公开(公告)号：WO2012018983A3

公开(公告)日：2012-05-18

申请号：PCT/US2011046547

申请日：2011-08-04

Applicant: BREWER SCIENCE INC ,  WASHBURN CARLTON ASHLEY ,  LAMB III JAMES E ,  SMITH BRIAN ,  FURSE JUSTIN LEE ,  WANG HEPING

Inventor： WASHBURN CARLTON ASHLEY ,  LAMB III JAMES E ,  SMITH BRIAN ,  FURSE JUSTIN LEE ,  WANG HEPING

IPC: H01L21/027

CPC classification number: H01L21/0332 ,  G03F7/039 ,  G03F7/091 ,  G03F7/094 ,  Y10T428/24331 ,  Y10T428/30

Abstract: Methods of forming microelectronic structures using multilayer processes are disclosed. The methods comprise the use of a developer-soluble protective layer adjacent the substrate surface in a multilayer stack to protect the substrate during pattern transfer. After etching, the pattern is transferred into the developer-soluble protective layer using a developer instead of etching required by previous methods. Conventional developer-soluble anti-reflective coatings and gap-fill materials can be used to form the protective layer. Custom layers with developer solubility can also be prepared. Microelectronic structures formed by the above processes are also disclosed.

Abstract translation: 公开了使用多层工艺形成微电子结构的方法。 所述方法包括在多层堆叠中使用与衬底表面相邻的显影剂可溶保护层，以在图案转印期间保护衬底。 在蚀刻之后，使用显影剂而不是以前的方法所需的蚀刻将图案转移到可显影剂可溶的保护层中。 可以使用传统的显影剂可溶性抗反射涂层和间隙填充材料来形成保护层。 具有显影剂溶解度的定制层也可以制备。 还公开了通过上述方法形成的微电子结构。

公开(公告)号：WO2010080789A2

公开(公告)日：2010-07-15

申请号：PCT/US2010020199

申请日：2010-01-06

Applicant: BREWER SCIENCE INC ,  LIN QIN ,  PULIGADDA RAMA ,  CLAYPOOL JAMES ,  GUERRERO DOUGLAS J ,  SMITH BRIAN

Inventor： LIN QIN ,  PULIGADDA RAMA ,  CLAYPOOL JAMES ,  GUERRERO DOUGLAS J ,  SMITH BRIAN

IPC: H01L21/027 ,  G03F7/20

CPC classification number: H01L21/0337 ,  C08G77/20 ,  G03F7/40 ,  H01L21/0338 ,  H01L21/3121

Abstract: Novel double- and triple-patterning methods are provided. The methods involve applying a shrinkable composition to a patterned template structure (e.g., a structure having lines) and heating the composition. The shrinkable composition is selected to possess properties that will cause it to shrink during heating, thus forming a conformal layer over the patterned template structure. The layer is then etched to leave behind pre-spacer structures, which comprise the features from the pattern with remnants of the shrinkable composition adjacent the feature sidewalls. The features are removed, leaving behind a doubled pattern. In an alternative embodiment, an extra etch step can be carried out prior to formation of the features on the template structure, thus allowing the pattern to be tripled rather than doubled.

Abstract translation: 提供了新的双重和三重图案化方法。 所述方法包括将可收缩的组合物应用于图案化的模板结构（例如，具有线的结构）并加热组合物。 可收缩组合物被选择为具有使其在加热期间收缩的性质，从而在图案化模板结构上形成共形层。 然后蚀刻该层以留下预间隔结构，其包含来自图案的特征，其中可收缩组合物的残余物邻近特征侧壁。 功能被删除，留下了一倍的模式。 在替代实施例中，可以在模板结构上形成特征之前执行额外蚀刻步骤，从而允许图案增加三倍而不是加倍。

公开(公告)号：EP2374145A4

公开(公告)日：2012-11-07

申请号：EP10729436

申请日：2010-01-06

Applicant: BREWER SCIENCE INC

Inventor： LIN QIN ,  PULIGADDA RAMA ,  CLAYPOOL JAMES ,  GUERRERO DOUGLAS J ,  SMITH BRIAN

IPC: H01L21/027 ,  G03F7/20 ,  G03F7/40

CPC classification number: H01L21/0337 ,  C08G77/20 ,  G03F7/40 ,  H01L21/0338 ,  H01L21/3121

Abstract: Novel double- and triple-patterning methods are provided. The methods involve applying a shrinkable composition to a patterned template structure (e.g., a structure having lines) and heating the composition. The shrinkable composition is selected to possess properties that will cause it to shrink during heating, thus forming a conformal layer over the patterned template structure. The layer is then etched to leave behind pre-spacer structures, which comprise the features from the pattern with remnants of the shrinkable composition adjacent the feature sidewalls. The features are removed, leaving behind a doubled pattern. In an alternative embodiment, an extra etch step can be carried out prior to formation of the features on the template structure, thus allowing the pattern to be tripled rather than doubled.