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公开(公告)号:JPS6038697B2
公开(公告)日:1985-09-02
申请号:JP15074777
申请日:1977-12-16
Applicant: BASF AG
Inventor: ETSUKUHARUTO KOPURIN , HORUSUTO HOFUMAN , JIIKUFURIITO RAIFU , PEETAA RIHITAA , HERUMUUTO KAUFUMAN
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2.Recording material enabling photopolymerization and manufacture of relief plate by use thereof 失效
Title translation: 记录材料使用光电聚焦和制造减震板公开(公告)号:JPS57124345A
公开(公告)日:1982-08-03
申请号:JP19873881
申请日:1981-12-11
Applicant: Basf Ag
Inventor: AUGUSUTO REENAA , MON YON YUN , BUERUNAA RENTSU , PEETAA RIHITAA , AKUSERU ZANAA , GUNAARU SHIYORUNIKU , HAINTSU URURIHI BUERUTAA , ARUBUREHITO EKERU
CPC classification number: G03F7/032 , C08G18/67 , C08G18/6705 , C08G18/0814
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公开(公告)号:JPS5665004A
公开(公告)日:1981-06-02
申请号:JP14456580
申请日:1980-10-17
Applicant: BASF AG
Inventor: GERUHARUTO HAINTSU , PEETAA RIHITAA , MONNYON YUN
IPC: C08F2/00 , C08F2/48 , C08F16/12 , C08F16/14 , C08F20/10 , C08F20/18 , C08F287/00 , C08F297/00 , C08F297/04 , C08L53/02 , G03F7/033
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公开(公告)号:JPH0336213B2
公开(公告)日:1991-05-30
申请号:JP16245082
申请日:1982-09-20
Applicant: BASF AG
Inventor: GERUHARUTO HAINTSU , PEETAA RIHITAA , UORUFUGANGU EFU MYURAA
IPC: C08F285/00 , C08F287/00 , C08L23/00 , C08L51/00 , C08L51/02 , C08L53/00 , C08L77/00 , C08L101/00 , G03F7/004 , G03F7/032 , G03F7/033 , G03F7/038
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公开(公告)号:JPS63228413A
公开(公告)日:1988-09-22
申请号:JP4994288
申请日:1988-03-04
Applicant: BASF AG
Inventor: AUGUSUTO REENAA , ARUBERUTO KOORU , MIHIYAERU BOBURITSUHI , HERUMAN RORAA , PEETAA RIHITAA , BUERUNAA RENTSU , RUUTOBUIHI KURAITONAA , PEETAA RUDORUFU
IPC: C08G18/12 , C09D5/23 , C09D175/00 , C09D175/04 , G11B5/702
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公开(公告)号:JPS5862639A
公开(公告)日:1983-04-14
申请号:JP16245082
申请日:1982-09-20
Applicant: BASF AG
Inventor: GERUHARUTO HAINTSU , PEETAA RIHITAA , UORUFUGANGU EFU MIYURAA
IPC: C08F285/00 , C08F287/00 , C08L23/00 , C08L51/00 , C08L51/02 , C08L53/00 , C08L77/00 , C08L101/00 , G03F7/004 , G03F7/032 , G03F7/033 , G03F7/038
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公开(公告)号:JPS5840546A
公开(公告)日:1983-03-09
申请号:JP13642082
申请日:1982-08-06
Applicant: BASF AG
Inventor: GUNAA SHIYORUNITSUKU , MONNYON YUN , AKUSERU ZANERU , AUGUSUTO REENAA , BUERUNAA RENTSU , PEETAA RIHITAA , ARUBUREHITO ETSUKERU
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公开(公告)号:JPH0237922B2
公开(公告)日:1990-08-28
申请号:JP14456580
申请日:1980-10-17
Applicant: BASF AG
Inventor: GERUHARUTO HAINTSU , PEETAA RIHITAA , MONNYON YUN
IPC: C08F2/00 , C08F2/48 , C08F16/12 , C08F16/14 , C08F20/10 , C08F20/18 , C08F287/00 , C08F297/00 , C08F297/04 , C08L53/02 , G03F7/033
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公开(公告)号:JPS57136653A
公开(公告)日:1982-08-23
申请号:JP46582
申请日:1982-01-06
Applicant: BASF AG
Inventor: MONNYON YUN , PEETAA RIHITAA , HERUMUUTO BARUTSUINSUKII
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公开(公告)号:JPS5377703A
公开(公告)日:1978-07-10
申请号:JP15074777
申请日:1977-12-16
Applicant: BASF AG
Inventor: ETSUKUHARUTO KOPURIN , HORUSUTO HOFUMAN , JIIKUFURIITO RAIFU , PEETAA RIHITAA , HERUMUUTO KAUFUMAN
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