公开(公告)号：JPS58196657A

公开(公告)日：1983-11-16

申请号：JP2176783

申请日：1983-02-14

Applicant: Basf Ag

Inventor： UDO BEEMU ,  ERUNSUTOOYURUGEN GURITOMAN ,  KURAUSU SHIYURUTSUEEBERUGE

IPC: G11B17/32 ,  G11B5/56 ,  G11B5/58 ,  G11B21/16

CPC classification number: G11B21/16 ,  G11B5/56 ,  G11B5/58

公开(公告)号：JPH027227A

公开(公告)日：1990-01-11

申请号：JP32956688

申请日：1988-12-28

Applicant: BASF AG

Inventor： NORUBERUTO SHIYUNAIDAA ,  NORUBERUTO KURAIMESU ,  GIYUNTAA BETEINGAA ,  UDO BEEMU ,  RUUTOBUIHI KURAITONAA ,  AUGUSUTO REENAA ,  BUERUNAA RENTSU ,  GEERUHARUTO NERUSHIYUBATSUHA ,  BUERUNAA NIIDERUBERUGAA ,  RAINHARUTO SHIYUTORANSUKII ,  BUERUNAA GURAU

IPC: B24B7/13 ,  B24B21/00 ,  B24B21/04 ,  G11B5/84

Abstract: PURPOSE: To improve the surface treatment by moving a polishing means in the feeding direction or the reverse direction of a continuously forwarded recording medium at a specific relative speed to the speed of this recording medium. CONSTITUTION: The recording medium 1 is moved from the feeding position 2 to the take-up position 3 at a speed of 40-60m/min, and a polishing tape 4 is moved from a storage reel 5 to a take-up reel 6 for treating the surface of layer. A supporting element 7 is arranged between two reels, and on this supporting element 7, the recording medium 1 is brought into contact with the polishing tape 4 having the particle dimension of 1-20μm by the jet stream of gas from a slot nozzle 8. At this time, the satisfied effect is obtained when the polishing tape 4 is moved relatively against the recording medium 1 at a speed faster than twice the speed of this medium 1, preferrably 10-200 times.

公开(公告)号：JPS63209086A

公开(公告)日：1988-08-30

申请号：JP1972888

申请日：1988-02-01

Applicant: BASF AG

Inventor： UDO BEEMU ,  BUERUNAA REEZAA ,  KURUTO DERU ,  AKUSERU RIYUDEIGAA SHIYURUTSUE

IPC: G11B23/50 ,  C23C18/16

公开(公告)号：JPS62122980A

公开(公告)日：1987-06-04

申请号：JP15991186

申请日：1986-07-09

Applicant: BASF AG

Inventor： UDO BEEMU ,  DEIITAA SHIEFUAA ,  ADAMU BUEEBAA

IPC: B65D85/57 ,  G11B23/02 ,  G11B33/04