公开(公告)号：KR20180042402A

公开(公告)日：2018-04-25

申请号：KR20187008543

申请日：2016-08-22

Applicant: ASML NETHERLANDS BV

Inventor： VAN DER SCHAAR MAURITS ,  ZHANG YOUPING ,  SMILDE HENDRIK JAN HIDDE ,  TSIATMAS ANAGNOSTIS ,  VAN LEEST ADRIAAN JOHAN ,  VERMA ALOK ,  THEEUWES THOMAS ,  CRAMER HUGO AUGUSTINUS JOSEPH ,  HINNEN PAUL CHRISTIAAN

IPC: G03F7/20 ,  G01N21/47 ,  G01N21/95

CPC classification number: G03F7/70491 ,  G01N21/47 ,  G01N21/9501 ,  G03F7/70633 ,  G03F7/70683

Abstract: 기판은리소그래피프로세스에의해그 위에형성된제 1 및제 2 타겟구조체를포함한다. 각각의타겟구조체는제 1 및제 2 리소그래피단계를사용하여기판상의단일재료층내에형성되는 2-차원주기적구조체를포함하는데, 제 1 타겟구조체내에서, 제 2 리소그래피단계에서형성되는피쳐는제 1 리소그래피단계에서형성되는피쳐에대해서, 제 1 리소그래피단계에서형성되는피쳐의공간주기의절반에가까운제 1 바이어스양만큼변위되고, 제 2 타겟구조체내에서, 제 2 리소그래피단계에서형성되는피쳐는제 1 리소그래피단계에서형성되는피쳐에대해서, 상기공간주기의절반에가깝고제 1 바이어스양과상이한제 2 바이어스양만큼변위된다. 제 1 타겟구조체의각도-분해산란스펙트럼및 제 2 타겟구조체의각도-분해산란스펙트럼이획득되고, 리소그래피프로세스의파라미터의측정이제 1 및제 2 타겟구조체의산란스펙트럼들에서발견되는비대칭을사용하여, 측정으로부터유도된다.

公开(公告)号：IL316715A

公开(公告)日：2024-12-01

申请号：IL31671524

申请日：2024-10-30

Applicant: ASML NETHERLANDS BV ,  ONOSE ALEXANDRU ,  MIDDLEBROOKS SCOTT ANDERSON ,  VAN KRAAIJ MARKUS GERARDUS MARTINUS MARIA ,  BOTARI TIAGO ,  TSIATMAS ANAGNOSTIS

Inventor： ONOSE ALEXANDRU ,  MIDDLEBROOKS SCOTT ANDERSON ,  VAN KRAAIJ MARKUS GERARDUS MARTINUS MARIA ,  BOTARI TIAGO ,  TSIATMAS ANAGNOSTIS

IPC: G01N21/88 ,  G06V10/10 ,  G06V10/143 ,  G06V10/147 ,  G06V10/774 ,  G06V10/82 ,  G06V20/60

Abstract: A method is proposed of using low-resolution images of at least one product produced by one or more imaging processes, and imaging models characterizing the imaging processes, to determine values for plurality of numerical parameters which collectively define a product model of the at least one product. The determination of the values is performed by forming a loss function based on the acquired images, the imaging models, and the numerical parameters of the model, and performing a minimization algorithm to minimize the loss function with respect to the numerical parameters. Due to prior knowledge of the product encoded in the loss function, the product model may comprise reconstructed images which have a higher resolution than the low-resolution images.