中科微点-全球专利检索

  1. Login
  2. Sign Up

Search Results

6 records (took 0.018 seconds)

    ELECTROLESS DEPOSITION OF BARRIER LAYERS
    1.
    发明申请
    ELECTROLESS DEPOSITION OF BARRIER LAYERS 审中-公开
    绝缘层的电沉积

    公开(公告)号：WO2009092706A2

    公开(公告)日：2009-07-30

    申请号：PCT/EP2009050589

    申请日：2009-01-20

    Applicant: BASF SE ,  MELLIES RAIMUND

    Inventor： MELLIES RAIMUND

    CPC classification number: C23C18/50

    Abstract: The invention relates to a solution for the deposition of barrier layers on metal surfaces, which comprises compounds of the elements nickel and molybdenum, at least one first reducing agent selected fromamong secondary and tertiary cyclic aminoboranes and at least one complexing agent, where the solution has a pH of from 8.5 to12.

    Abstract translation: 本发明涉及用于在金属表面上沉积阻挡层的解决方案，其包括元素镍和钼的化合物，至少一种选自次级和三级环状氨基硼烷的第一还原剂和至少一种络合剂，其中溶液具有 pH为8.5〜12。

    AQUEOUS ALKALINE CLEANING COMPOSITIONS AND METHODS OF THEIR USE
    2.
    发明申请
    AQUEOUS ALKALINE CLEANING COMPOSITIONS AND METHODS OF THEIR USE 审中-公开
    水性碱性清洁组合物及其使用方法

    公开(公告)号：WO2012011020A3

    公开(公告)日：2012-03-15

    申请号：PCT/IB2011053099

    申请日：2011-07-12

    Applicant: BASF SE ,  BASF CHINA CO LTD ,  MELLIES RAIMUND ,  KLIPP ANDREAS

    Inventor： MELLIES RAIMUND ,  KLIPP ANDREAS

    IPC: C11D3/34 ,  C11D7/32 ,  C11D7/34 ,  H01L21/02

    CPC classification number: C11D3/349 ,  C11D1/345 ,  C11D1/66 ,  C11D1/667 ,  C11D1/72 ,  C11D3/0073 ,  C11D3/06 ,  C11D3/2068 ,  C11D3/2086 ,  C11D3/30 ,  C11D3/3757 ,  C11D3/378 ,  C11D11/0017 ,  C11D11/0041 ,  C11D11/0047 ,  C11D11/0064 ,  H01L21/02074 ,  H05K3/1208 ,  H05K2203/0793

    Abstract: Aqueous alkaline cleaning composition free from organic solvents and metal ion-free silicates, the said compositions comprising (A) a thioamino acid having at least one primary amino group and at least one mercapto group, (B) a quaternary ammonium hydroxide, (C) a chelating and/or corrosion inhibiting agent selected from the group consisting of aliphatic and cycloaliphatic amines having at least two primary amino groups, and aliphatic and cycloaliphatic amines having at least one hydroxy group, (D) a nonionic surfactant selected from the group of acetylenic alcohols, alkyloxylated acetylenic alcohols and alkyloxylated sorbitan monocarboxylic acid mono esters; the use of the alkaline cleaning composition for the processing of substrates useful for fabricating electrical and optical devices; and a method for processing substrates useful for fabricating electrical and optical devices making use of the said aqueous alkaline cleaning composition.

    Abstract translation: 所述组合物包含（A）具有至少一个伯氨基和至少一个巯基的硫代氨基酸，（B）季铵氢氧化物，（C） 选自具有至少两个伯氨基的脂族和脂环族胺和具有至少一个羟基的脂族和脂环族胺的螯合和/或腐蚀抑制剂，（D）选自炔属的非离子表面活性剂 醇，烷氧基乙炔醇和烷氧基化脱水山梨糖醇单羧酸单酯; 使用碱性清洁组合物来处理用于制造电气和光学装置的基板; 以及用于处理用于制造使用所述含水碱性清洁组合物的电气和光学装置的基板的方法。

    AQUEOUS ALKALINE CLEANING COMPOSITIONS AND METHODS OF THEIR USE
    3.
    发明专利
    AQUEOUS ALKALINE CLEANING COMPOSITIONS AND METHODS OF THEIR USE 未知

    公开(公告)号：SG186294A1

    公开(公告)日：2013-02-28

    申请号：SG2012091146

    申请日：2011-07-12

    Applicant: BASF SE

    Inventor： MELLIES RAIMUND ,  KLIPP ANDREAS

    Abstract: Aqueous alkaline cleaning composition free from organic solvents and metal ion-free silicates, the said compositions comprising (A) a thioamino acid having at least one primary amino group and at least one mercapto group, (B) a quaternary ammonium hydroxide, (C) a chelating and/or corrosion inhibiting agent selected from the group consisting of aliphatic and cycloaliphatic amines having at least two primary amino groups, and aliphatic and cycloaliphatic amines having at least one hydroxy group, (D) a nonionic surfactant selected from the group of acetylenic alcohols, alkyloxylated acetylenic alcohols and alkyloxylated sorbitan monocarboxylic acid mono esters; the use of the alkaline cleaning composition for the processing of substrates useful for fabricating electrical and optical devices; and a method for processing substrates useful for fabricating electrical and optical devices making use of the said aqueous alkaline cleaning composition.

    AQUEOUS ALKALINE CLEANING COMPOSITIONS AND METHOD OF THEIR USE
    4.
    发明专利
    AQUEOUS ALKALINE CLEANING COMPOSITIONS AND METHOD OF THEIR USE 未知

    公开(公告)号：MY163493A

    公开(公告)日：2017-09-15

    申请号：MYPI2012005247

    申请日：2011-07-12

    Applicant: BASF SE

    Inventor： MELLIES RAIMUND ,  KLIPP ANDREAS

    IPC: C11D1/62 ,  C11D1/34 ,  C11D3/06 ,  C11D3/20 ,  C11D3/30 ,  C11D3/34 ,  C11D3/37 ,  C11D11/00

    Abstract: AQUEOUS ALKALINE CLEANING COMPOSITION FREE FROM ORGANIC SOLVENTS AND METAL ION-FREE SILICATES, THE SAID COMPOSITIONS COMPRISING (A) A THIOAMINO ACID HAVING AT LEAST ONE PRIMARY AMINO GROUP AND AT LEAST ONE MERCAPTO GROUP, (B) A QUATERNARY AMMONIUM HYDROXIDE, (C) A CHELATING AND/OR CORROSION INHIBITING AGENT SELECTED FROM THE GROUP CONSISTING OF ALIPHATIC AND CYCLOALIPHATIC AMINES HAVING AT LEAST TWO PRIMARY AMINO GROUPS, AND ALIPHATIC AND CYCLOALIPHATIC AMINES HAVING AT LEAST ONE HYDROXY GROUP, (D) A NONIONIC SURFACTANT SELECTED FROM THE GROUP OF ACETYLENIC ALCOHOLS, ALKYLOXYLATED ACETYLENIC ALCOHOLS AND ALKYLOXYLATED SORBITAN MONOCARBOXYLIC ACID MONO ESTERS; THE USE OF THE ALKALINE CLEANING COMPOSITION FOR THE PROCESSING OF SUBSTRATES USEFUL FOR FABRICATING ELECTRICAL AND OPTICAL DEVICES; AND A METHOD FOR PROCESSING SUBSTRATES USEFUL FOR FABRICATING ELECTRICAL AND OPTICAL DEVICES MAKING USE OF THE SAID AQUEOUS ALKALINE CLEANING COMPOSITION.

Patent Agency Ranking