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公开(公告)号:JPS6336059B2
公开(公告)日:1988-07-19
申请号:JP17153481
申请日:1981-10-28
Applicant: BASF AG
Inventor: UERUNAA SHUTOMUPUFUI , GYUNTAA BETEINGAA , FURIIDORIHI ENGERU , HORUSUTO FUITERAA , NORUBERUTO KURAIMESU , DEIITOMAA PUEFUAAKORUN , NORUBERUTO SHEFUAA , KURUTO SHUMITSU
IPC: G11B23/087 , B65H75/24 , G11B23/08
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公开(公告)号:JPH027227A
公开(公告)日:1990-01-11
申请号:JP32956688
申请日:1988-12-28
Applicant: BASF AG
Inventor: NORUBERUTO SHIYUNAIDAA , NORUBERUTO KURAIMESU , GIYUNTAA BETEINGAA , UDO BEEMU , RUUTOBUIHI KURAITONAA , AUGUSUTO REENAA , BUERUNAA RENTSU , GEERUHARUTO NERUSHIYUBATSUHA , BUERUNAA NIIDERUBERUGAA , RAINHARUTO SHIYUTORANSUKII , BUERUNAA GURAU
Abstract: PURPOSE: To improve the surface treatment by moving a polishing means in the feeding direction or the reverse direction of a continuously forwarded recording medium at a specific relative speed to the speed of this recording medium. CONSTITUTION: The recording medium 1 is moved from the feeding position 2 to the take-up position 3 at a speed of 40-60m/min, and a polishing tape 4 is moved from a storage reel 5 to a take-up reel 6 for treating the surface of layer. A supporting element 7 is arranged between two reels, and on this supporting element 7, the recording medium 1 is brought into contact with the polishing tape 4 having the particle dimension of 1-20μm by the jet stream of gas from a slot nozzle 8. At this time, the satisfied effect is obtained when the polishing tape 4 is moved relatively against the recording medium 1 at a speed faster than twice the speed of this medium 1, preferrably 10-200 times.
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公开(公告)号:JPS58105468A
公开(公告)日:1983-06-23
申请号:JP19091482
申请日:1982-11-01
Applicant: BASF AG
IPC: G11B23/087 , G11B23/04
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公开(公告)号:JPS57100665A
公开(公告)日:1982-06-22
申请号:JP17153481
申请日:1981-10-28
Applicant: BASF AG
Inventor: BUERUNAA SHIYUTOUMUPUFUI , GIYUNTAABETEINGAA , FURIIDORIHI ENGERU , HORUSUTO FUITERAA , NORUBERUTO KURAIMESU , DEIITOMAA PUEFUAAKORUN , NORUBERUTO SHIEFUAA , KURUTO SHIYUMITSU
IPC: G11B23/087 , B65H75/24 , G11B23/08
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