公开(公告)号：NL2005951A

公开(公告)日：2011-08-03

申请号：NL2005951

申请日：2011-01-05

Applicant: ASML NETHERLANDS BV

Inventor： DIRECKS DANIEL ,  EUMMELEN ERIK ,  SCHEPERS MAIKEL ,  DUNGEN CLEMENS ,  SHULEPOV SERGEI ,  MULDER PIETER ,  BESSEMS DAVID ,  BARAGONA MARCO

IPC: G03F7/20

公开(公告)号：NL2011327A

公开(公告)日：2014-04-14

申请号：NL2011327

申请日：2013-08-22

Applicant: ASML NETHERLANDS BV

Inventor： JACOBS JOHANNES HENRICUS WILHELMUS ,  DIRECKS DANIEL ,  LUIJTEN CARLO ,  MESTROM WILBERT

IPC: G03F7/20 ,  H05G2/00

公开(公告)号：NL2004808A

公开(公告)日：2011-01-12

申请号：NL2004808

申请日：2010-06-03

Applicant: ASML NETHERLANDS BV

Inventor： PATEL HRISHIKESH ,  STEFFENS KOEN ,  LEMPENS HAN ,  LIEROP MATHIEUS ,  METSENAERE CHRISTOPHE ,  SPRUYTENBURG PATRICK ,  VERSTRAETE JORIS ,  BLOKS RUUD ,  MIRANDA MARCIO ,  JACOBS JOHANNES ,  LIEBREGTS PAULUS ,  HAM RONALD ,  SIMONS WILHELMUS ,  DIRECKS DANIEL ,  JANSSEN FRANCISCUS ,  BERKVENS PAUL ,  BRANDS GERT-JAN

IPC: G03F7/20

Abstract: A fluid handling structure configured to supply and confine immersion liquid to a space defined between a projection system and a facing surface facing the fluid handling structure is disclosed. The fluid handling structure includes a supply passage formed therein for the passage of fluid from outside the fluid handling structure to the space, and a thermal isolator positioned adjacent the supply passage at least partly to isolate fluid in the supply passage from a thermal load induced in the fluid handling structure.

公开(公告)号：AT548679T

公开(公告)日：2012-03-15

申请号：AT09159532

申请日：2009-05-06

Applicant: ASML NETHERLANDS BV

Inventor： RIEPEN MICHEL ,  KEMPER NICOLAAS ,  VERMEULEN JOHANNES ,  DIRECKS DANIEL ,  PHILIPS DANNY ,  VAN PUTTEN ARNOLD

IPC: G03F7/20

Abstract: An immersion lithographic apparatus is described in which a liquid removal device (100) is arranged to remove liquid (11) from the substrate (W), e.g. during exposures, through a plurality of elongate slots (111) arranged along a line (D-D) and angled to that line. The liquid removal device may act as a meniscus pinning device in an immersion hood or may be used in a drying device to remove a droplet from the substrate.

公开(公告)号：NL2006389A

公开(公告)日：2011-10-18

申请号：NL2006389

申请日：2011-03-14

Applicant: ASML NETHERLANDS BV

Inventor： PHILIPS DANNY ,  DIRECKS DANIEL ,  DUNGEN CLEMENS ,  SCHEPERS MAIKEL ,  BERKVENS PAUL ,  ZANDEN MARCUS ,  MULDER PIETER

IPC: G03F7/20

Abstract: A fluid handling structure configured to supply immersion liquid to a space defined between a projection system and a facing surface facing the fluid handling structure is disclosed. An undersurface of the fluid handling structure has a supply opening configured to supply fluid toward the facing surface, a plurality of extraction openings configured to remove fluid from between the fluid handling structure and the facing surface, and a protrusion between the supply opening and the extraction openings.

公开(公告)号：NL2003225A1

公开(公告)日：2010-01-26

申请号：NL2003225

申请日：2009-07-17

Applicant: ASML NETHERLANDS BV

Inventor： DIRECKS DANIEL ,  DONDERS SJOERD ,  KEMPER NICOLAAS ,  PHILIPS DANNY ,  RIEPEN MICHEL ,  DUNGEN CLEMENS VAN DEN ,  BAETEN ADRIANES ,  EVANGELISTA FABRIZIO

IPC: G03F7/20