公开(公告)号：NL2005089A

公开(公告)日：2011-03-28

申请号：NL2005089

申请日：2010-07-15

Applicant: ASML NETHERLANDS BV

Inventor： RIEPEN MICHEL ,  KEMPER NICOLAAS ,  MULKENS JOHANNES ,  MEIJERS RALPH ,  EVANGELISTA FABRIZIO

IPC: G03F7/20

公开(公告)号：NL2003846A

公开(公告)日：2010-06-22

申请号：NL2003846

申请日：2009-11-23

Applicant: ASML NETHERLANDS BV

Inventor： VERMEULEN JOHANNES ,  WIJST MARC ,  CADEE THEODORUS ,  JACOBS FRANSISCUS ,  VALENTIN CHRISTIAAN LOUIS ,  BAGGEN MARCEL ,  BUTLER HANS ,  COX HENRIKUS ,  EIJK JAN ,  JEUNINK ANDRE ,  KEMPER NICOLAAS ,  SCHMIDT ROBERT-HAN MUNNIG ,  PASCH ENGELBERTUS

IPC: G03F9/00

Abstract: A lithographic apparatus includes a position controller configured to control a position of a patterning device in its planar direction by selectively pressing at least one of the side faces of the patterning device. The position controller includes a gas pressure supply and one or more outflow openings directed towards at least one side face of the patterning device so as to exert pressurized gas on this side face in order to control the position of the patterning device in its planar direction in a contactless manner.

公开(公告)号：NL2005655A

公开(公告)日：2011-06-14

申请号：NL2005655

申请日：2010-11-09

Applicant: ASML NETHERLANDS BV

Inventor： ROPS CORNELIUS ,  KEMPER NICOLAAS ,  RIEPEN MICHEL

IPC: G03F7/20

公开(公告)号：NL2006818A

公开(公告)日：2012-01-03

申请号：NL2006818

申请日：2011-05-20

Applicant: ASML NETHERLANDS BV

Inventor： GROUWSTRA CEDRIC ,  KEMPER NICOLAAS ,  NIEUWELAAR NORBERTUS ,  VRIES DIRK ,  LI HUA ,  JOCHEMSEN MARINUS

IPC: G03F7/20 ,  H01L21/68

Abstract: A method of adjusting speed and/or routing of a part of a movement plan of a table under an immersion fluid supply system of a lithographic apparatus. The method includes splitting the movement plan of the table into a plurality of discrete movements; determining a risk of a bubble of a size greater than a certain size being present in immersion fluid through which a patterned beam of the lithographic apparatus will pass during a certain discrete movement by determining whether the immersion fluid supply system passes over a position at which immersion fluid leaked from the immersion fluid supply system is present; and adjusting the speed and/or routing of a part of the movement plan corresponding to (i) a discrete movement earlier than a discrete movement for which the risk of a bubble is determined, and/or (ii) a discrete movement for which the risk of a bubble is determined.

公开(公告)号：NL2003226A

公开(公告)日：2010-03-09

申请号：NL2003226

申请日：2009-07-17

Applicant: ASML NETHERLANDS BV

Inventor： KEMPER NICOLAAS ,  ANTONEVICI ANCA ,  KATE NICOLAAS ,  OTTENS JOOST ,  BECKERS MARCEL ,  POLIZZI MARCO ,  RIEPEN MICHEL ,  KUIJPER ANTHONIE ,  STEFFENS KOEN ,  BAETEN ADRIANES

IPC: G03F7/20

公开(公告)号：AT548679T

公开(公告)日：2012-03-15

申请号：AT09159532

申请日：2009-05-06

Applicant: ASML NETHERLANDS BV

Inventor： RIEPEN MICHEL ,  KEMPER NICOLAAS ,  VERMEULEN JOHANNES ,  DIRECKS DANIEL ,  PHILIPS DANNY ,  VAN PUTTEN ARNOLD

IPC: G03F7/20

Abstract: An immersion lithographic apparatus is described in which a liquid removal device (100) is arranged to remove liquid (11) from the substrate (W), e.g. during exposures, through a plurality of elongate slots (111) arranged along a line (D-D) and angled to that line. The liquid removal device may act as a meniscus pinning device in an immersion hood or may be used in a drying device to remove a droplet from the substrate.

公开(公告)号：NL2005974A

公开(公告)日：2011-08-15

申请号：NL2005974

申请日：2011-01-10

Applicant: ASML NETHERLANDS BV

Inventor： RIEPEN MICHEL ,  KEMPER NICOLAAS

IPC: G03F7/20

Abstract: A meniscus pinning device has a plurality of openings through which liquid and gas from the environment are extracted. The openings are of an intermediate size, having a maximum cross-sectional dimension (e.g., diameter) in the range of from about 75 μm to about 150 μm.

公开(公告)号：NL2003933A

公开(公告)日：2010-06-14

申请号：NL2003933

申请日：2009-12-10

Applicant: ASML NETHERLANDS BV

Inventor： KEMPER NICOLAAS ,  BALLEGOIJ ROBERTUS ,  VERMEULEN MARCUS ,  BERKVENS PAUL ,  METSENAERE CHRISTOPHE ,  ROPS CORNELIUS ,  RIEPEN MICHEL ,  HEUVEL MARTINUS ,  WINKEL JIMMY

IPC: G03F7/20

公开(公告)号：NL2003225A1

公开(公告)日：2010-01-26

申请号：NL2003225

申请日：2009-07-17

Applicant: ASML NETHERLANDS BV

Inventor： DIRECKS DANIEL ,  DONDERS SJOERD ,  KEMPER NICOLAAS ,  PHILIPS DANNY ,  RIEPEN MICHEL ,  DUNGEN CLEMENS VAN DEN ,  BAETEN ADRIANES ,  EVANGELISTA FABRIZIO

IPC: G03F7/20