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    Anti-reflective coating composition with improved spin bowl compatibility
    2.
    发明专利
    Anti-reflective coating composition with improved spin bowl compatibility 有权
    抗反射涂层组合物具有改善的纺丝相容性

    公开(公告)号：JP2009037245A

    公开(公告)日：2009-02-19

    申请号：JP2008216969

    申请日：2008-08-26

    Applicant: Brewer Science Inc ,  ブルーワー サイエンス アイ エヌ シー.

    Inventor： SHAO XIE ,  MEADOR JIM D ,  BHAVE MANDAR ,  KRISHNAMURTHY VANDANA ,  NOWAK KELLY A ,  FOWLER MICHELLE ,  DESHPANDE SHREERAM V

    IPC: G03F7/11 ,  B32B7/02 ,  C08J3/24 ,  C09D5/00 ,  C09D7/12 ,  C09D105/00 ,  C09D133/00 ,  C09D161/20 ,  C09D163/00 ,  C09D167/00 ,  C09D171/00 ,  C09D179/08 ,  C09D201/00 ,  G03F7/004 ,  G03F7/09 ,  H01L21/027

    CPC classification number: C08J3/241 ,  G03F7/091 ,  Y10S430/151

    Abstract: PROBLEM TO BE SOLVED: To provide an anti-reflective coating composition that does not crosslink prior to a bake stage in microlithographic processes so as to solve problems of spin bowl incompatibility and stability of an anti-reflective coating. SOLUTION: The anti-reflective composition includes a polymer dissolved or dispersed in a solvent system, a crosslinking agent, a light attenuating compound and a strong acid. The polymer is selected from a group consisting of acrylic polymers, polyesters, epoxy novolacs, polysaccharides, polyethers, polyimides and mixtures thereof. The crosslinking agent is selected from a group consisting of amino resin and epoxy resin. The light attenuating compound is selected from a group consisting of phenolic compounds, carboxylic acid, phosphoric acid, cyano compounds, benzene, naphthalene and anthracene. The composition contains the strong acid by less than 1.0 mass% based upon the total mass of the composition taken as 100 mass%. COPYRIGHT: (C)2009,JPO&INPIT

    Abstract translation: 要解决的问题：提供在微光刻工艺中在烘烤阶段之前不交联的抗反射涂料组合物，以解决纺丝碗不相容性和抗反射涂层的稳定性的问题。 抗反射组合物包括溶解或分散在溶剂体系中的聚合物，交联剂，光衰减化合物和强酸。 聚合物选自丙烯酸聚合物，聚酯，环氧酚醛清漆，多糖，聚醚，聚酰亚胺及其混合物。 交联剂选自氨基树脂和环氧树脂。 光衰减化合物选自酚类化合物，羧酸，磷酸，氰基化合物，苯，萘和蒽。 组合物以占组合物总质量的100质量％为基准，含有小于1.0质量％的强酸。 版权所有（C）2009，JPO＆INPIT

    WET-DEVELOPABLE ANTI-REFLECTIVE COMPOSITIONS
    4.
    发明专利
    WET-DEVELOPABLE ANTI-REFLECTIVE COMPOSITIONS 未知

    公开(公告)号：AU2003247629A1

    公开(公告)日：2004-01-06

    申请号：AU2003247629

    申请日：2003-06-24

    Applicant: BREWER SCIENCE INC

    Inventor： NEEF CHARLES J ,  KRISHNAMURTHY VANDANA

    IPC: C08G79/00 ,  C08L85/00 ,  G02B1/11

    Abstract: Anti-reflective compositions and methods of using these compositions to form circuits are provided. The compositions comprise a polymer dissolved or dispersed in a solvent system. In a preferred embodiment, the polymers include a light-attenuating moiety having a structure selected from the group consisting of:where:each of X and Y is individually selected from the group consisting of electron withdrawing groups;R is selected from the group consisting of alkyls and aryls; andR is selected from the group consisting of hydrogen and alkyls.The resulting compositions are spin bowl compatible (i.e., they do not crosslink prior to the bake stages of the microlithographic processes or during storage at room temperature), are wet developable, and have superior optical properties.

    Wet-developable anti-reflective compositions
    7.
    发明专利
    Wet-developable anti-reflective compositions 未知

    公开(公告)号：AU2003247629A8

    公开(公告)日：2004-01-06

    申请号：AU2003247629

    申请日：2003-06-24

    Applicant: BREWER SCIENCE INC

    Inventor： KRISHNAMURTHY VANDANA ,  NEEF CHARLES J

    IPC: C08G79/00 ,  C08L85/00 ,  G02B1/11 ,  G03C1/492 ,  G03C5/00

    Abstract: Anti-reflective compositions and methods of using these compositions to form circuits are provided. The compositions comprise a polymer dissolved or dispersed in a solvent system. In a preferred embodiment, the polymers include a light-attenuating moiety having a structure selected from the group consisting of:where:each of X and Y is individually selected from the group consisting of electron withdrawing groups;R is selected from the group consisting of alkyls and aryls; andR is selected from the group consisting of hydrogen and alkyls.The resulting compositions are spin bowl compatible (i.e., they do not crosslink prior to the bake stages of the microlithographic processes or during storage at room temperature), are wet developable, and have superior optical properties.

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