中科微点-全球专利检索

  1. Login
  2. Sign Up

Search Results

17 records (took 0.027 seconds)

    Immersion lithographic apparatus and device manufacturing method
    1.
    发明专利
    Immersion lithographic apparatus and device manufacturing method 有权
    倾斜平面设备和设备制造方法

    公开(公告)号：JP2009152595A

    公开(公告)日：2009-07-09

    申请号：JP2008317800

    申请日：2008-12-15

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： ANTONIUS LEENDERS MARTINUS HEN ,  LAMBERTUS DONDERS SJOERD NICOL ,  WAGNER CHRISTIAN ,  CORTIE ROGIER HENDRIKUS MAGDAL

    IPC: H01L21/027 ,  G03F7/20

    CPC classification number: G03F7/70725 ,  G03F7/70341

    Abstract: PROBLEM TO BE SOLVED: To provide a lithographic apparatus suppressing or preventing leakage or spillage of an immersion liquid during operation to the minimum, and also to provide a lithographic projection method and a device manufacturing method. SOLUTION: The lithographic apparatus includes: a liquid supply system supplying an immersion liquid between a downstream optical element of a projection system of the lithographic apparatus and a substrate; and a control system which drives a substrate table so as to perform an acceleration profile to accelerate the substrate table from a first velocity in a first direction to a second velocity in a second direction. The acceleration profile is asymmetric in time and is dimensioned so that when the substrate table is accelerated according to the acceleration profile, a force to break a meniscus of the immersion liquid remains lower than a force to maintain the meniscus of the immersion liquid. COPYRIGHT: (C)2009,JPO&INPIT

    Abstract translation: 要解决的问题：提供一种光刻设备，其在操作期间抑制或防止浸没液体的泄漏或溢出至少为止，并且还提供光刻投影方法和装置制造方法。 光刻设备包括：在光刻设备的投影系统的下游光学元件和基板之间供应浸没液体的液体供应系统; 以及控制系统，其驱动衬底台以便执行加速度分布，以使衬底台从第一方向的第一速度向第二方向的第二速度加速。 加速度曲线在时间上是不对称的，并且尺寸使得当根据加速度分布加速衬底台时，破坏浸没液体的弯液面的力保持低于保持浸液的弯液面的力。 版权所有（C）2009，JPO＆INPIT

    Polarized light radiation of lithographic device and method for manufacturing device
    2.
    发明专利
    Polarized light radiation of lithographic device and method for manufacturing device 有权
    光刻装置的偏振光辐射及制造装置的方法

    公开(公告)号：JP2007027719A

    公开(公告)日：2007-02-01

    申请号：JP2006189049

    申请日：2006-07-10

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： BOEIJ WILHELMUS PETRUS DE ,  WAGNER CHRISTIAN

    IPC: H01L21/027 ,  G03F7/20

    CPC classification number: G03F7/70125 ,  G03F7/70566

    Abstract: PROBLEM TO BE SOLVED: To provide a lithographic device having an illuminating system with an optical element that can adjust a radiation beam so as to have a cross-section of a first portion of a linear polarized light radiation and an unpolarized light or a second portion of a circularly polarized light radiation. SOLUTION: The device further has a support constructed to support a patterning device, the patterning device can give a pattern to a cross-section of an illuminating radiation beam to form a patternized radiation beam. The device is configured to support a substrate by providing a substrate table and project the patternized radiation beam to a targeted portion of the substrate. COPYRIGHT: (C)2007,JPO&INPIT

    Abstract translation: 要解决的问题：提供一种具有照明系统的光刻设备，该照明系统具有可调节辐射束的光学元件，以便具有线性偏振光辐射和非偏振光的第一部分的横截面，或 圆偏振光辐射的第二部分。 解决方案：该装置还具有构造成支撑图案形成装置的支撑件，图案形成装置可以给照明辐射束的横截面形成图案以形成图案化的辐射束。 该器件被配置为通过提供衬底台来支撑衬底，并将图案化的辐射束投射到衬底的目标部分。 版权所有（C）2007，JPO＆INPIT

    Method of detecting particle, and lithography apparatus
    3.
    发明专利
    Method of detecting particle, and lithography apparatus 审中-公开
    检测颗粒的方法和光刻设备

    公开(公告)号：JP2011129911A

    公开(公告)日：2011-06-30

    申请号：JP2010275178

    申请日：2010-12-10

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： SCACCABAROZZI LUIGI ,  BANINE VADIM YEVGENYEVICH ,  WAGNER CHRISTIAN

    IPC: H01L21/027 ,  G03F1/08

    CPC classification number: G01N21/94 ,  G01N2021/95676 ,  G03F7/7085 ,  G03F7/70908 ,  G03F7/70916

    Abstract: PROBLEM TO BE SOLVED: To provide a high-speed method of detecting a particle on an arbitrary pattern.
    SOLUTION: A camera 30 detects a radiation from a mask MA to form an image, but a focal plane FP of the image is in front of the mask MA. An arbitrary particle D on the mask MA is put in focus. A pattern on the mask MA, however, is out of focus. Consequently, the presence and position of the particle D on the mask MA having the arbitrary pattern can be detected. The depth of focus of the camera 30 is small and the focal plane FP is not twice as far away from a surface of the patterning device as the depth of focus.
    COPYRIGHT: (C)2011,JPO&INPIT

    Abstract translation: 要解决的问题：提供在任意图案上检测颗粒的高速方法。 解决方案：相机30检测来自掩模MA的辐射以形成图像，但是图像的焦平面FP在掩模MA的前面。 掩模MA上的任意粒子D被聚焦。 然而，掩模MA上的图案不重要。 因此，可以检测出具有任意图案的掩模MA上的颗粒D的存在和位置。 摄像机30的焦点深度小，并且焦平面FP不是与图案形成装置的表面远离焦点深度的两倍。 版权所有（C）2011，JPO＆INPIT

    Lithography equipment and method for manufacturing device
    4.
    发明专利
    Lithography equipment and method for manufacturing device 有权
    LITHOGRAPHY EQUIPMENT AND METHOD FOR MANUFACTURING DEVICE

    公开(公告)号：JP2006108687A

    公开(公告)日：2006-04-20

    申请号：JP2005293095

    申请日：2005-10-06

    Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

    Inventor： WAGNER CHRISTIAN

    IPC: H01L21/027 ,  G03F7/20

    CPC classification number: G03F7/70258 ,  G03F7/70341

    Abstract: PROBLEM TO BE SOLVED: To give high flexibility to the projection beam angle, when a projection beam hits a substrate. SOLUTION: The final element in a projection system of immersion lithography equipment is configured for a liquid, having a refractive index larger than the refractive index of the final element. In an embodiment, the final element includes a lens having a meniscus convex form. Such a final element is capable of increasing the effective numerical aperture of the lithography equipment and reducing the total reflection of the beam, when the projection beam passes through the final element and reaches the liquid. COPYRIGHT: (C)2006,JPO&NCIPI

    Abstract translation: 要解决的问题：当投影光束撞击基板时，为投射光束角提供高度的灵活性。 解决方案：浸没式光刻设备的投影系统中的最终元件被配置为具有比最终元件的折射率大的折射率的液体。 在一个实施例中，最终元件包括具有弯月面凸形的透镜。 当投影光束通过最终元件并到达液体时，这样的最终元件能够增加光刻设备的有效数值孔径并减小光束的全反射。 版权所有（C）2006，JPO＆NCIPI

    ILLUMINATION SYSTEM, LITHOGRAPHIC APPARATUS AND METHOD OF FORMING AN ILLUMINATION MODE
    7.
    发明专利
    ILLUMINATION SYSTEM, LITHOGRAPHIC APPARATUS AND METHOD OF FORMING AN ILLUMINATION MODE 未知

    公开(公告)号：SG173857A1

    公开(公告)日：2011-09-29

    申请号：SG2011061553

    申请日：2010-02-25

    Applicant: ASML NETHERLANDS BV

    Inventor： LOOPSTRA ERIK ,  VAN INGEN SCHENAU KOEN ,  VAN SCHOOT JAN ,  WAGNER CHRISTIAN ,  DE VRIES GOSSE

    Abstract: Provided is an illumination system of a lithographic apparatus, the illumination system having a plurality of reflective elements arranged to receive radiation from a radiation source, the reflective elements being movable between different orientations. In the different orientations the reflective elements direct radiation towards different locations at a reflective component in a pupil plane of the illumination system, thereby forming different illumination modes. Each reflective element is moveable between a first orientation which directs radiation towards a first location the pupil plane and a second orientation which directs radiation towards a second location in the pupil plane, the first orientation and the second orientation of the reflective element being defined by end stops.

    Lithographic apparatus and device manufacturing method
    9.
    发明专利
    Lithographic apparatus and device manufacturing method 未知

    公开(公告)号：SG121942A1

    公开(公告)日：2006-05-26

    申请号：SG200505922

    申请日：2005-09-14

    Applicant: ASML NETHERLANDS BV

    Inventor： WAGNER CHRISTIAN

    Abstract: A final element (20,21) of a projection system (PL) of an immersion lithographic apparatus is configured for a liquid (11) having a refractive index greater than a refractive index of the final element. In an embodiment, the final element comprises a convex meniscus shaped lens (21). Such a final element enables the effective numerical aperture of the lithographic apparatus to be increased and reduce total internal reflection of the projected beam as it passes through the final element to the liquid.

Patent Agency Ranking