公开(公告)号：WO2021122065A1

公开(公告)日：2021-06-24

申请号：PCT/EP2020/084671

申请日：2020-12-04

Applicant: ASML NETHERLANDS B.V.

Inventor： BECKERS, Johan, Franciscus, Maria ,  DAVIES, Dylan John David ,  KOEVOETS, Adrianus, Hendrik ,  VAN HAL, Paulus, Albertus ,  SEOANE DE LA CUESTA, Beatriz ,  STEL, Bart, Willem ,  STEVENS, Lucas, Henricus, Johannes ,  TROMP, Siegfried, Alexander ,  ACHANTA, Satish ,  VAN KUILENBURG, Julien

IPC: G03F7/16 ,  G03F7/20 ,  H01L21/687 ,  G03F7/165 ,  G03F7/707 ,  G03F7/70783 ,  G03F7/7095 ,  H01L21/6875 ,  H01L21/68757

Abstract: The present invention relates to methods for reducing wafer load grid and flatness degradation of a substrate holder, such as a wafertable, of a lithographic apparatus. The present invention also relates to systems comprising lithography substrate holders, such as wafertables, with improved resistance to wafer load grid and flatness degradation, and to methods of fabricating devices, e.g. integrated circuits, using such systems. The present invention also relates to substrates, such as wafers, with backsides configured to protect substrate holders, such as wafertables, from wafer load grid and flatness degradation when used in lithography, and to methods of removing hydrophobic coatings from such substrates, such as wafers. The present invention has particular use in connection with lithographic apparatus for fabricating devices, for example integrated circuits.

公开(公告)号：WO2020156769A1

公开(公告)日：2020-08-06

申请号：PCT/EP2020/050354

申请日：2020-01-09

Applicant: ASML NETHERLANDS B.V.

Inventor： HUBAUX, Arnaud ,  BECKERS, Johan, Franciscus, Maria ,  DAVIES, Dylan John David ,  KUNNEN, Johan, Gertrudis, Cornelis ,  PONGERS, Willem, Richard ,  DAWARE, Ajinkya, Ravindra ,  LI, Chung-Hsun ,  TSIROGIANNIS, Georgios ,  BORGER, Hendrik, Cornelis, Anton ,  DE JONG, Frederik Eduard ,  GONZALEZ HUESCA, Juan Manuel ,  HLOD, Andriy, Vasyliovich ,  PISARENCO, Maxim

IPC: G03F7/20 ,  G05B23/02 ,  G05B19/418

Abstract: Described is a method for categorizing a substrate subject to a semiconductor manufacturing process comprising multiple operations, the method comprising: obtaining values of functional indicators derived from data generated during one or more of the multiple operations on the substrate, the functional indicators characterizing at least one operation; applying a decision model comprising one or more threshold values to the values of the functional indicators to obtain one or more categorical indicators; and assigning a category to the substrate based on the one or more categorical indicators.

公开(公告)号：EP3918420A1

公开(公告)日：2021-12-08

申请号：EP20700456.5

申请日：2020-01-09

Applicant: ASML Netherlands B.V.

Inventor： HUBAUX, Arnaud ,  BECKERS, Johan, Franciscus, Maria ,  DAVIES, Dylan John David ,  KUNNEN, Johan, Gertrudis, Cornelis ,  PONGERS, Willem, Richard ,  DAWARE, Ajinkya, Ravindra ,  LI, Chung-Hsun ,  TSIROGIANNIS, Georgios ,  BORGER, Hendrik, Cornelis, Anton ,  DE JONG, Frederik Eduard ,  GONZALEZ HUESCA, Juan Manuel ,  HLOD, Andriy, Vasyliovich ,  PISARENCO, Maxim

IPC: G03F7/20 ,  G05B23/02 ,  G05B19/418