公开(公告)号：WO2022011330A2

公开(公告)日：2022-01-13

申请号：PCT/US2021/041233

申请日：2021-07-12

Applicant: AXCELIS TECHNOLOGIES, INC.

Inventor： COLVIN, Neil ,  BASSOM, Neil ,  WU, Xiangyang

IPC: H01J37/08 ,  C23C14/48 ,  H01J37/317

Abstract: An ion implantation system (101) has a chlorine based source material (113), such as aluminum trichloride, germanium (iv) chloride, indium (i) chloride, indium (iii) chloride, gallium (ii) chloride, and gallium (iii) chloride. An ion source (108) is configured to ionize the chlorine based source material and form an ion beam (112). The ionization of the chlorine based source material further forms a by-product having a non-conducting material containing chlorine. A hydrogen introduction apparatus (145) is configured to introduce a reducing agent including hydrogen to the ion source, such as hydrogen gas or phosphine. The reducing agent is configured to alter a chemistry of the non-conducting material to produce a volatile gas by-product. A beamline assembly (104) is configured to selectively transport the ion beam, and an end station (106) is configured to accept the ion beam for implantation of ions into a workpiece (118).

公开(公告)号：WO2017223130A1

公开(公告)日：2017-12-28

申请号：PCT/US2017/038420

申请日：2017-06-21

Applicant: AXCELIS TECHNOLOGIES, INC.

Inventor： KAMENITSA, Dennis ,  RZESZUT, Richard ,  SILVA, Fernando ,  BERINGER, Jason ,  WU, Xiangyang

IPC: C23C14/48 ,  H01J37/317 ,  H01L21/265

Abstract: An ion implantation system (101) is provided having an ion source (108) configured to form an ion beam (116) from aluminum iodide. A beamline assembly selectively transports the ion beam to an end station (106) configured to accept the ion beam for implantation of aluminum ions into a workpiece (128). The ion source may have a solid-state material source (112) having aluminum iodide in a solid form. A solid source vaporizer (146) may vaporize the aluminum iodide, defining gaseous aluminum iodide. An arc chamber (114) may form a plasma from the gaseous aluminum iodide, where arc current from a power supply (110) is configured to dissociate aluminum ions from the aluminum iodide. One or more extraction electrodes (118) may extract the ion beam from the arc chamber. Optionally, a water vapor source (150) further introduces water to react residual aluminum iodide to form hydroiodic acid, where the residual aluminum iodide and hydroiodic acid is evacuated from the system.

Abstract translation: 提供了一种离子注入系统（101），其具有被配置为由碘化铝形成离子束（116）的离子源（108）。 束线组件选择性地将离子束输送到终端站（106），终端站（106）被配置为接受用于将铝离子注入到工件（128）中的离子束。 离子源可以具有固体形式的具有碘化铝的固态材料源（112）。 固体源蒸发器（146）可蒸发碘化铝，从而确定气态碘化铝。 电弧室（114）可以从气态碘化铝形成等离子体，其中来自电源（110）的电弧电流被配置为从铝碘离解铝离子。 一个或多个引出电极（118）可以从电弧室提取离子束。 任选地，水蒸气源（150）进一步引入水以使残余的碘化铝反应以形成氢碘酸，其中残留的碘化铝和氢碘酸从系统中排出。