Abstract:
In a process for the accelerated reduction of organic substrates, selected from the group consisting of esters, amides, nitriles, acids, ketones, imines or mixtures thereof, they are reacted with an amine borane, sulfide borane or ether borane complex as a borane source in the presence of organic accelerator compounds containing either Lewis acidic or Lewis basic sites in their structure, of which the Lewis acidic site can coordinate with the carbonyl or nitrile or imine group of the substrate or the Lewis basic site can coordinate with the borane.
Abstract:
A process for producing a 1,3,2-dioxaborinane compound of the general formula (I) in which each R individually is selected from the group consisting of H and C1-6-alkyl, by reacting a diol of the general formula (II) HO-CRR-CRR-CRR-OH with diborane is performed without using a solvent.
Abstract:
A process for producing a 1,3,2-dioxaborinane compound of the general formula (I) in which each R individually is selected from the group consisting of H and C1-6-alkyl, by reacting a diol of the general formula (II) HO-CRR-CRR-CRR-OH with diborane is performed without using a solvent.
Abstract:
The present invention is in the field of processes for the generation of thin inorganic films on substrates, in particular atomic layer deposition processes. It relates to a process for preparing metal films comprising (a) depositing a metal-containing compound from the gaseous state onto a solid substrate and (b) bringing the solid substrate with the deposited metal-containing compound in contact with a reducing agent in the gaseous state, wherein the reducing agent is or at least partially forms at the surface of the solid substrate a carbene, a silylene or a phosphor radical.