PHOTOCATALYST HAVING INCREASED DAYLIGHT ACTIVITY
    2.
    发明申请
    PHOTOCATALYST HAVING INCREASED DAYLIGHT ACTIVITY 审中-公开
    具有增强的日光活动光催化

    公开(公告)号:WO2011048128A3

    公开(公告)日:2012-04-12

    申请号:PCT/EP2010065772

    申请日:2010-10-20

    Abstract: The present invention relates to a photocatalyst comprising 70 to 99.998 wt % of at least one semiconductor material A having a band gap of at least 3.0 eV, 0.001 to 20 wt % of at least one semiconductor material B having a band gap of no more than 3.0 eV, and 0.0001 to 5.0 wt % of at least one additive C, each in respect of the entire photocatalyst, wherein the sum of the quantities of at least one semiconductor material A, at least one semiconductor material B, and at least one additive C is 100 wt %, to a method for producing said photocatalyst, to the use of the photocatalyst according to the invention in photocatalysis or in chemical reactions, and to a method for treating a flow, comprising bringing the flow to be treated in contact with a photocatalyst under the effect of light.

    Abstract translation: 本发明涉及一种包含70的光催化剂,以99.998重量%的至少一种半导体材料的%A具有至少3.0电子伏特的带隙,0.001至20重量的具有至多为3.0eV的带隙的至少一个半导体材料B%,和 0.0001至5.0重量%,各自基于整个光催化剂,至少一种添加剂C,至少一个半导体材料的的量,所述至少一个半导体材料和至少一种添加剂B C 100重量的总和.-%是 对于该光催化剂的制备过程中,使用根据本发明的光催化或化学反应的光催化剂,以及用于处理包含所述流接触流的方法,以与在暴露的光催化剂以光进行处理。

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