公开(公告)号：NL2009066A

公开(公告)日：2013-02-05

申请号：NL2009066

申请日：2012-06-26

Applicant: ASML NETHERLANDS BV

Inventor： PISARENCO MAXIM ,  SETIJA IRWAN

IPC: G03F7/20 ,  G01N21/47

Abstract: A library of model diffraction patterns is generated where each represents a diffraction pattern expected from a target structure defined by a set of parameters and having a first part and a second part, the first part comprising a scattering object. The target structure is defined. The scattering effect of the first part of the target structure is defined by a set of first part parameters, for a plurality of different sets of first part parameters. The scattering effect of the second part of the target structure defined by a set of second part parameters, for a plurality of different sets of second part parameters. The results of the calculations is used to calculate the model diffraction patterns.

公开(公告)号：NL2008928A

公开(公告)日：2013-01-08

申请号：NL2008928

申请日：2012-06-04

Applicant: ASML NETHERLANDS BV

Inventor： PISARENCO MAXIM ,  SETIJA IRWAN

IPC: G01N21/47 ,  G03F7/20

公开(公告)号：NL2005733A

公开(公告)日：2011-06-09

申请号：NL2005733

申请日：2010-11-22

Applicant: ASML NETHERLANDS BV

Inventor： SETIJA IRWAN ,  KRAAIJ MARKUS ,  DIRKS REMCO ,  BEURDEN MARTIJN CONSTANT

IPC: G01N21/47 ,  G03F7/20

Abstract: Numerical calculation of electromagnetic scattering properties and structural parameters of periodic structures is disclosed. A reflection coefficient has a representation as a bilinear or sesquilinear form. Computations of reflection coefficients and their derivatives for a single outgoing direction can benefit from an adjoint-state variable. Because the linear operator is identical for all angles of incidence that contribute to the same outgoing wave direction, there exists a single adjoint-state variable that generates all reflection coefficients from all incident waves that contribute to the outgoing wave. This adjoint-state variable can be obtained by numerically solving a single linear system, whereas one otherwise would need to solve a number of linear systems equal to the number of angles of incidence.

公开(公告)号：NL2003179A1

公开(公告)日：2010-01-19

申请号：NL2003179

申请日：2009-07-10

Applicant: ASML NETHERLANDS BV

Inventor： COENE WILLEM ,  CRAMER HUGO ,  SETIJA IRWAN

IPC: G03F7/20 ,  G01N21/47

公开(公告)号：NL2005521A

公开(公告)日：2011-04-26

申请号：NL2005521

申请日：2010-10-14

Applicant: ASML NETHERLANDS BV

Inventor： BEURDEN MARTIJN ,  SETIJA IRWAN ,  DIRKS REMCO

IPC: G01N21/47 ,  G03F7/20

Abstract: A projection operator framework is described to analyze the concept of localized normal-vector fields within field-material interactions in a spectral basis, in isotropic and anisotropic media. Generate a localized normal-vector field n in a region of the structure defined by the material boundary, decomposed into sub-regions with a predefined normal-vector field and possibly corresponding closed-form integrals. Construct a continuous vector field F using the normal-vector field to select continuous components ET and Dn. Localized integration of normal-vector field n over the sub-regions to determine coefficients of, C. Determine components Ex, Ey, Ez of the electromagnetic field by using field-material interaction operator C to operate on vector field F. Calculate electromagnetic scattering properties of the structure using the determined components of the electromagnetic field.