公开(公告)号：JP2005045227A

公开(公告)日：2005-02-17

申请号：JP2004192858

申请日：2004-06-30

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： DRAAIJER EVERT HENDRIK JAN ,  CUIJPERS MARTINUS AGNES WILLEM ,  FIEN MENNO ,  BREUKERS MARCUS JOSEPH ELISABE ,  HOUKES MARTIJN ,  VAN DONKELAAR EDWIN TEUNIS

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70733

Abstract: PROBLEM TO BE SOLVED: To provide a lithography projection apparatus having an exposure device and a measurement device the accuracy and the device manufacturing method of which have been improved.
SOLUTION: The exposure device projects patterned beams to the target part of a first substrate and on the other hand, the measurement device projects measurement beams to the target part of a second substrate. When a movable part of the device moves, due to the displacement of air, for example, a disturbance is caused to occur at the other movable part of the device. This error can be corrected by calculating a correction signal that is a function of a state of either or both of the movable parts.
COPYRIGHT: (C)2005,JPO&NCIPI

Abstract translation: 要解决的问题：为了提供具有曝光装置和测量装置的光刻投影装置，其精度和装置制造方法已得到改进。 解决方案：曝光装置将图案化的光束投射到第一基板的目标部分，另一方面，测量装置将测量光束投射到第二基板的目标部分。 当装置的可移动部分移动时，由于空气的位移，例如，在装置的另一个可移动部分发生扰动。 可以通过计算作为可动部件中的一个或两者的状态的函数的校正信号来校正该误差。 版权所有（C）2005，JPO＆NCIPI

公开(公告)号：SG138458A1

公开(公告)日：2008-01-28

申请号：SG2004040713

申请日：2004-06-28

Applicant: ASML NETHERLANDS BV

Inventor： DRAAIJER EVERT HENDRIK JAN ,  CUIJPERS MARTINUS AGNES WILLEM ,  FIEN MENNO ,  BREUKERS MARCUS JOSEPH ELISABE ,  HOUKES MARTIJN ,  VAN DONKELAAR EDWIN TEUNIS

IPC: H01L21/027 ,  G03F7/20

Abstract: A lithographic projection apparatus comprises an exposure system and a measurement system. The exposure system projects a patterned beam onto a target portion of a first substrate, while the measurement system projects a measurement beam on a target portion of a second substrate. Movement of a movable part of the apparatus generates a disturbance in a position of another movable part of the apparatus, e.g. due to displacement of air. This error can be compensated by calculating a compensation signal which is a function of states of one or both of the movable parts.