中科微点-全球专利检索

  1. Login
  2. Sign Up

Search Results

21 records (took 0.021 seconds)

    ELECTROPHOTOGRAPHIC RECORDING MATERIAL
    2.
    发明专利
    ELECTROPHOTOGRAPHIC RECORDING MATERIAL 未知

    公开(公告)号：DE3266612D1

    公开(公告)日：1985-11-07

    申请号：DE3266612

    申请日：1982-03-12

    Applicant: BASF AG

    Inventor： ECKELL ALBRECHT DR ,  EILINGSFELD HEINZ DR ,  ELZER ALBERT DR ,  FEICHTMAYR FRANZ DR ,  HOFFMANN GERHARD DR ,  LEYRER REINHOLD ,  NEUMANN PETER DR

    IPC: G03G5/00 ,  C07D209/44 ,  G03G5/06

    Abstract: An electrophotographic recording medium which consists essentially of an electrically conductive base and a photosemiconductive double layer which comprises a first layer containing charge carrier-producing dyes, and a second layer containing one or more compounds which are charge carrier-transporting when exposed to light, wherein the charge carrier-producing dyes are those of the general formula I I where R1, R2, R3 and R4 are each hydrogen or a non-ionic substituent, X and Y are each the radical of a methylene-active compound, or of an aliphatic, cycloaliphatic, araliphatic, aromatic or heterocyclic amine or hydrazine, and Z is hydrogen, methyl or phenyl, and the production of this recording medium.

    4.
    发明专利
    未知

    公开(公告)号：DE3340154A1

    公开(公告)日：1985-05-15

    申请号：DE3340154

    申请日：1983-11-07

    Applicant: BASF AG

    Inventor： SCHUPP HANS DR ,  ELZER ALBERT DR

    IPC: G03F7/26 ,  G03C1/72 ,  G03C5/00 ,  G03F7/039 ,  G03F7/095 ,  H05K3/00 ,  H05K3/34 ,  G03C1/68 ,  C08F20/10 ,  C08F20/30 ,  C08G63/12

    Abstract: In the production of imagewise structured resist layers, for example for the manufacture of printed circuits, electronic components, soldering masks, etc., by application, onto a substrate, of a positive-working resist layer (R) which can be rendered soluble by exposure to actinic light, imagewise exposure of the resist layer (R) to actinic light and removal of the exposed parts of the layer by washing out with a developer, the photosensitive resist layer (R) used, in particular in the form of a dry film resist, consists of two or more strata (S) which posses different basic solubilities, at least the upper stratum (U) being photosensitive and the lower stratum (LS) having a higher basic solubility in the developer than has the upper stratum (U).

    PHOTOSENSITIVE RECORDING MATERIAL
    5.
    发明专利
    PHOTOSENSITIVE RECORDING MATERIAL 未知

    公开(公告)号：DE3560654D1

    公开(公告)日：1987-10-22

    申请号：DE3560654

    申请日：1985-02-11

    Applicant: BASF AG

    Inventor： HOFFMANN GERHARD DR ,  HOFMANN REINER DR ,  ELZER ALBERT DR

    IPC: G03F7/004 ,  G03F7/00 ,  G03F7/027 ,  G03F7/032 ,  G03F7/033 ,  G03G5/05 ,  G03C1/68

    Abstract: A photosensitive recording material, in particular for the production of lithographic printing plates or resist images, possesses a photosensitive, photopolymerizable or electrophotographic recording layer which can be washed out with an aqueous, in particular aqueous alkaline, medium, the said recording layer containing, as a polymeric binder, a copolymer which is soluble or dispersible in the aqueous, in particular aqueous alkaline, medium and which contains, as a comonomer, an anhydride of a polymerizable, ethylenically unsaturated monocarboxylic acid in an amount of from 0.05 to 2% by weight, based on the copolymer, as copolymerized units.

    10.
    发明专利
    未知

    公开(公告)号：DE3447357A1

    公开(公告)日：1986-07-03

    申请号：DE3447357

    申请日：1984-12-24

    Applicant: BASF AG

    Inventor： ELZER ALBERT DR ,  SCHORNICK GUNNAR DR ,  SANNER AXEL DR

    IPC: G03C1/00 ,  G03F7/004 ,  G03F7/027 ,  G03F7/00 ,  G03C1/68

    Abstract: In dry film resists possessing a solid photopolymerizable resist layer, which is applied on a temporary base and can be developed with aqueous, in particular aqueous alkaline, media, and, if required, a cover sheet on the resist layer, the said resist layer is built from a homogeneous mixture of (a) not less than 40% by weight of one or more oligomers which contain free carboxyl groups and more than two acryloyl and/or methacryloyl groups and are soluble or dispersible in aqueous alkaline solutions, (b) from 1 to 35% by weight of one or more film-forming compatible polymers which are soluble in aqueous media, (c) from 1 to 30% by weight of one or more compatible photopolymerizable monomers, (d) from 0.001 to 10% by weight of one or more photoinitiators and (e) from 0 to 30% by weight of further additives and/or assistants. Resist images are produced on a substrate by a process employing photopolymerizable resist layers of the type stated above.

Patent Agency Ranking