluid confinement system includes a fluid inlet to supply fluid, the fluid inlet connected to an inlet port and an outlet port. The immersion lithographic apparatus further includes a fluid supply system configured to control fluid flow through the fluid inlet by varying the flow rate of fluid provided to the inlet port and the flow rate of fluid removed from the outlet port. COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：提供一种装置，其中阻挡构件与挡板构件组合，以便在衬底互换期间使投影系统的最终元件保持湿润。 解决方案：公开了一种浸没式光刻设备，其包括被配置为将流体限制在投影系统和基板之间的空间的流体限制系统。 流体限制系统包括用于供应流体的流体入口，流体入口连接到入口端口和出口端口。 浸没式光刻设备还包括流体供应系统，其构造成通过改变提供给入口的流体的流量和从出口移除的流体的流速来控制流过流体入口的流体流动。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2013042127A

公开(公告)日：2013-02-28

申请号：JP2012167085

申请日：2012-07-27

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： KUNEN JOHANN GERTRUDIX CORNELIS ,  JACOBS JOHANNES HENRICUS WILHELMUS ,  VERSPAGET COEN CORNELIS WILHELMUS ,  VAN DER HAM RONALD ,  THOMAS IVO ADAM JOHANNES ,  HOUBEN MARTIJN ,  LAURENT THIBAUD SIMON MATTHEW ,  GREGORY MARTIN MASON CORCORAN ,  BLOKS RUUD HENDRIKUS MARTINUS JOHANNES ,  GERBEN PETERS ,  GUNTHER PIETER LEIN JOSEPH ,  REMIE MARINUS JAN ,  SANDER CATHARINA REINIER DERKS

IPC: H01L21/027 ,  G03F7/20 ,  H01L21/683

CPC classification number: G03F7/70875 ,  G03F7/70341

Abstract: PROBLEM TO BE SOLVED: To reduce influence of a localized heat load when using immersion fluid in a lithographic apparatus.SOLUTION: A support table configured to support a substrate comprises a support section to support a substrate, and a regulation system to supply heat energy to and/or remove heat energy from the support section. The regulation system comprises a plurality of regulation units that are independently controllable.

Abstract translation: 要解决的问题：为了减少在光刻设备中使用浸液时的局部热负荷的影响。 解决方案：构造成支撑衬底的支撑台包括用于支撑衬底的支撑部分和用于向支撑部分提供热能和/或从其移除热能的调节系统。 调节系统包括可独立控制的多个调节单元。 版权所有（C）2013，JPO＆INPIT

公开(公告)号：JP2011171760A

公开(公告)日：2011-09-01

申请号：JP2011101629

申请日：2011-04-28

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： BERKVENS PAUL PETRUS JOANNES ,  DE GRAAF ROELOF FREDERIK ,  LIEBREGTS PAULUS MARTINUS MARIA ,  VAN DER HAM RONALD ,  SIMONS WILHELMUS FRANCISCUS JOHANNES ,  DIREKS DANIEL JOSEPH MARIA ,  JANSSEN FRANCISCUS JOHANNES JOSEPH ,  SCHOLTES PAUL WILLIAM ,  BRANDS GERT-JAN GERARDUS JOHANEES THOMAS ,  STEFFENS KOEN ,  LEMPENS HAN HENRICUS ALDEGONDA ,  LIEROP MATHIEUS ANNA KAREL VAN ,  METSENAERE CHRISTOPHE DE ,  MIRANDA MARCIO ALEXANDRE CANO ,  SPRUYTENBURG PATRICK JOHANNES WILHELMUS ,  VERSTRAETE JORIS JOHAN ANNE-MARIE

IPC: H01L21/027

CPC classification number: G03F7/70341

Abstract: PROBLEM TO BE SOLVED: To provide an apparatus that combines a barrier member with a shutter member to keep the final element of a projection system wet during the replacement of a substrate.
SOLUTION: A liquid immersion lithographic apparatus includes a fluid confinement system for confining a fluid in a space between the projection system and a substrate. The liquid confinement system includes an inlet port to supply liquid, and a fluid entrance connected to an outlet port. The liquid immersion lithographic apparatus further includes a fluid supply system to control the fluid flow passing through the fluid entrance by changing a flow rate of fluid supplied to the entrance port and a flow rate of fluid removed from the outlet port.
COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：提供一种将阻挡构件与闸板构件组合的装置，以在更换基板期间使投影系统的最终元件保持湿润。 解决方案：液浸式光刻设备包括用于将流体限制在投影系统和基底之间的空间中的流体限制系统。 液体限制系统包括用于供应液体的入口端口和连接到出口端口的流体入口。 液浸光刻设备还包括流体供应系统，用于通过改变供应到入口的流体的流量和从出口移除的流体的流量来控制流过流体入口的流体流。 版权所有（C）2011，JPO＆INPIT

公开(公告)号：JP2009004777A

公开(公告)日：2009-01-08

申请号：JP2008153774

申请日：2008-06-12

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： LIEBREGTS PAULUS MARTINUS MARI ,  FIEN MENNO ,  LOOPSTRA ERIK R ,  VAN DER HAM RONALD ,  SIMONS WILHELMUS FRANCISCUS JO ,  DIREKS DANIEL JOSEPH MARIA ,  JANSSEN FRANCISCUS JOHANNES JO ,  BRANDS GERT-JAN GERARDUS JOHAN ,  STEFFENS KOEN

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70958 ,  G03F7/70341 ,  G03F7/70866 ,  G03F7/70975 ,  G03F7/70983

Abstract: PROBLEM TO BE SOLVED: To provide a lithography device which is properly protected against negative effect from ultraviolet radiation and/or immersion liquid, for example. SOLUTION: A lithography device having a detachable sticky film with coating on at least part thereof is disclosed. A liquid supply system with a liquid confinement structure extended along at least part of a boundary of a space between a projection system and a substrate support is disclosed. A film with coating exists on at least part of the liquid confinement structure. COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：提供一种光刻装置，其被适当地保护以防止例如紫外线辐射和/或浸液的负面影响。 公开了一种光刻设备，其具有在其至少部分上具有涂层的可拆卸粘性膜。 公开了一种具有液体限制结构的液体供应系统，其沿着投影系统和基板支撑件之间的空间的边界的至少一部分延伸。 在液体限制结构的至少一部分上存在具有涂层的膜。 版权所有（C）2009，JPO＆INPIT