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公开(公告)号:WO2014202585A3
公开(公告)日:2015-08-20
申请号:PCT/EP2014062691
申请日:2014-06-17
Applicant: ASML NETHERLANDS BV
Inventor: NIKIPELOV ANDREY , FRIJNS OLAV , DE VRIES GOSSE , LOOPSTRA ERIK , BANINE VADIM , DE JAGER PIETER , DONKER RILPHO , NIENHUYS HAN-KWANG , KRUIZINGA BORGERT , ENGELEN WOUTER , LUITEN OTGER , AKKERMANS JOHANNES , GRIMMINCK LEONARDUS , LITVINENKO VLADIMIR
IPC: H01S3/09 , G01J1/04 , G02B1/06 , G02B5/20 , G02B26/02 , G03F7/20 , G21K1/10 , H01S3/00 , H05H7/04
CPC classification number: G03F7/70033 , G01J1/0407 , G01J1/0418 , G01J1/26 , G01J1/429 , G02B1/06 , G02B5/205 , G02B26/023 , G03F7/70008 , G03F7/7055 , G03F7/70558 , G03F7/7085 , G21K1/10 , H01S3/005 , H01S3/0085 , H01S3/0903 , H05H7/04
Abstract: A method of patterning lithographic substrates, the method comprising using a free electron laser (FEL) to generate EUV radiation and delivering the EUV radiation to a lithographic apparatus (LA) which projects the EUV radiation onto lithographic substrates, wherein the method further comprises reducing fluctuations in the power of EUV radiation delivered to the lithographic substrates by using a feedback-based control loop (CT) to monitor the free electron laser and adjust operation of the free electron laser accordingly.
Abstract translation: 一种图案化平版印刷基板的方法,所述方法包括使用自由电子激光器(FEL)产生EUV辐射并将EUV辐射传送到将EUV辐射投影到平版印刷基板上的光刻设备(LA),其中所述方法还包括减小波动 通过使用基于反馈的控制回路(CT)来监测自由电子激光器并相应地调节自由电子激光器的操作,将EUV辐射的功率传递到光刻基板。
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公开(公告)号:WO2015044182A3
公开(公告)日:2015-09-24
申请号:PCT/EP2014070335
申请日:2014-09-24
Applicant: ASML NETHERLANDS BV
Inventor: BANINE VADIM , BARTRAIJ PETRUS , VAN GORKOM RAMON , AMENT LUCAS , DE JAGER PIETER , DE VRIES GOSSE , DONKER RILPHO , ENGELEN WOUTER , FRIJNS OLAV , GRIMMINCK LEONARDUS , KATALENIC ANDELKO , LOOPSTRA ERIK , NIENHUYS HAN-KWANG , NIKIPELOV ANDREY , RENKENS MICHAEL , JANSSEN FRANCISCUS , KRUIZINGA BORGERT
IPC: G03F7/20 , G01N21/956 , G02B5/18 , G02B27/00 , G02B27/09 , G02B27/10 , G02B27/12 , G02B27/14 , G02B27/42 , G03F1/84 , G21K1/06 , H01S3/09 , H05H7/04
CPC classification number: G21K1/067 , G01N2021/95676 , G02B5/1814 , G02B5/1823 , G02B27/0025 , G02B27/0938 , G02B27/10 , G02B27/1086 , G02B27/12 , G02B27/14 , G02B27/142 , G02B27/146 , G02B27/4272 , G03F1/84 , G03F7/70025 , G03F7/70208 , G03F7/70566 , G03F7/70891 , G03F7/70991 , G21K2201/065 , H01S3/0903 , H05H7/04
Abstract: A delivery system for use within a lithographic system. The beam delivery system comprises optical elements arranged to receive a radiation beam from a radiation source and to reflect portions of radiation along one or more directions to form a one or more branch radiation beams for provision to one or more tools.
Abstract translation: 用于光刻系统的传送系统。 光束传送系统包括被配置为从辐射源接收辐射束并且沿着一个或多个方向反射辐射部分的光学元件,以形成用于提供给一个或多个工具的一个或多个分支辐射束。
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公开(公告)号:SG173857A1
公开(公告)日:2011-09-29
申请号:SG2011061553
申请日:2010-02-25
Applicant: ASML NETHERLANDS BV
Inventor: LOOPSTRA ERIK , VAN INGEN SCHENAU KOEN , VAN SCHOOT JAN , WAGNER CHRISTIAN , DE VRIES GOSSE
Abstract: Provided is an illumination system of a lithographic apparatus, the illumination system having a plurality of reflective elements arranged to receive radiation from a radiation source, the reflective elements being movable between different orientations. In the different orientations the reflective elements direct radiation towards different locations at a reflective component in a pupil plane of the illumination system, thereby forming different illumination modes. Each reflective element is moveable between a first orientation which directs radiation towards a first location the pupil plane and a second orientation which directs radiation towards a second location in the pupil plane, the first orientation and the second orientation of the reflective element being defined by end stops.
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公开(公告)号:SG11201601454WA
公开(公告)日:2016-03-30
申请号:SG11201601454W
申请日:2014-09-24
Applicant: ASML NETHERLANDS BV
Inventor: BANINE VADIM , BARTRAIJ PETRUS , VAN GORKOM RAMON , AMENT LUCAS , DE JAGER PIETER , DE VRIES GOSSE , DONKER RILPHO , ENGELEN WOUTER , FRIJNS OLAV , GRIMMINCK LEONARDUS , KATALENIC ANDELKO , LOOPSTRA ERIK , NIENHUYS HAN-KWANG , NIKIPELOV ANDREY , RENKENS MICHAEL , JANSSEN FRANCISCUS , KRUIZINGA BORGERT
IPC: G03F7/20 , G01N21/956 , G02B5/18 , G02B27/00 , G02B27/09 , G02B27/10 , G02B27/12 , G02B27/14 , G02B27/42 , G03F1/84 , G21K1/06 , H01S3/09 , H05H7/04
Abstract: A delivery system for use within a lithographic system. The beam delivery system comprises optical elements arranged to receive a radiation beam from a radiation source and to reflect portions of radiation along one or more directions to form a one or more branch radiation beams for provision to one or more tools.
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公开(公告)号:SG11201908803XA
公开(公告)日:2019-10-30
申请号:SG11201908803X
申请日:2018-01-31
Applicant: ASML NETHERLANDS BV
Inventor: DE VRIES GOSSE , TEN KATE NICOLAAS
Abstract: coco co co O C (12) INTERNATIONAL APPLICATION PUBLISHED UNDER THE PATENT COOPERATION TREATY (PCT) (19) World Intellectual Property Organization International Bureau (43) International Publication Date 18 October 2018 (18.10.2018) WIP0 I PCT onion °nolo HE imiolonomo oimIE (10) International Publication Number WO 2018/188828 Al (51) International Patent Classification: GO3F 7/20 (2006.01) F04B 37/08 (2006.01) BOLD 8/00 (2006.01) (21) International Application Number: PCT/EP2018/052391 (22) International Filing Date: 31 January 2018 (31.01.2018) (25) Filing Language: English (26) Publication Language: English (30) Priority Data: 17165857.8 11 April 2017 (11.04.2017) EP (71) Applicant: ASML NETHERLANDS B.V. [NL/NL]; P.O. Box 324, 5500 AH Veldhoven (NL). (72) Inventors: DE VRIES, Gosse, Charles; P.O. Box 324, 5500 AH Veldhoven (NL). TEN KATE, Nicolaas; P.O. Box 324, 5500 AH Veldhoven (NL). (74) Agent: SLENDERS, Peter; P.O. Box 324, 5500 AH Veld- hoven (NL). (81) Designated States (unless otherwise indicated, for every kind of national protection available): AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW. (84) Designated States (unless otherwise indicated, for every kind of regional protection available): ARIPO (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW), Eurasian (AM, AZ, BY, KG, KZ, RU, TJ, TM), European (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, (54) Title: LITHOGRAPHIC APPARATUS AND COOLING METHOD FIG. 1 (57) : A lithographic apparatus arranged to project a pattern from a patterning device onto a substrate, comprising at least one housing comprising at least one internal wall, at least one optical component arranged within at least one chamber defined at least in part by the at least one internal wall and configured to receive a radiation beam and a cooling apparatus arranged to cool at least a portion of the at least one internal wall to a temperature below that of the at least one optical component. [Continued on next page] WO 2018/188828 Al MIDEDIMOMMIONE10131MEIMEHMEMIS TR), OAPI (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG). Published: with international search report (Art. 21(3)) before the expiration of the time limit for amending the claims and to be republished in the event of receipt of amendments (Rule 48.2(h))
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