公开(公告)号：JP2003224067A

公开(公告)日：2003-08-08

申请号：JP2003006738

申请日：2003-01-15

Applicant: ASML NETHERLANDS BV

Inventor： HEERENS GERT-JAN ,  DONDERS SJOERD NICOLAAS L ,  SPANJERS FRANCISCUS ANDREAS CO ,  VAN MEER ASCHWIN LODEWIJK HEND ,  CASTENMILLER THOMAS JOSEPHUS M

IPC: G03F7/20 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a method and a device for cleaning a component of a lithographic apparatus in situ. SOLUTION: In a low-pressure environment, by applying a voltage between a tool tip in close proximity to a surface and that surface, contaminants on the surface are attracted and adhered to a tool. Also, a laser is used and each component of a lithographic projection apparatus is cleaned in situ. COPYRIGHT: (C)2003,JPO

公开(公告)号：JP2005294846A

公开(公告)日：2005-10-20

申请号：JP2005106031

申请日：2005-04-01

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： COX HENRIKUS HERMAN MARIE ,  VAN DEN BIGGELAAR PETRUS MARIN ,  VAN DER MEULEN FRITS ,  SPANJERS FRANCISCUS ANDREAS CO ,  VAN DER TOORN JAN-GERARD CORNE ,  MIGCHELBRINK AREND-JAN

IPC: G03F7/20 ,  H01L21/027

CPC classification number: G03F7/70341

Abstract: PROBLEM TO BE SOLVED: To provide a liquid immersion lithographic apparatus and a device manufacturing method, in which disturbance force transmitted to a substrate is reduced.
SOLUTION: This is an apparatus for liquid immersion lithography, in which a compensation controller controls actuators to apply forces to the substrate equal in magnitude and opposite in direction to forces which are applied to the substrate by a liquid supply system which supplies liquid between a final element of a projection system and the substrate.
COPYRIGHT: (C)2006,JPO&NCIPI

Abstract translation: 要解决的问题：提供一种其中传播到基板的扰动力减小的液浸光刻设备和设备制造方法。 解决方案：这是一种液浸式光刻装置，其中补偿控制器控制致动器对基板施加力量，其尺寸相等，方向与施加到基板的力相反，液体供应系统提供液体 在投影系统的最终元件与基板之间。 版权所有（C）2006，JPO＆NCIPI

公开(公告)号：JP2007329506A

公开(公告)日：2007-12-20

申请号：JP2007218716

申请日：2007-08-24

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： TINNEMANS PATRICIUS ALOYSIUS J ,  BUIS EDWIN JOHAN ,  DONDERS SJOERD NICOLAAS LAMBER ,  VAN ELP JAN ,  HOOGKAMP JAN FREDERIK ,  VAN MEER ASCHWIN LODEWIJK HEND ,  SMULDERS PATRICK JOHANNES CORN ,  SPANJERS FRANCISCUS ANDREAS CO ,  VERMEULEN JOHANNES PETRUS MART ,  VISSER RAIMOND ,  TEGENBOSCH HENRICUS GERARDUS ,  VAN DEN BERG JOHANNES CHARLES ,  VAN DE SANDE HENRICUS JOHANNES ,  VERVOORT THIJS

IPC: B08B1/00 ,  H01L21/677 ,  B25J13/08 ,  B65G49/07 ,  G03F7/20 ,  H01L21/027 ,  H01L21/304 ,  H01L21/683 ,  H02N13/00

CPC classification number: G03F7/70741 ,  B25J13/089 ,  G03F7/7075 ,  G03F7/70925 ,  H01L21/6833 ,  H02N13/00

Abstract: PROBLEM TO BE SOLVED: To provide a method of effectively compensating for a positional shift including a tilt between a substrate and a supporting structure and a vertical displacement when moving the substrate in a lithographic projection apparatus using the supporting structure.
SOLUTION: By providing compliant parts (14, 26) in the supporting structure for holding and moving a substrate (W), for example, a supporting frame (18) of a robot arm (10) adaptable to the tilt and/or the vertical displacement. Clamps (20, 22, 24) that the supporting frame (18) comprises may be a Johnson-Raybeck effect type clamp that requires a stringent positional precision, and the cleaning of the inside of the projection apparatus is carried out by using only one substrate.
COPYRIGHT: (C)2008,JPO&INPIT

Abstract translation: 要解决的问题：提供一种有效地补偿包括基板和支撑结构之间的倾斜的位置偏移以及在使用支撑结构在光刻投影装置中移动基板时的垂直位移的方法。 解决方案：通过在用于保持和移动衬底（W）的支撑结构中提供柔性部件（14,26），例如适用于倾斜和/或倾斜的机器人臂（10）的支撑框架（18） 或垂直位移。 支撑框架（18）包括的夹具（20,22,24）可以是要求严格的位置精度的Johnson-Raybeck效果型夹具，并且通过仅使用一个基板来执行投影装置的内部的清洁 。 版权所有（C）2008，JPO＆INPIT

公开(公告)号：JP2004343076A

公开(公告)日：2004-12-02

申请号：JP2004102395

申请日：2004-03-31

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： TINNEMANS PATRICIUS ALOYSIUS J ,  BUIS EDWIN JOHAN ,  DONDERS SJOERD NICOLAAS LAMBER ,  VAN ELP JAN ,  HOOGKAMP JAN FREDERIK ,  VAN MEER ASCHWIN LODEWIJK HEND ,  SMULDERS PATRICK JOHANNES CORN ,  SPANJERS FRANCISCUS ANDREAS CO ,  VERMEULEN JOHANNES PETRUS MART ,  VISSER RAIMOND ,  TEGENBOSCH HENRICUS GERARDUS ,  VAN DEN BERG JOHANNES CHARLES ,  VAN DE SANDE HENRICUS JOHANNES ,  VERVOORT THIJS

IPC: B08B1/00 ,  B25J13/08 ,  B65G49/07 ,  G03F7/20 ,  H01L21/027 ,  H01L21/304 ,  H01L21/677 ,  H01L21/683 ,  H02N13/00 ,  H01L21/68

CPC classification number: G03F7/70741 ,  B25J13/089 ,  G03F7/7075 ,  G03F7/70925 ,  H01L21/6833 ,  H02N13/00

Abstract: PROBLEM TO BE SOLVED: To provide a method capable of effectively compensating an inclination between a substrate and a support structure or a misregistration including a displacement in the vertical direction when the substrate is moved by the support structure in a lithographic projection apparatus. SOLUTION: By providing a support structure for holding and moving a substrate (W), for example, flexible sections (14, 26) in a support frame (18) of a robot arm (10), it can be adapted to the tilt and/or a displacement in the vertical direction. Clamps (20, 22, 24) provided on the support frame (18) may be a Johnson-Raybeck effect type clamp, which requires the severe position accuracy, and can perform a cleaning treatment in a projection apparatus by only one substrate. COPYRIGHT: (C)2005,JPO&NCIPI

公开(公告)号：JP2002319543A

公开(公告)日：2002-10-31

申请号：JP2002045440

申请日：2002-01-17

Applicant: ASML NETHERLANDS BV

Inventor： AUER FRANK ,  SPANJERS FRANCISCUS ANDREAS CO

IPC: G03F7/20 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a modified lithographic projection apparatus with an effective arrangement for reducing a harmful effect of vibration on the lens. SOLUTION: The lithographic projection apparatus comprises a detection device 210 for detecting a relative movement between a first part and a second part of a silent region 13 and for generating at least one movement signal which represents the relative movement, an action device 220 which reacts to at least one control signal for applying a force on the silent region, and a control device 21 which reduces the relative movement between the first part and the second part by generating at least one control signal reacting to at least one movement signal.

公开(公告)号：SG121753A1

公开(公告)日：2006-05-26

申请号：SG200300099

申请日：2003-01-15

Applicant: ASML NETHERLANDS BV

Inventor： HEERENS GERT-JAN ,  DONDERS SJOERD NICOLAAS LAMBER ,  SPANJERS FRANCISCUS ANDREAS CO ,  MEER VAN ASCHWIN LODEWIJK HEND ,  CASTENMILLER THOMAS JOSEPHUS M

IPC: G03F7/00 ,  G03F7/20 ,  H01L21/027

Abstract: In a low-pressure environment, a voltage is applied between a tool tip in close proximity to a surface and that surface. Contaminants on the surface are attracted and adhere to the tool.

公开(公告)号：SG115816A1

公开(公告)日：2005-10-28

申请号：SG200501976

申请日：2005-03-30

Applicant: ASML NETHERLANDS BV

Inventor： COX HENRIKUS HERMAN MARIE ,  VAN DEN BIGGELAAR PETRUS MARIN ,  VAN DER MEULEN FRITS ,  SPANJERS FRANCISCUS ANDREAS CO ,  VAN DER TOORN JAN-GERARD CORNE ,  MIGCHELBRINK AREND-JAN

IPC: G03F7/20 ,  H01L21/027

Abstract: A lithographic apparatus for immersion lithography is described in which a compensation controller (30) controls actuators (45) to apply forces (F 1 ,F 2 ) to the substrate (W) equal in magnitude and opposite in direction to forces which are applied to the substrate by the liquid supply system which supplies liquid between the final element of the projection system (PL) and the substrate (W).