公开(公告)号：WO2013135494A3

公开(公告)日：2014-01-16

申请号：PCT/EP2013054095

申请日：2013-02-28

Applicant: ASML NETHERLANDS BV

Inventor： BAL KURSAT ,  LUTTIKHUIS BERNARDUS ,  OCKWELL DAVID ,  VAN PUTTEN ARNOLD ,  NIENHUYS HAN-KWANG ,  LEENDERS MAIKEL

IPC: G03F7/20

CPC classification number: G03F7/70691 ,  G03F7/20 ,  G03F7/70066 ,  G03F7/70866 ,  G03F7/70933

Abstract: A lithographic apparatus injects gas between a reticle (MA) and reticle blades (REB-X, REB-Y) to protect the reticle from contamination. The gas may be injected either into the space defined between the reticle and the closest pair of reticle blades, or into the space defined between the two pairs of reticle blades.

Abstract translation: 光刻设备在标线片（MA）和标线片（REB-X，REB-Y）之间注入气体，以保护掩模版免受污染。 气体可以注入到分划板和最接近的一对标线片之间的空间中，或者注入在两对标线片之间限定的空间中。

公开(公告)号：AT548679T

公开(公告)日：2012-03-15

申请号：AT09159532

申请日：2009-05-06

Applicant: ASML NETHERLANDS BV

Inventor： RIEPEN MICHEL ,  KEMPER NICOLAAS ,  VERMEULEN JOHANNES ,  DIRECKS DANIEL ,  PHILIPS DANNY ,  VAN PUTTEN ARNOLD

IPC: G03F7/20

Abstract: An immersion lithographic apparatus is described in which a liquid removal device (100) is arranged to remove liquid (11) from the substrate (W), e.g. during exposures, through a plurality of elongate slots (111) arranged along a line (D-D) and angled to that line. The liquid removal device may act as a meniscus pinning device in an immersion hood or may be used in a drying device to remove a droplet from the substrate.