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    Method and system for the removal and/or avoidance of contamination in charged particle beam systems
    1.
    发明授权
    Method and system for the removal and/or avoidance of contamination in charged particle beam systems 有权

    公开(公告)号：US12202019B2

    公开(公告)日：2025-01-21

    申请号：US18360731

    申请日：2023-07-27

    Applicant: ASML Netherlands B.V.

    Inventor： Marc Smits ,  Johan Joost Koning ,  Chris Franciscus Jessica Lodewijk ,  Hindrik Willem Mook ,  Ludovic Lattard

    IPC: B08B7/04 ,  B08B17/02 ,  H01J37/02 ,  H01J37/147 ,  H01J37/18 ,  H01J37/317

    Abstract: A charged particle beam system is disclosed, comprising: a charged particle beam generator for generating a beam of charged particles; a charged particle optical column arranged in a vacuum chamber, wherein the charged particle optical column is arranged for projecting the beam of charged particles onto a target, and wherein the charged particle optical column comprises a charged particle optical element for influencing the beam of charged particles; a source for providing a cleaning agent; a conduit connected to the source and arranged for introducing the cleaning agent towards the charged particle optical element; wherein the charged particle optical element comprises: a charged particle transmitting aperture for transmitting and/or influencing the beam of charged particles, and at least one vent hole for providing a flow path between a first side and a second side of the charged particle optical element, wherein the vent hole has a cross section which is larger than a cross section of the charged particle transmitting aperture. Further, a method for preventing or removing contamination in the charged particle transmitting apertures is disclosed, comprising the step of introducing the cleaning agent while the beam generator is active.

    Methods and systems for clamping a substrate
    2.
    发明授权
    Methods and systems for clamping a substrate 有权

    公开(公告)号：US11599028B2

    公开(公告)日：2023-03-07

    申请号：US16812175

    申请日：2020-03-06

    Applicant: ASML Netherlands B.V.

    Inventor： Marc Smits

    IPC: G03F7/20

    Abstract: Methods and arrangement for clamping substrates to a support using adhesive material area disclosed.
    The method comprises providing a support comprising a first surface defining a plane; applying adhesive material on at least portions of the first surface; and placing the substrate onto the adhesive material, wherein the adhesive material forms a plurality of support locations supporting the substrate. Preferably the adhesive material is cured at least partly during the application of a substantially uniformly distributed force to the substrate in the direction of the support.
    The arrangements comprise a support comprising a first surface, for supporting the substrate via adhesive material, whereby the first surface defines a plane. Preferably it also comprises an arrangement for providing electromagnetic radiation, thermal energy, and/or a chemical substance to the adhesive material, and an arrangement for providing a substantially uniformly distributed force to the substrate in the direction of the support.

    Method and system for the removal and/or avoidance of contamination in charged particle beam systems
    4.
    发明授权
    Method and system for the removal and/or avoidance of contamination in charged particle beam systems 有权

    公开(公告)号：US10987705B2

    公开(公告)日：2021-04-27

    申请号：US16841547

    申请日：2020-04-06

    Applicant: ASML Netherlands B.V.

    Inventor： Marc Smits ,  Johan Joost Koning ,  Chris Franciscus Jessica Lodewijk ,  Hindrik Willem Mook ,  Ludovic Lattard

    IPC: B08B7/04 ,  H01J37/02 ,  H01J37/317 ,  B08B17/02 ,  H01J37/147 ,  H01J37/18

    Abstract: A charged particle beam system is disclosed, comprising: a charged particle beam generator for generating a beam of charged particles; a charged particle optical column arranged in a vacuum chamber, wherein the charged particle optical column is arranged for projecting the beam of charged particles onto a target, and wherein the charged particle optical column comprises a charged particle optical element for influencing the beam of charged particles; a source for providing a cleaning agent; a conduit connected to the source and arranged for introducing the cleaning agent towards the charged particle optical element; wherein the charged particle optical element comprises: a charged particle transmitting aperture for transmitting and/or influencing the beam of charged particles, and at least one vent hole for providing a flow path between a first side and a second side of the charged particle optical element, wherein the vent hole has a cross section which is larger than a cross section of the charged particle transmitting aperture. Further, a method for preventing or removing contamination in the charged particle transmitting apertures is disclosed, comprising the step of introducing the cleaning agent while the beam generator is active.

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