公开(公告)号：JPH027227A

公开(公告)日：1990-01-11

申请号：JP32956688

申请日：1988-12-28

Applicant: BASF AG

Inventor： NORUBERUTO SHIYUNAIDAA ,  NORUBERUTO KURAIMESU ,  GIYUNTAA BETEINGAA ,  UDO BEEMU ,  RUUTOBUIHI KURAITONAA ,  AUGUSUTO REENAA ,  BUERUNAA RENTSU ,  GEERUHARUTO NERUSHIYUBATSUHA ,  BUERUNAA NIIDERUBERUGAA ,  RAINHARUTO SHIYUTORANSUKII ,  BUERUNAA GURAU

IPC: B24B7/13 ,  B24B21/00 ,  B24B21/04 ,  G11B5/84

Abstract: PURPOSE: To improve the surface treatment by moving a polishing means in the feeding direction or the reverse direction of a continuously forwarded recording medium at a specific relative speed to the speed of this recording medium. CONSTITUTION: The recording medium 1 is moved from the feeding position 2 to the take-up position 3 at a speed of 40-60m/min, and a polishing tape 4 is moved from a storage reel 5 to a take-up reel 6 for treating the surface of layer. A supporting element 7 is arranged between two reels, and on this supporting element 7, the recording medium 1 is brought into contact with the polishing tape 4 having the particle dimension of 1-20μm by the jet stream of gas from a slot nozzle 8. At this time, the satisfied effect is obtained when the polishing tape 4 is moved relatively against the recording medium 1 at a speed faster than twice the speed of this medium 1, preferrably 10-200 times.