公开(公告)号：JP2010224554A

公开(公告)日：2010-10-07

申请号：JP2010106668

申请日：2010-05-06

Applicant: BREWER SCIENCE INC

Inventor： KRISHNAMURTHY VANDANA ,  NEEF CHARLES J ,  SNOOK JULIET A M

IPC: G03F7/11 ,  C08G77/20 ,  C08G79/00 ,  C08G79/10 ,  C08L85/00 ,  G03F7/09 ,  G03F7/32 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide an anti-reflective composition and a method of using the composition to form a circuit. SOLUTION: The composition comprises a polymer dissolved or dispersed in a solvent system. The polymer of the composition is generated by reacting an organic compound with a polymeric metal alkoxide, and the polymeric metal alkoxide includes a recurring unit having formula (I), wherein M is a metal individually selected from a group composed of titanium, zirconium, silicon and aluminum, each L is individually selected from a group consisting of diketo and alkoxide ligands, and the organic compound includes a functional group for coordinating with M of the polymeric metal alkoxide. COPYRIGHT: (C)2011,JPO&INPIT

公开(公告)号：AU2003247629A1

公开(公告)日：2004-01-06

申请号：AU2003247629

申请日：2003-06-24

Applicant: BREWER SCIENCE INC

Inventor： NEEF CHARLES J ,  KRISHNAMURTHY VANDANA

IPC: C08G79/00 ,  C08L85/00 ,  G02B1/11

Abstract: Anti-reflective compositions and methods of using these compositions to form circuits are provided. The compositions comprise a polymer dissolved or dispersed in a solvent system. In a preferred embodiment, the polymers include a light-attenuating moiety having a structure selected from the group consisting of:where:each of X and Y is individually selected from the group consisting of electron withdrawing groups;R is selected from the group consisting of alkyls and aryls; andR is selected from the group consisting of hydrogen and alkyls.The resulting compositions are spin bowl compatible (i.e., they do not crosslink prior to the bake stages of the microlithographic processes or during storage at room temperature), are wet developable, and have superior optical properties.

公开(公告)号：AU2003282554A1

公开(公告)日：2004-05-04

申请号：AU2003282554

申请日：2003-10-07

Applicant: BREWER SCIENCE INC

Inventor： FOWLER MICHELLE ,  WINDSOR MICHELLE ,  NEEF CHARLES J ,  BHAVE MANDAR

IPC: C09B69/00 ,  G03F7/09

Abstract: Novel anti-reflective coatings comprising small molecules (e.g., less than about 5,000 g/mole) in lieu of high molecular weight polymers and methods of using those coatings are provided. In one embodiment, aromatic carboxylic acids are used as the chromophores, and the resulting compounds are blended with a crosslinking agent and an acid. Anti-reflective coating films prepared according to the invention exhibit improved properties compared to high molecular weight polymeric anti-reflective coating films. The small molecule anti-reflective coatings have high etch rates and good via fill properties. Photolithographic processes carried out with the inventive material result in freestanding, 110-nm profiles.

公开(公告)号：AU2003282554A8

公开(公告)日：2004-05-04

申请号：AU2003282554

申请日：2003-10-07

Applicant: BREWER SCIENCE INC

Inventor： BHAVE MANDAR ,  FOWLER MICHELLE ,  WINDSOR MICHELLE ,  NEEF CHARLES J

IPC: C09B69/00 ,  G03F7/09 ,  G03C1/76 ,  G03F7/00

Abstract: Novel anti-reflective coatings comprising small molecules (e.g., less than about 5,000 g/mole) in lieu of high molecular weight polymers and methods of using those coatings are provided. In one embodiment, aromatic carboxylic acids are used as the chromophores, and the resulting compounds are blended with a crosslinking agent and an acid. Anti-reflective coating films prepared according to the invention exhibit improved properties compared to high molecular weight polymeric anti-reflective coating films. The small molecule anti-reflective coatings have high etch rates and good via fill properties. Photolithographic processes carried out with the inventive material result in freestanding, 110-nm profiles.

公开(公告)号：AU2003251582A1

公开(公告)日：2004-01-06

申请号：AU2003251582

申请日：2003-06-18

Applicant: BREWER SCIENCE INC

Inventor： COX ROBERT CHRISTIAN ,  NEEF CHARLES J

IPC: G03F7/037 ,  C08G73/10 ,  G02B1/11 ,  G03F7/038 ,  G03F7/09 ,  G03F7/11 ,  H01L21/027

Abstract: Anti-reflective compositions and methods of using these compositions to form circuits are provided. The compositions comprise a polymer dissolved or dispersed in a solvent system. In a preferred embodiment, the polymers of the composition include recurring monomers having the formulas where: (1) each R is individually selected from the group consisting of hydrogen, —OH, aliphatics, and phenyls; and (2) L is selected from the group consisting of —SO2— and —CR′2—, where each R′ is individually selected from the group consisting of hydrogen, aliphatics, phenyls, and —CX3, where each X is individually selected from the group consisting of the halogens. The resulting compositions are spin bowl compatible (i.e., they do not crosslink prior to the bake stages of the microlithographic processes or during storage at room temperature), are wet developable, and have superior optical properties.

公开(公告)号：AU2003251582A8

公开(公告)日：2004-01-06

申请号：AU2003251582

申请日：2003-06-18

Applicant: BREWER SCIENCE INC

Inventor： COX ROBERT CHRISTIAN ,  NEEF CHARLES J

IPC: G03F7/037 ,  C08G73/10 ,  G02B1/11 ,  G03F7/038 ,  G03F7/09 ,  G03F7/11 ,  H01L21/027 ,  G03F7/004 ,  C08G69/26 ,  C08G63/00 ,  G03C5/00

Abstract: Anti-reflective compositions and methods of using these compositions to form circuits are provided. The compositions comprise a polymer dissolved or dispersed in a solvent system. In a preferred embodiment, the polymers of the composition include recurring monomers having the formulas where: (1) each R is individually selected from the group consisting of hydrogen, —OH, aliphatics, and phenyls; and (2) L is selected from the group consisting of —SO2— and —CR′2—, where each R′ is individually selected from the group consisting of hydrogen, aliphatics, phenyls, and —CX3, where each X is individually selected from the group consisting of the halogens. The resulting compositions are spin bowl compatible (i.e., they do not crosslink prior to the bake stages of the microlithographic processes or during storage at room temperature), are wet developable, and have superior optical properties.

公开(公告)号：AU2003247629A8

公开(公告)日：2004-01-06

申请号：AU2003247629

申请日：2003-06-24

Applicant: BREWER SCIENCE INC

Inventor： KRISHNAMURTHY VANDANA ,  NEEF CHARLES J

IPC: C08G79/00 ,  C08L85/00 ,  G02B1/11 ,  G03C1/492 ,  G03C5/00

Abstract: Anti-reflective compositions and methods of using these compositions to form circuits are provided. The compositions comprise a polymer dissolved or dispersed in a solvent system. In a preferred embodiment, the polymers include a light-attenuating moiety having a structure selected from the group consisting of:where:each of X and Y is individually selected from the group consisting of electron withdrawing groups;R is selected from the group consisting of alkyls and aryls; andR is selected from the group consisting of hydrogen and alkyls.The resulting compositions are spin bowl compatible (i.e., they do not crosslink prior to the bake stages of the microlithographic processes or during storage at room temperature), are wet developable, and have superior optical properties.

公开(公告)号：AU2003245596A1

公开(公告)日：2004-01-06

申请号：AU2003245596

申请日：2003-06-18

Applicant: BREWER SCIENCE INC

Inventor： KRISHNAMURTHY VANDANA ,  NEEF CHARLES J ,  SNOOK JULIET A M

IPC: G03F7/11 ,  C08G79/00 ,  C08G79/10 ,  C08L85/00 ,  G03F7/09 ,  H01L21/027 ,  G03C1/735 ,  G03F7/30 ,  G03F7/36 ,  G03C1/825 ,  G03C1/835 ,  G03F7/20

Abstract: Anti-reflective compositions and methods of using these compositions to form circuits are provided. The compositions comprise a polymer dissolved or dispersed in a solvent system. The polymers of the composition being formed by reacting a polymeric metal alkoxide with an organic compound, said polymeric metal alkoxide including recurring units having the formula wherein M is a metal, and each L is individually selected from the group consisting of diketo and alkoxide ligands; and said organic compound comprising a functional group for coordinating with M of said polymeric metal alkoxide. The resulting compositions are spin bowl compatible (i.e., they do not crosslink prior to the bake stages of the microlithographic processes or during storage at room temperature), are wet developable, and have superior optical properties.

公开(公告)号：WO2009018217A3

公开(公告)日：2009-03-26

申请号：PCT/US2008071357

申请日：2008-07-28

Applicant: BREWER SCIENCE INC ,  SULLIVAN DANIEL M ,  HUANG RUNHUI ,  NEEF CHARLES J ,  DAI JINHUA ,  SWOPE MICHAEL B

Inventor： SULLIVAN DANIEL M ,  HUANG RUNHUI ,  NEEF CHARLES J ,  DAI JINHUA ,  SWOPE MICHAEL B

IPC: G03F7/11 ,  C08F212/04 ,  C08F220/10 ,  C08F236/06 ,  G03F7/16

CPC classification number: G03F7/091 ,  C08F212/14 ,  C08F220/14 ,  C08F220/18 ,  C08F220/26 ,  C08F220/34 ,  C08F220/56 ,  C08F226/06 ,  G03F7/11 ,  Y10T428/31678 ,  Y10T428/31855 ,  Y10T428/31935

Abstract: This invention describes compositions and methods of using non-covalently crosslinked resin coatings for lithographic applications. These materials are designed to undergo, after coating, a change that provides solvent resistance and, with some materials, simultaneous aqueous-base solubility. Non-covalent interactions allow for easier removal of these coatings than of covalcntly crosslinked materials. These types of materials are well-suited for trench and gap fill applications, as well as for anti-reflective coatings, spin-on carbon layers, and etch masks.

Abstract translation: 本发明描述了用于平版印刷应用的非共价交联树脂涂料的组合物和方法。 这些材料被设计成在涂覆之后经历改变，从而提供耐溶剂性，并且在某些材料的情况下同时具有水基溶解性。 与共价交联材料相比，非共价相互作用可以更容易地去除这些涂层。 这些类型的材料非常适合沟槽和间隙填充应用，以及抗反射涂层，旋涂碳层和蚀刻掩膜。

公开(公告)号：WO2013006314A2

公开(公告)日：2013-01-10

申请号：PCT/US2012044248

申请日：2012-06-26

Applicant: BREWER SCIENCE INC ,  SULLIVAN DANIEL M ,  NEEF CHARLES J ,  WANG YUBAO ,  OUATTARA TANTIBORO

Inventor： SULLIVAN DANIEL M ,  NEEF CHARLES J ,  WANG YUBAO ,  OUATTARA TANTIBORO

CPC classification number: H01L21/0276 ,  C08G77/58 ,  C09D183/14 ,  G03F7/0752 ,  G03F7/09 ,  G03F7/091 ,  G03F7/094 ,  H01L21/0332 ,  Y10T428/24802

Abstract: Metal-oxide films for lithographic applications are provided. The films are formed from compositions comprising metal-oxide precursor compounds including metals and metalloids other than silicon. These films are easily produced and can be modified with a variety of ligands, including alkoxides, phenoxides, carboxylates, beta-diketones, and beta-ketoesters.

Abstract translation: 提供了用于光刻应用的金属氧化物膜。 该膜由包含金属和氧化物前体化合物的组合物形成，包括除硅以外的金属和准金属。 这些膜容易生产，并且可以用各种配体进行改性，包括醇盐，苯氧化物，羧酸盐，β-二酮和β-酮​​酯。