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    Multiple charged-particle beam apparatus with low crosstalk
    1.
    发明授权
    Multiple charged-particle beam apparatus with low crosstalk 有权

    公开(公告)号：US12033830B2

    公开(公告)日：2024-07-09

    申请号：US17944157

    申请日：2022-09-13

    Applicant: ASML Netherlands B.V.

    Inventor： Weiming Ren ,  Xuerang Hu ,  Qingpo Xi ,  Xuedong Liu

    IPC: H01J37/244 ,  H01J37/153 ,  H01J37/28

    CPC classification number: H01J37/244 ,  H01J37/153 ,  H01J37/28 ,  H01J2237/0453 ,  H01J2237/24475 ,  H01J2237/2448

    Abstract: Systems and methods of enhancing imaging resolution by reducing crosstalk between detection elements of a secondary charged-particle detector in a multi-beam apparatus are disclosed. The multi-beam apparatus may comprise an electro-optical system for projecting a plurality of secondary charged-particle beams from a sample onto a charged-particle detector. The electro-optical system may include a first pre-limit aperture plate comprising a first aperture configured to block peripheral charged-particles of the plurality of secondary charged-particle beams, and a beam-limit aperture array comprising a second aperture configured to trim the plurality of secondary charged-particle beams. The charged-particle detector may include a plurality of detection elements, wherein a detection element of the plurality of detection elements is associated with a corresponding trimmed beam of the plurality of secondary charged-particle beams.

    Multiple charged-particle beam apparatus with low crosstalk
    2.
    发明授权
    Multiple charged-particle beam apparatus with low crosstalk 有权

    公开(公告)号：US12165830B2

    公开(公告)日：2024-12-10

    申请号：US17708517

    申请日：2022-03-30

    Applicant: ASML Netherlands B.V.

    Inventor： Shichen Gu ,  Weiming Ren ,  Qingpo Xi

    IPC: H01J37/09 ,  H01J37/20 ,  H01J37/28

    Abstract: Systems and methods of enhancing imaging resolution by reducing crosstalk between detection elements of a secondary charged-particle detector in a multi-beam apparatus are disclosed. The multi-beam apparatus may comprise an electro-optical system comprising a beam-limit aperture plate having a surface substantially perpendicular to an optical axis, the beam-limit aperture plate comprising a first aperture at a first distance relative to the surface of the beam-limit aperture plate, and a second aperture at a second distance relative to the surface of the beam-limit aperture plate, the second distance being different from the first distance. The first aperture may be a part of a first set of apertures of the beam-limit aperture plate at the first distance, and the second aperture may be a part of a second set of apertures of the beam-limit aperture plate at the second distance.

    Multiple charged-particle beam apparatus with low crosstalk
    3.
    发明授权
    Multiple charged-particle beam apparatus with low crosstalk 有权

    公开(公告)号：US11469074B2

    公开(公告)日：2022-10-11

    申请号：US16886461

    申请日：2020-05-28

    Applicant: ASML Netherlands B.V.

    Inventor： Weiming Ren ,  Xuerang Hu ,  Qingpo Xi ,  Xuedong Liu

    IPC: H01J37/244 ,  H01J37/153 ,  H01J37/28

    Abstract: Systems and methods of enhancing imaging resolution by reducing crosstalk between detection elements of a secondary charged-particle detector in a multi-beam apparatus are disclosed. The multi-beam apparatus may comprise an electro-optical system for projecting a plurality of secondary charged-particle beams from a sample onto a charged-particle detector. The electro-optical system may include a first pre-limit aperture plate comprising a first aperture configured to block peripheral charged-particles of the plurality of secondary charged-particle beams, and a beam-limit aperture array comprising a second aperture configured to trim the plurality of secondary charged-particle beams. The charged-particle detector may include a plurality of detection elements, wherein a detection element of the plurality of detection elements is associated with a corresponding trimmed beam of the plurality of secondary charged-particle beams.

    System and method for alignment of secondary beams in multi-beam inspection apparatus
    4.
    发明授权
    System and method for alignment of secondary beams in multi-beam inspection apparatus 有权

    公开(公告)号：US12278081B2

    公开(公告)日：2025-04-15

    申请号：US17598841

    申请日：2020-03-06

    Applicant: ASML Netherlands B.V.

    Inventor： Qingpo Xi ,  Xuerang Hu ,  Xuedong Liu ,  Weiming Ren ,  Zhong-Wei Chen

    IPC: H01J37/05 ,  H01J37/147

    Abstract: A multi-beam inspection apparatus including an adjustable beam separator is disclosed. The adjustable beam separator is configured to change a path of a secondary particle beam. The adjustable beam separator comprises a first Wien filter and a second Wien filter. Both Wien filters are aligned with a primary optical axis. The first Wien filter and the second Wien filter are independently controllable via a first excitation input and a second excitation input, respectively. The adjustable beam separator is configured move the effective bending point of the adjustable beam separator along the primary optical axis based on the first excitation input and the second excitation input.

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