公开(公告)号：KR20100130577A

公开(公告)日：2010-12-13

申请号：KR20100110912

申请日：2010-11-09

Applicant: ASML NETHERLANDS BV

Inventor： LIEBREGTS PAULUS MARTINUS MARIA ,  FIEN MENNO ,  LOOPSTRA ERIK ROELOF ,  VAN DER HAM RONALD ,  SIMONS WILHELMUS FRANCISCUS JOHANNES ,  DIRECKS DANIEEL JOZEF MARIA ,  JANSSEN FRANCISCUS JOHANNES JOSEPH ,  BRANDS GERT JAN GERARDUS JOHANNES THOMAS ,  STEFFENS KOEN

IPC: H01L21/027

CPC classification number: G03F7/70958 ,  G03F7/70341 ,  G03F7/70866 ,  G03F7/70975 ,  G03F7/70983 ,  H01L21/0274 ,  G03F7/2041 ,  G03F7/70916

Abstract: PURPOSE: A lithographic apparatus having parts with a coated film adhered thereto is provided top protect a negative effect from an UV radiation and an immersion fluid by supporting the coating on at least part of lithography apparatus. CONSTITUTION: A lighting system(IL) conditions radiation beam. A patterning device supporter(MT) supports a patterning device(MA). A substrate supporter supports the substrate. A projection system(PS) projects the patterned radiation beam on the target on the substrate. The adhesive film supports the coating on at least part of a lithography apparatus.

Abstract translation: 目的：提供具有附着有涂膜的部件的光刻设备，其通过将涂层支撑在至少一部分光刻设备上而保护由UV辐射和浸没流体产生的负面影响。 构成：照明系统（IL）规定辐射束。 图案形成装置支撑体（MT）支撑图案形成装置（MA）。 基板支撑件支撑基板。 投影系统（PS）将图案化的辐射束投射到基板上的靶上。 粘合膜在至少部分光刻设备上支撑涂层。

公开(公告)号：JP2013118366A

公开(公告)日：2013-06-13

申请号：JP2012239420

申请日：2012-10-30

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： GILISSEN NOUD JAN ,  MARTINUS AGNES WILLEM CUIJPERS ,  FIEN MENNO ,  SIJBEN ANKO JOZEF CORNELUS ,  SMEETS MARTIN FRANCE PIERRE

IPC: H01L21/027 ,  G03F7/20 ,  H01L21/683

CPC classification number: H01L21/6875 ,  G03F7/09 ,  G03F7/707 ,  H01L21/68735 ,  H01L21/68742

Abstract: PROBLEM TO BE SOLVED: To provide a support in which measures are taken to reduce bending of a substrate during loading.SOLUTION: A support for an object has a support surface configured to support the object. The support surface includes a main part and a moveable part. The moveable part of the support surface is moveable between a retracted position and an extended position. In the retracted position, the moveable part of the support surface is substantially in the same plane as the main part of the support surface. In the extended position, the moveable part of the support surface protrudes from the plane of the main part of the support surface.

Abstract translation: 要解决的问题：提供一种在加载期间采取措施减少基板的弯曲的支撑件。

解决方案：对对象的支持具有配置为支持对象的支撑表面。 支撑表面包括主要部分和可移动部分。 支撑表面的可移动部分可在缩回位置和延伸位置之间移动。 在缩回位置，支撑表面的可移动部分基本上处于与支撑表面的主要部分相同的平面中。 在延伸位置，支撑表面的可移动部分从支撑表面的主要部分的平面突出。 版权所有（C）2013，JPO＆INPIT

公开(公告)号：JP2005045227A

公开(公告)日：2005-02-17

申请号：JP2004192858

申请日：2004-06-30

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： DRAAIJER EVERT HENDRIK JAN ,  CUIJPERS MARTINUS AGNES WILLEM ,  FIEN MENNO ,  BREUKERS MARCUS JOSEPH ELISABE ,  HOUKES MARTIJN ,  VAN DONKELAAR EDWIN TEUNIS

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70733

Abstract: PROBLEM TO BE SOLVED: To provide a lithography projection apparatus having an exposure device and a measurement device the accuracy and the device manufacturing method of which have been improved.
SOLUTION: The exposure device projects patterned beams to the target part of a first substrate and on the other hand, the measurement device projects measurement beams to the target part of a second substrate. When a movable part of the device moves, due to the displacement of air, for example, a disturbance is caused to occur at the other movable part of the device. This error can be corrected by calculating a correction signal that is a function of a state of either or both of the movable parts.
COPYRIGHT: (C)2005,JPO&NCIPI

Abstract translation: 要解决的问题：为了提供具有曝光装置和测量装置的光刻投影装置，其精度和装置制造方法已得到改进。 解决方案：曝光装置将图案化的光束投射到第一基板的目标部分，另一方面，测量装置将测量光束投射到第二基板的目标部分。 当装置的可移动部分移动时，由于空气的位移，例如，在装置的另一个可移动部分发生扰动。 可以通过计算作为可动部件中的一个或两者的状态的函数的校正信号来校正该误差。 版权所有（C）2005，JPO＆NCIPI

公开(公告)号：JP2009004777A

公开(公告)日：2009-01-08

申请号：JP2008153774

申请日：2008-06-12

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： LIEBREGTS PAULUS MARTINUS MARI ,  FIEN MENNO ,  LOOPSTRA ERIK R ,  VAN DER HAM RONALD ,  SIMONS WILHELMUS FRANCISCUS JO ,  DIREKS DANIEL JOSEPH MARIA ,  JANSSEN FRANCISCUS JOHANNES JO ,  BRANDS GERT-JAN GERARDUS JOHAN ,  STEFFENS KOEN

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70958 ,  G03F7/70341 ,  G03F7/70866 ,  G03F7/70975 ,  G03F7/70983

Abstract: PROBLEM TO BE SOLVED: To provide a lithography device which is properly protected against negative effect from ultraviolet radiation and/or immersion liquid, for example. SOLUTION: A lithography device having a detachable sticky film with coating on at least part thereof is disclosed. A liquid supply system with a liquid confinement structure extended along at least part of a boundary of a space between a projection system and a substrate support is disclosed. A film with coating exists on at least part of the liquid confinement structure. COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：提供一种光刻装置，其被适当地保护以防止例如紫外线辐射和/或浸液的负面影响。 公开了一种光刻设备，其具有在其至少部分上具有涂层的可拆卸粘性膜。 公开了一种具有液体限制结构的液体供应系统，其沿着投影系统和基板支撑件之间的空间的边界的至少一部分延伸。 在液体限制结构的至少一部分上存在具有涂层的膜。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2011146738A

公开(公告)日：2011-07-28

申请号：JP2011083005

申请日：2011-04-04

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： LIEBREGTS PAULUS MARTINUS MARIA ,  FIEN MENNO ,  LOOPSTRA ERIK R ,  VAN DER HAM RONALD ,  SIMONS WILHELMUS FRANCISCUS JOHANNES ,  DIREKS DANIEL JOSEPH MARIA ,  JANSSEN FRANCISCUS JOHANNES JOSEPH ,  BRANDS GERT-JAN GERARDUS JOHANEES THOMAS ,  STEFFENS KOEN

IPC: H01L21/027

CPC classification number: G03F7/70958 ,  G03F7/70341 ,  G03F7/70866 ,  G03F7/70975 ,  G03F7/70983

Abstract: PROBLEM TO BE SOLVED: To provide a lithography device which is properly protected from a negative effect resulting for ultraviolet radiation and/or immersion liquid, for example. SOLUTION: A lithography device having a detachable sticky film with a coating on at least part thereof is disclosed. A liquid supply system with a liquid confinement structure extended along at least part of a boundary of a space between a projection system and a substrate support is disclosed. The film with coating exists on at least part of the liquid confinement structure. COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：提供一种光刻装置，其被适当地保护免受例如紫外线辐射和/或浸液的负面影响。 公开了一种光刻设备，其具有在其至少部分上具有涂层的可拆卸粘性膜。 公开了一种具有液体限制结构的液体供应系统，其沿着投影系统和基板支撑件之间的空间的边界的至少一部分延伸。 具有涂层的膜存在于液体限制结构的至少一部分上。 版权所有（C）2011，JPO＆INPIT

公开(公告)号：NL2009689A

公开(公告)日：2013-06-05

申请号：NL2009689

申请日：2012-10-24

Applicant: ASML NETHERLANDS BV

Inventor： GILISSEN NOUD ,  CUIJPERS MARTINUS ,  FIEN MENNO ,  SIJBEN ANKO ,  SMEETS MARTIN

IPC: G03F7/20 ,  H01L21/683

Abstract: A support for an object having a support surface configured to support the object; wherein the support surface includes a main part and a moveable part, the moveable part of the support surface being moveable between a retracted position in which the moveable part of the support surface is adapted to be substantially in the same plane as the main part of the support surface and an extended position in which the moveable part of the support surface protrudes from the plane of the main part of the support surface.

公开(公告)号：DE60120825T2

公开(公告)日：2007-06-28

申请号：DE60120825

申请日：2001-04-06

Applicant: ASML NETHERLANDS BV

Inventor： SCHEIBERLICH ARIE CORNELIS ,  FIEN MENNO ,  DRAAIJER EVERT HENDRIK JAN

IPC: G01B21/00 ,  G03F7/20 ,  G01B21/22 ,  G03F9/00 ,  H01L21/027

Abstract: On-the-Fly leveling in a lithographic apparatus is conducted using a setpoint derived by filtering the output of the combination of the output of a level sensor and another position sensor (LVDT or IFM). The level sensor may include look-ahead. The filter may be a low pass filter to cut-off level variations of wavelength shorter than the width of the slit during a scanning exposure. The filter may also be selected to reduce cross-talk between tilt movements and horizontal displacements.

公开(公告)号：NL2010817A

公开(公告)日：2013-12-02

申请号：NL2010817

申请日：2013-05-17

Applicant: ASML NETHERLANDS BV

Inventor： DONDERS SJOERD NICOLAAS LAMBERTUS ,  FIEN MENNO ,  HOOGENDAM CHRISTIAAN ALEXANDER ,  HOUBEN MARTIJN ,  JACOBS JOHANNES HENRICUS WILHELMUS ,  KOEVOETS ADRIANUS HENDRIK ,  LAFARRE RAYMOND WILHELMUS LOUIS ,  OVERKAMP JIM VINCENT ,  KATE NICOLAAS ,  WESTERLAKEN JAN STEVEN CHRISTIAAN ,  GROOT ANTONIUS FRANCISCUS JOHANNES ,  BEIJNUM MAARTEN ,  JONG ROB

IPC: G03F7/20 ,  H01L21/683

Abstract: A support apparatus for a lithographic apparatus has an object holder and an extraction body radially outward of the object holder. The object holder is configured to support an object. The extraction body includes an extraction opening configured to extract fluid from a top surface of the support apparatus. The extraction body is spaced from the object holder such that the extraction body is substantially decoupled from the object holder. The extraction body comprises a projection configured such that it surrounds the object holder and such that, in use, a layer of liquid is retained on the projection and in contact with an object supported on the object holder.

公开(公告)号：SG138458A1

公开(公告)日：2008-01-28

申请号：SG2004040713

申请日：2004-06-28

Applicant: ASML NETHERLANDS BV

Inventor： DRAAIJER EVERT HENDRIK JAN ,  CUIJPERS MARTINUS AGNES WILLEM ,  FIEN MENNO ,  BREUKERS MARCUS JOSEPH ELISABE ,  HOUKES MARTIJN ,  VAN DONKELAAR EDWIN TEUNIS

IPC: H01L21/027 ,  G03F7/20

Abstract: A lithographic projection apparatus comprises an exposure system and a measurement system. The exposure system projects a patterned beam onto a target portion of a first substrate, while the measurement system projects a measurement beam on a target portion of a second substrate. Movement of a movable part of the apparatus generates a disturbance in a position of another movable part of the apparatus, e.g. due to displacement of air. This error can be compensated by calculating a compensation signal which is a function of states of one or both of the movable parts.

公开(公告)号：DE60120825D1

公开(公告)日：2006-08-03

申请号：DE60120825

申请日：2001-04-06

Applicant: ASML NETHERLANDS BV

Inventor： SCHEIBERLICH ARIE CORNELIS ,  FIEN MENNO ,  DRAAIJER EVERT HENDRIK JAN

IPC: G01B21/00 ,  G03F7/20 ,  G01B21/22 ,  G03F9/00 ,  H01L21/027

Abstract: On-the-Fly leveling in a lithographic apparatus is conducted using a setpoint derived by filtering the output of the combination of the output of a level sensor and another position sensor (LVDT or IFM). The level sensor may include look-ahead. The filter may be a low pass filter to cut-off level variations of wavelength shorter than the width of the slit during a scanning exposure. The filter may also be selected to reduce cross-talk between tilt movements and horizontal displacements.