公开(公告)号：NL1036715A1

公开(公告)日：2009-10-19

申请号：NL1036715

申请日：2009-03-17

Applicant: ASML NETHERLANDS BV

Inventor： DUNGEN CLEMENS JOHANNES GERARD VAN DEN ,  KOPPELAARS NICOLAAS FRANCISCUS ,  LEENDERS MARTINUS HENDRIKUS ANTONIUS ,  LIEBREGTS PAULUS MARTINUS MARIA ,  MULKENS JOHANNES CATHARINUS HUBERTUS ,  EUMMELEN ERIK HENRICUS EGIDIUS ,  BECKERS MARCEL ,  MOERMAN RICHARD ,  GROUWSTRA CEDRIC DESIRE ,  PHILIPS DANNY MARIA HUBERTUS ,  VERHEES REMKO JAN PETER ,  MULDER PIETER ,  VLIET EVERT VAN

IPC: G03F7/20

公开(公告)号：DE602005013145D1

公开(公告)日：2009-04-23

申请号：DE602005013145

申请日：2005-05-23

Applicant: ASML NETHERLANDS BV

Inventor： BECKERS MARCEL ,  HULTERMANS RONALD JOHANNES ,  TEN KATE NICOLAAS ,  KEMPER NIOCOLAAS RUDOLF ,  KOPPELAARS NICOLAAS FRANCISCUS ,  SCHOTSMAN JAN-MARIUS ,  VAN DER HAM RONALD ,  UIJTREGT JOHANNES ANTONIUS MARIA MARTINA

IPC: G03F7/20 ,  H01L21/027

Abstract: A lithographic apparatus is disclosed. The apparatus includes an illumination system to provide a beam of radiation, and a support structure for supporting a patterning device. The patterning device serves to impart the beam with a pattern in its cross-section. The apparatus also includes a gas flushing device (1) for flushing a substantially laminar flow of gas across the beam of radiation and/or along a surface of an optical component. The gas flushing device includes a single gas outlet (1) that has an inner rim (3) at a downstream end of the gas outlet. The inner rim (3) defines a total gas outlet area. The gas outlet is provided with a laminator (4) that has an effective area (A2) out of which, in use, the substantially laminar flow of gas flows. The laminator effective area includes material that has laminator openings (5) and is at least as large as the total gas outlet area.