公开(公告)号：NL2005044A

公开(公告)日：2011-01-31

申请号：NL2005044

申请日：2010-07-07

Applicant: ASML NETHERLANDS BV

Inventor： WANG JIUN-CHENG ,  HAREN RICHARD ,  SCHAAR MAURITS ,  LEE HYUN-WOO ,  JUNGBLUT REINER

IPC: G01N21/47 ,  G03F7/20

Abstract: A mark used in the determination of overlay error comprises sub-features, the sub-features having a smallest pitch approximately equal to the smallest pitch of the product features. The sensitivity to distortions and aberrations is similar as that for the product features. When the mark is developed the sub-features merge and the outline of the larger feature is developed.